Chanha Park
Vice President at SK hynix
SPIE Involvement:
Author
Publications (50)

Proceedings Article | 12 November 2024 Presentation + Paper
Hiroshi Hanekawa, Yoshiaki Ikuta, Jongsub Kim, Hyunman Jo, Sangjin Jo, Euisang Park, Sungha Woo, Chanha Park
Proceedings Volume 13215, 132150E (2024) https://doi.org/10.1117/12.3034600
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Hydrogen, Scanners, Plasma, Optical properties, Lithography, Reflectivity, Inspection, Dry etching

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12495, 124951E (2023) https://doi.org/10.1117/12.2657808
KEYWORDS: Machine learning, Lithography, Photomasks, Source mask optimization, Numerical analysis, Convolutional neural networks, Computational lithography

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530N (2022) https://doi.org/10.1117/12.2613931
KEYWORDS: Overlay metrology, Image processing, Yield improvement, Metrology, Line edge roughness, Process control, Critical dimension metrology, Scanning electron microscopy, Optical lithography, Inspection

Proceedings Article | 25 May 2022 Poster + Paper
Proceedings Volume 12055, 120550N (2022) https://doi.org/10.1117/12.2613974
KEYWORDS: Metals, Contamination, Semiconducting wafers, Optical lithography, Extreme ultraviolet lithography, Contamination control, Coating, Bridges, Manufacturing, Oxides

Proceedings Article | 22 February 2021 Presentation + Paper
Kuan-Ming Chen, Wolfgang Henke, Ji-Hoon Jung, Ewa Kasperkiewicz, Anita Bouma, Rizvi Rahman, Gratiela Isai, Gwang-Gon Kim, Sotirios Tsiachris, Jae-Doug Yoo, Yuna Park, JaeYoung Park, Jonggeun Won, Nang-Lyeom Oh, Hsin-Yu Chen, WeiTai Lin, Chih-Hung Hsieh, Kuo-Feng Pao, Kyoyeon Cho, Abdalmohsen Elmalk, Sudharshanan Raghunathan, Taekwon Jee, Seung-Uk Jeong, Jeongwoo Jae, Sang-Woo Kim, Dongyoung Lee, Jungchan Kim, WonKwang Ma, Sang-Ho Lee, Chan-Ha Park
Proceedings Volume 11611, 116111V (2021) https://doi.org/10.1117/12.2584149
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Overlay metrology, Optical lithography, Metrology, Visualization, Statistical analysis, Lithography, Graphic design, Etching

Proceedings Article | 22 February 2021 Presentation + Paper
Dongsoo Kim, Moran Zaberchik, Chen Li, Honggoo Lee, Chanha Park, Sangho Lee, Dongyoung Lee, Scott Beatty, Jae Park, Ramkumar Karur-Shanmugam, Telly Koffas, Dohwa Lee, Sanghuck Jeon, Dongsub Choi, Efi Megged, Nir BenDavid, Hedvi Spielberg
Proceedings Volume 11611, 1161123 (2021) https://doi.org/10.1117/12.2583638
KEYWORDS: Optimization (mathematics), Metrology, Semiconducting wafers, Statistical methods, Statistical analysis, Time metrology, Overlay metrology, Diffractive optical elements

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11613, 116130J (2021) https://doi.org/10.1117/12.2584618
KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Algorithm development, Semiconductor manufacturing, Scanners, Process control, Device simulation

Proceedings Article | 22 February 2021 Poster + Paper
Proceedings Volume 11613, 116130Y (2021) https://doi.org/10.1117/12.2584692
KEYWORDS: Calibration, Machine learning, Signal processing, Physics, Optical proximity correction, Metrology, Lithography, Computational lithography

Proceedings Article | 22 February 2021 Presentation
Eitan Hajaj, Honggoo Lee, Chanha Park, Sangho Lee, Dongyoung Lee, Dohwa Lee, Dongsoo Kim, Sanghuck Jeon, Dongsub Choi, Eltsafon Ashwal, Chen Dror, Raviv Yohanan, Zephyr Liu, xiaolei liu, Diana Shaphirov, Katya Gordon, Mark Ghinovker
Proceedings Volume 11611, 1161137 (2021) https://doi.org/10.1117/12.2584524
KEYWORDS: Overlay metrology, Optical parametric oscillators, Standards development, Manufacturing, Integrated circuits

