Ms. Shlomit Katz Profile

Shlomit Katz

at KLA Israel

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Author

Publications (12)

Proceedings Article | 10 April 2024 Poster + Paper

Artificial intelligence measurement in imaging-based overlay metrology for performance boost

Sveta Grechin, Shlomit Katz, Kei Maeda, Tsumugi Hirasawa, Hisashi Otsubo, Seigo Aoki, Atsushi Takahashi, Atsushi Miyafuji, Ofer Manos, Yu Yang, Tal Levinson, Ran Trifon, Dor Yehuda, Hamode Hagaze, Yuval Lamhot, Yair Vardi, Yoav Grauer, Avner Safrani, Cindy Kato, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Hayashi Masanobu, Eunjoong An, Nana Lan, Simon Ahn, Nadav Gutman

Proceedings Volume 12955, 129552P (2024) https://doi.org/10.1117/12.3010281

KEYWORDS: Overlay metrology, Artificial intelligence, Semiconducting wafers, Education and training, Metrology, Evolutionary algorithms, Detection and tracking algorithms, Target acquisition, Performance modeling, Optical parametric oscillators

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Proceedings Article | 27 April 2023 Presentation + Paper

OPO improvements by Moiré effect-based imaging

Yonglei Li, Justin Lim, Nahee Park, Yuqian Zhang, Xiaolei Liu, Yasutaka Okada, Gloria Chen, Ben McClain, Erin Hollinger, Amy Weatherly, Yoav Grauer, Zephyr Liu, Raviv Yohanan, Greg Gray, Mark Stakely, Shlomit Katz, Mahendra Dubey, Neeraj Khanna

Proceedings Volume 12496, 124960R (2023) https://doi.org/10.1117/12.2658074

KEYWORDS: Design and modelling, Metrology, Overlay metrology, Process control, Inspection, Optical lithography, Imaging metrology, Semiconductors, Moire patterns

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Proceedings Article | 27 April 2023 Poster + Presentation + Paper

OPO robustness and measurability improvement via extended wavelengths

Shlomit Katz, Nikhil Aditya Kumar Roy, Steve McCandless, Jason Reece, Nathan Gillespie, Nils Monserud, Yoav Grauer, Mark Stakely, Greg Gray, Yonglei Li, Peter Kimani, Nahee Park, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Yuqian Zhang

Proceedings Volume 12496, 1249613 (2023) https://doi.org/10.1117/12.2655161

KEYWORDS: Near infrared, Opacity, Metrology, 3D metrology, Photoresist processing, Overlay metrology, Image processing, Etching, Optical gratings

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Proceedings Article | 27 April 2023 Poster + Paper

Residuals reduction in imaging-based overlay using color per layer

Shlomit Katz, Suk Won Park, Joonsang You, Hyunjun Kim, Honggoo Lee, Jungchan Kim, Dongyoung Lee, Hongbok Yeon, Joonseuk Lee, Sang-Ho Lee, Jae Wook Seo, Dor Yehuda, Junho Kim, Hongcheon Yang, Dohwa Lee, Nanglyeom Oh, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Ohad Bachar

Proceedings Volume 12496, 1249626 (2023) https://doi.org/10.1117/12.2655681

KEYWORDS: Metrology, Overlay metrology, High volume manufacturing, Optical parametric oscillators, Optical gratings, Visualization

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Proceedings Article | 26 May 2022 Presentation + Paper

Optical overlay metrology trends in advanced nodes

Shlomit Katz, Yoav Grauer, Efi Megged

Proceedings Volume 12053, 120530N (2022) https://doi.org/10.1117/12.2605863

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, 3D metrology, Semiconductors, Opacity, Optical parametric oscillators, Infrared imaging, 3D acquisition, Photoresist processing

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Proceedings Article | 26 May 2022 Poster + Paper