Proceedings Article | 23 March 2020 Presentation + Paper
Jigang Ma, Miao Yu, Cees Lambregts, Sotirios Tsiachris, Paul Böcker, Jun-Yeob Kim, Won-Kwang Ma, Sang-Jun Han, Chan-Ha Park, Kyong-Seok Kim, Jung-Hwan Kim, Sang-Jun Park, Gwang-Gon Kim
Proceedings Volume 11327, 113270S (2020) https://doi.org/10.1117/12.2552938
KEYWORDS: Optical alignment, Overlay metrology, Semiconducting wafers, Deep ultraviolet, Scanners, Lithography, Sensors, Optimization (mathematics), Feedback control

Proceedings Article | 20 March 2020 Paper
Proceedings Volume 11325, 1132521 (2020) https://doi.org/10.1117/12.2552930
KEYWORDS: Semiconducting wafers, Metrology, Scanners, Immersion lithography, Critical dimension metrology, Lithography, Lithographic process control

Proceedings Article | 20 March 2020 Paper
Shlomit Katz, Honggoo Lee, Dongyoung Lee, Jinsoo Kim, Jaesun Woo, Chunsoo Kang, Chanha Park, Dohwa Lee, Seongjae Lee, Sanghuck Jeon, Dongsub Choi, Anna Golotsvan, Roie Volkivich, Efi Megged
Proceedings Volume 11325, 113252E (2020) https://doi.org/10.1117/12.2541933
KEYWORDS: Metrology, Overlay metrology, Optical filters, Optical parametric oscillators, 3D metrology, Semiconducting wafers, Near infrared, Photoresist materials, Imaging metrology, Wafer-level optics

Proceedings Article | 26 March 2019 Paper
Honggoo Lee, Sangjun Han, Minhyung Hong, Jieun Lee, Dongyoung Lee, Ahlin Choi, Chanha Park, Dohwa Lee, Seongjae Lee, Jungtae Lee, Jeongpyo Lee, DongSub Choi, Sanghuck Jeon, Zephyr Liu, Hao Mei, Tal Marciano, Eitan Hajaj, Lilach Saltoun, Dana Klein, Eran Amit, Anna Golotsvan, Wayne Zhou, Eitan Herzel, Roie Volkovich, John Robinson
Proceedings Volume 10959, 109591E (2019) https://doi.org/10.1117/12.2515015
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scatterometry, Wafer-level optics, Manufacturing, Quality measurement, Imaging systems, Scanning electron microscopy, Diffractive optical elements

Proceedings Article | 26 March 2019 Presentation + Paper
Danilo De Simone, Romuald Blanc, Jeroen Van de Kerkhove, Amir-Hossein Tamaddon, Roberto Fallica, Lieve Van Look, Nouredine Rassoul, Frederic Lazzarino, Nadia Vandenbroeck, Pieter Vanelderen, Gian Lorusso, Frieda Van Roey, Anne-Laure Charley, Geert Vandenberghe, Kurt Ronse, Kilyoung Lee, Junghyung Lee, Sarohan Park, Chang-Moon Lim, Chan-Ha Park
Proceedings Volume 10957, 109570T (2019) https://doi.org/10.1117/12.2515170
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Extreme ultraviolet, Critical dimension metrology, Image processing, Failure analysis, Scanning electron microscopy, Image analysis

Proceedings Article | 26 March 2019 Paper
Chanha Park, Hongoo Lee, Dongyoung Lee, Ahlin Choi, Stefan Buhl, Wan-Soo Kim, Philip Groeger, Steffen Guhlemann, Seop Kim, Mingyu Kim
Proceedings Volume 10959, 109592F (2019) https://doi.org/10.1117/12.2514975
KEYWORDS: Metrology, Data modeling, Statistical modeling, Critical dimension metrology, Data corrections

Proceedings Article | 26 March 2019 Paper
Hong-Goo Lee, Dong-Young Lee, Jun-Yeob Kim, Sang-Jun Han, Chan-Ha Park, Jaap Karssenberg, Mir Shahrjerdy, Arno van Leest, Nang-Lyeom Oh, Dong-Hak Lee, Aileen Soco, Tjitte Nooitgedagt
Proceedings Volume 10959, 1095907 (2019) https://doi.org/10.1117/12.2515299
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Etching, Lithography, Scatterometry, Signal detection, Instrument modeling, Optical lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Young-Seok Kim, SeIl Lee, Zhenyu Hou, Yiqiong Zhao, Meng Liu, Yunan Zheng, Qian Zhao, Daekwon Kang, Lei Wang, Mark Simmons, Mu Feng, Jun Lang, Byoung-Il Choi, Gilbert Kim, Hakyong Sim, Jongcheon Park, Gyun Yoo, JeonKyu Lee, Sung-woo Ko, Jaeseung Choi, Cheolkyun Kim, Chanha Park
Proceedings Volume 10959, 1095913 (2019) https://doi.org/10.1117/12.2515274
KEYWORDS: Calibration, Metrology, Optical proximity correction, Data modeling, Instrument modeling, Scanning electron microscopy, Time metrology, Neural networks, Semiconducting wafers

Proceedings Article | 20 March 2018 Presentation + Paper
Ahmed Seoud, Sherif Hany, Juhwan Kim, Jebum Yoon, Boram Jung, Sang-Jin Oh, Byoung-Sub Nam, Seyoung Oh, Chan-Ha Park
Proceedings Volume 10587, 105870K (2018) https://doi.org/10.1117/12.2297638
KEYWORDS: Optical proximity correction, Lithography, SRAF, Semiconducting wafers, Photomasks, Manufacturing, Computer simulations

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10587, 105870L (2018) https://doi.org/10.1117/12.2297659
KEYWORDS: SRAF, Lithography, Optical proximity correction, Optical lithography

Proceedings Article | 4 April 2017 Presentation + Paper
Jinhyuck Jun, Jaehee Hwang, Jaeseung Choi, Seyoung Oh, Chanha Park, Hyunjo Yang, Thuc Dam, Munhoe Do, Dong Chan Lee, Guangming Xiao, Jung-Hoe Choi, Kevin Lucas
Proceedings Volume 10148, 1014809 (2017) https://doi.org/10.1117/12.2257857
KEYWORDS: Lithography, Optical proximity correction, Optical lithography, Manufacturing, Photomasks, Semiconducting wafers, Atrial fibrillation, Source mask optimization, Image processing

Proceedings Article | 28 March 2017 Paper
Jookyoung Song, Jaeseung Choi, Chanha Park, Hyunjo Yang, Daekwon Kang, Minsu Oh, Manjae Park, James Moon, Jun Ye, Stanislas Baron
Proceedings Volume 10148, 1014813 (2017) https://doi.org/10.1117/12.2257872
KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, Atrial fibrillation, Optical lithography, Model-based design, Lithography, Defect detection, Source mask optimization, Semiconducting wafers

Proceedings Article | 24 March 2016 Paper
Gyoyeon Jo, Sunkeun Ji, Shinyoung Kim, Hyunwoo Kang, Minwoo Park, Sangwoo Kim, Jungchan Kim, Chanha Park, Hyunjo Yang, Kotaro Maruyama, Byungjun Park
Proceedings Volume 9778, 97781J (2016) https://doi.org/10.1117/12.2218937
KEYWORDS: Overlay metrology, Metrology, Optical testing, Defect inspection, Inspection, Defect detection, Control systems, Semiconductors, Databases, Distortion, Chemical mechanical planarization, Etching

Proceedings Article | 24 March 2016 Paper
Proceedings Volume 9778, 97781S (2016) https://doi.org/10.1117/12.2219467
KEYWORDS: Overlay metrology, Optical proximity correction, Diffraction, Critical dimension metrology, Metrology, Scanning electron microscopy, Electron microscopes, Optical lithography, Error analysis, Target detection