Prediction and optimization of small scatterometry based overlay targets

Rawi Dirawi, Shlomit Katz, Renan Milo, Nadav Gutman

Proceedings Volume 12053, 120531E (2022) https://doi.org/10.1117/12.2608241

KEYWORDS: Overlay metrology, Metrology, Scatterometry, Semiconductors, Semiconductor manufacturing, Manufacturing, Inspection, Standards development

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Robustness improvement in imaging-based overlay metrology for high topography layers by Talbot targets

Brian Watson, Shlomit Katz, Richard Housley, Kar Wui Thong, Nikhil Aditya Kumar Roy, Yoav Grauer, Diana Shapirov, Raviv Yohanan, Greg Gray, Yonglei Li, Daniel Chalom

Proceedings Volume 11611, 1161133 (2021) https://doi.org/10.1117/12.2583831

KEYWORDS: Metrology, Optical parametric oscillators, Overlay metrology, Imaging metrology, 3D metrology, 3D acquisition

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Proceedings Article | 22 February 2021 Presentation + Paper

Process variation impacts on optical overlay accuracy signature

Rawi Dirawi, Shlomit Katz, Roie Volkovich

Proceedings Volume 11611, 116112P (2021) https://doi.org/10.1117/12.2583616

KEYWORDS: Semiconducting wafers, Wafer-level optics, Tin, Etching, Chemical mechanical planarization, Amorphous silicon

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Accuracy enhancement in imaging-based overlay metrology by optimizing measurement conditions per layer

Shlomit Katz, Yoav Grauer, Raviv Yohanan, Xiaolei Liu, Daria Negri, Anna Golotsvan

Proceedings Volume 11611, 116112O (2021) https://doi.org/10.1117/12.2583615

KEYWORDS: Overlay metrology, Computer simulations

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Proceedings Article | 20 March 2020 Paper

OPO residuals improvement with imaging metrology for 3D NAND

Shlomit Katz, Anna Golotsvan, Yoav Grauer, Efi Megged, Greg Gray, Fiona (Shuk Fan) Leung, Pek Beng Ong, Shi Lei, Jeremy (Shi-Ming) Wei, Wayne (Wei) Zhou, Linfei Gao

Proceedings Volume 11325, 113252J (2020) https://doi.org/10.1117/12.2551874

KEYWORDS: Overlay metrology, Semiconducting wafers, 3D acquisition, 3D image processing, Imaging metrology, Scanning electron microscopy, Optimization (mathematics), Photovoltaics

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Proceedings Article | 20 March 2020 Paper

Machine learning for Tool Induced Shift (TIS) reduction

Shlomit Katz, Boaz Ophir, Udi Shusterman, Anna Golotsvan, Liran Yerushalmi, Efi Megged, Yoav Grauer, Jian Zhang, Alimei Shih, Shi-Ming Wei, Judith Yep, Fiona (Shuk Fan) Leung, Pek Beng Ong

Proceedings Volume 11325, 113252C (2020) https://doi.org/10.1117/12.2550747

KEYWORDS: Semiconducting wafers, Overlay metrology, Machine learning, Metrology, Data modeling, 3D modeling, Performance modeling

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Proceedings Article | 20 March 2020 Paper

OPO residuals reduction with imaging metrology color per layer mode

Shlomit Katz, Honggoo Lee, Dongyoung Lee, Jinsoo Kim, Jaesun Woo, Chunsoo Kang, Chanha Park, Dohwa Lee, Seongjae Lee, Sanghuck Jeon, Dongsub Choi, Anna Golotsvan, Roie Volkivich, Efi Megged

Proceedings Volume 11325, 113252E (2020) https://doi.org/10.1117/12.2541933

KEYWORDS: Metrology, Overlay metrology, Optical filters, Optical parametric oscillators, 3D metrology, Semiconducting wafers, Near infrared, Photoresist materials, Imaging metrology, Wafer-level optics

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Showing 5 of 12 publications

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