Proceedings Article | 16 March 2016 Paper
Doyoun Kim, Hyoungsoon Yune, Daejin Park, Joohong Jeong, Woosung Moon, Mingu Kim, Seyoung Oh, Chanha Park, Hyunjo Yang
Proceedings Volume 9780, 97800D (2016) https://doi.org/10.1117/12.2218858
KEYWORDS: Lithography, Source mask optimization, Optical lithography, Semiconducting wafers, Wafer-level optics, Critical dimension metrology, Ultraviolet radiation, Image compression, Photomasks, Atrial fibrillation

Proceedings Article | 19 March 2015 Paper
Sunkeun Ji, Gyun Yoo, Gyoyeon Jo, Hyunwoo Kang, Minwoo Park, Jungchan Kim, Chanha Park, Hyunjo Yang, Donggyu Yim, Kotaro Maruyama, Byungjun Park, Masahiro Yamamoto
Proceedings Volume 9424, 942415 (2015) https://doi.org/10.1117/12.2085464
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Data analysis, Etching, Optical lithography, Double patterning technology, Imaging systems, Error analysis, Distortion

Proceedings Article | 18 March 2015 Paper
Jinhyuck Jun, Minwoo Park, Chanha Park, Hyunjo Yang, Donggyu Yim, Munhoe Do, Dongchan Lee, Taehoon Kim, Junghoe Choi, Gerard Luk-Pat, Alex Miloslavsky
Proceedings Volume 9427, 94270D (2015) https://doi.org/10.1117/12.2085460
KEYWORDS: Atrial fibrillation, Semiconducting wafers, Photomasks, Critical dimension metrology, Optical proximity correction, Nanoimprint lithography, Lithography, Printing, SRAF, Manufacturing

Proceedings Article | 2 April 2014 Paper
Gyun Yoo, Jungchan Kim, Chanha Park, Taehyeong Lee, Sunkeun Ji, Gyoyeon Jo, Hyunjo Yang, Donggyu Yim, Masahiro Yamamoto, Kotaro Maruyama, Byungjun Park
Proceedings Volume 9050, 90501O (2014) https://doi.org/10.1117/12.2046294
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Computer aided design, Manufacturing, Inspection, Scanning electron microscopy, Image processing, Data processing, Metals

Proceedings Article | 28 March 2014 Paper
Proceedings Volume 9053, 90530J (2014) https://doi.org/10.1117/12.2046541
KEYWORDS: Photomasks, Optical proximity correction, SRAF, Printing, Semiconducting wafers, 3D modeling, Calibration, Optimization (mathematics), Source mask optimization, Manufacturing

Proceedings Article | 1 October 2013 Paper
Proceedings Volume 8880, 88801U (2013) https://doi.org/10.1117/12.2026140
KEYWORDS: Optical proximity correction, Image quality, Optimization (mathematics), Nanoimprint lithography, Image enhancement, Image processing, Design for manufacturing, Resolution enhancement technologies, Neodymium, Nano opto mechanical systems

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 868121 (2013) https://doi.org/10.1117/12.2011476
KEYWORDS: Photomasks, Inspection, Wafer inspection, Semiconducting wafers, Metals, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Defect inspection, Lithography

Proceedings Article | 12 April 2013 Paper
Jeonkyu Lee, Taehyeong Lee, Sangjin Oh, Chunsoo Kang, Jungchan Kim, Jaeseung Choi, Chanha Park, Hyunjo Yang, Donggyu Yim, Munhoe Do, Irene Su, Hua Song, Jung-Hoe Choi, Yongfa Fan, Anthony Wang, Sung-Woo Lee, Robert Boone, Kevin Lucas
Proceedings Volume 8683, 86830F (2013) https://doi.org/10.1117/12.2012463
KEYWORDS: Optical proximity correction, Lithography, Extreme ultraviolet, Transistors, Critical dimension metrology, Model-based design, 193nm lithography, Cadmium, Photomasks, Optical lithography

Proceedings Article | 29 March 2013 Paper
Jinhyuck Jeon, Shinyoung Kim, Jookyoung Song, Chanha Park, Hyunjo Yang, Donggyu Yim, Brian Ward, Yunqiang Zhang, Kevin Hooker, Munhoe Do, Jung-Hoe Choi, Stephen Jang
Proceedings Volume 8684, 86840H (2013) https://doi.org/10.1117/12.2011450
KEYWORDS: SRAF, Atrial fibrillation, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Photomasks, Model-based design, Manufacturing, Printing, Inspection

Proceedings Article | 5 April 2012 Paper
Taehyeong Lee, Jungchan Kim, Gyun Yoo, Chanha Park, Hyunjo Yang, Donggyu Yim, Byoungjun Park, Kotaro Maruyama, Masahiro Yamamoto
Proceedings Volume 8324, 83241B (2012) https://doi.org/10.1117/12.916110
KEYWORDS: Overlay metrology, Semiconducting wafers, Inspection, Process control, Metrology, Semiconductors, Etching, Array processing, Control systems, Line edge roughness

Proceedings Article | 20 March 2012 Paper
Proceedings Volume 8325, 83251Z (2012) https://doi.org/10.1117/12.916121
KEYWORDS: Optical proximity correction, Image processing, Lithography, Semiconducting wafers, Photoresist processing, Standards development, Reticles, Resolution enhancement technologies, Scanning electron microscopy, Lithographic illumination

Proceedings Article | 10 March 2010 Paper
Proceedings Volume 7640, 764013 (2010) https://doi.org/10.1117/12.846710
KEYWORDS: Scanners, Critical dimension metrology, Optical proximity correction, Instrument modeling, Lithographic illumination, Shape analysis, Process modeling, Semiconducting wafers, Resolution enhancement technologies, Lithography

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 76400Y (2010) https://doi.org/10.1117/12.846703
KEYWORDS: Scanners, Critical dimension metrology, Shape analysis, Optical proximity correction, Fiber optic illuminators, Semiconducting wafers, Lithography, Control systems, Instrument modeling, Process control

Proceedings Article | 14 December 2009 Paper
Kiho Yang, Daejin Park, Jeonkyu Lee, Sangjin Oh, Jinhyuck Jeon, Taejun You, Chanha Park, Donggyu Yim, Sungki Park
Proceedings Volume 7520, 75202A (2009) https://doi.org/10.1117/12.837224
KEYWORDS: Optical proximity correction, Data modeling, Calibration, Lithography, Transistors, Semiconducting wafers, Polarization, Image processing, Process modeling, Scanners

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72742W (2009) https://doi.org/10.1117/12.814087
KEYWORDS: Polarization, Critical dimension metrology, Semiconducting wafers, Lithography, Optical lithography, Resolution enhancement technologies, Polarization control, Fiber optic illuminators, Semiconductors, Metrology

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714034 (2008) https://doi.org/10.1117/12.804646
KEYWORDS: SRAF, Diffractive optical elements, Resolution enhancement technologies, Photoresist processing, Lithography, Printing, Source mask optimization, Fiber optic illuminators, Semiconducting wafers, Optical lithography

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69244V (2008) https://doi.org/10.1117/12.772446
KEYWORDS: Transistors, Optical lithography, Photomasks, Lithography, Printing, 3D image processing, Binary data, Critical dimension metrology, Etching, Photoresist processing

Proceedings Article | 27 March 2007 Paper
Chanha Park, Jongkyun Hong, Kiho Yang, Thomas Theeuwes, Frederic Gautier, Young-Hong Min, Alek Chen, Hyunjo Yang, Donggyu Yim, Jinwoong Kim
Proceedings Volume 6520, 65204X (2007) https://doi.org/10.1117/12.712366
KEYWORDS: Polarization, Critical dimension metrology, Printing, Metrology, Line edge roughness, Reticles, Picosecond phenomena, Resolution enhancement technologies, Optical lithography, Semiconductors

Proceedings Article | 20 March 2006 Paper
Proceedings Volume 6154, 61542V (2006) https://doi.org/10.1117/12.658990
KEYWORDS: Calibration, Critical dimension metrology, Photomasks, Data modeling, Scanning electron microscopy, Metrology, Cadmium, Tolerancing, Photoresist processing, Image processing

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61541K (2006) https://doi.org/10.1117/12.656897
KEYWORDS: Semiconducting wafers, Electroluminescence, Fiber optic illuminators, Photomasks, Image processing, Overlay metrology, Resolution enhancement technologies, Optical proximity correction, Photoresist processing, Scanners

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61540F (2006) https://doi.org/10.1117/12.656841
KEYWORDS: Polarization, Lithography, Line width roughness, Photomasks, Printing, Line edge roughness, Optical lithography, Zirconium, Resolution enhancement technologies, Optical proximity correction

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598625
KEYWORDS: Optical proximity correction, Lithography, Optical lithography, Resolution enhancement technologies, Semiconducting wafers, Scanners, Critical dimension metrology, Photomasks, Source mask optimization, Scattering

Proceedings Article | 24 May 2004 Paper
Hyunjo Yang, Chanha Park, Jongkyun Hong, Goomin Jeong, Byeongho Cho, Jaeseung Choi, Choonsu Kang, Kiho Yang, Eunsook Kang, Seokho Ji, Donggyu Yim, Youngwook Song
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535121
KEYWORDS: Optical proximity correction, Computer aided design, Photomasks, Scanning electron microscopy, Lithography, Semiconducting wafers, Data modeling, Optical lithography, Resolution enhancement technologies, Solid modeling

Proceedings Article | 2 June 2003 Paper
Jongkyun Hong, Chongsik Woo, Jaewoo Park, Byeong-ho Cho, Jaeseung Choi, Hyunjo Yang, Chan-ha Park, Yong-chul Shin, Youngdea Kim, Goomin Jeong, Jung-chan Kim, Khil-ohk Kang, Chunsoo Kang, Jongwoon Park, Donggyu Yim, Youngwook Song
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485026
KEYWORDS: Compact discs, Optical lithography, Monochromatic aberrations, Control systems, Interferometers, Zernike polynomials, Lithography, Optical proximity correction, Wavefronts, Semiconductors

Proceedings Article | 30 July 2002 Paper
Byeong-Ho Cho, Donggyu Yim, Chan-Ha Park, Seung-Hyuk Lee, Hyun-Jo Yang, Jae-Hak Choi, Yong-Chul Shin, Choi-Dong Kim, Jae-Sung Choi, Khil-Ohk Kang, Sang-Wook Kim, Tae-Hwa Yu, Jong-Kyun Hong, Jung-Chan Kim, Min-Seob Han, Ho-Young Heo, Young-Dae Kim, Dong-Duk Lee, Gyu-Han Yoon, Jan van Schoot, Thomas Theeuwes, Young-Hong Min
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474633
KEYWORDS: Diffraction, Lithography, Monochromatic aberrations, Optical lithography, Fourier transforms, Control systems, Phase shifts, Spatial frequencies, Scanners, Photomasks

Proceedings Article | 30 July 2002 Paper
Jan van Schoot, Oscar Noordman, Peter Vanoppen, Frans Blok, Donggyu Yim, Chan-Ha Park, Byeong-Ho Cho, Thomas Theeuwes, Young-Hong Min
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474579
KEYWORDS: Semiconducting wafers, Photomasks, Scanners, Critical dimension metrology, Optical lithography, Etching, Scanning electron microscopy, Metrology, Thin film coatings, Actuators

Proceedings Article | 14 September 2001 Paper
Chan-Ha Park, Donggyu Yim, Seung-Hyuk Lee, Hyun-Jo Yang, Jae-Hak Choi, Yong-Chul Shin, Choi-Dong Kim, Jae-Sung Choi, Khil-Ohk Kang, Sang-Wook Kim, Dong-Duk Lee, Gyu-Han Yoon
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435634
KEYWORDS: Semiconducting wafers, Scanners, Photomasks, Critical dimension metrology, Lithography, Chemical mechanical planarization, Electroluminescence, Tolerancing, Process modeling, Etching

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