Dr. Rainer Zimmermann
at Synopsys GmbH
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 9 April 2024 Presentation + Paper
Lawrence Melvin, Maryvonne Chalony, Andrew M. Dawes, Bernd Kuechler, Rainer Zimmermann, Emilie Viasnoff, Ying Zhou, Al Blais
Proceedings Volume 12958, 129580A (2024) https://doi.org/10.1117/12.3010491
KEYWORDS: Manufacturing, Design, Lithography, Metalenses, Optics manufacturing, Etching, Optical proximity correction, Optical components, Scanners, Silicon

Proceedings Article | 17 October 2023 Presentation + Paper
M. Chalony, B. Küchler, R. Zimmermann, C. Xu, L. Melvin, E. Viasnoff
Proceedings Volume 12741, 1274105 (2023) https://doi.org/10.1117/12.3000524
KEYWORDS: Manufacturing, Design and modelling, Etching, Metalenses, Optics manufacturing, Lithography

Proceedings Article | 5 October 2023 Paper
Rainer Zimmermann, Joost Bekaert, Mariya Braylovska, Balakumar Baskaran, Vicky Philipsen, Martin Bohn, Michael Bachmann, Ulrich Klostermann, Eric Hendrickx, Wolfgang Demmerle
Proceedings Volume 12802, 128020J (2023) https://doi.org/10.1117/12.2675486
KEYWORDS: Scanning electron microscopy, Contour extraction, Lithography, Semiconducting wafers, Critical dimension metrology, Calibration, Image quality, Contour modeling, Mask making

Proceedings Article | 1 May 2023 Presentation + Paper
Maryvonne Chalony, Lawrence Melvin, Rainer Zimmermann, Bernd Küchler, Emilie Viasnoff, Robert Scarmozzino, Daniel Herrmann, Yves Saad, Phil Stopford, Thuc Dam, Ulrich Klostermann, Wolfgang Demmerle, Al Blais, Remco Stoffer
Proceedings Volume 12499, 124990A (2023) https://doi.org/10.1117/12.2658788
KEYWORDS: Design and modelling, Manufacturing, Polarization, Optics manufacturing, Photonic devices, Optical lithography, Incident light, Metalenses, Geometrical optics, Optical proximity correction

Proceedings Article | 26 May 2022 Presentation + Paper
Rainer Zimmermann, Luis Orbe, Bernd Küchler, Ji Li, Jim Burdorf, William Stanton, Tung-Yu Su, Remco Stoffer, Ulrich Klostermann, Wolfgang Demmerle
Proceedings Volume 12148, 1214809 (2022) https://doi.org/10.1117/12.2620724
KEYWORDS: Optical proximity correction, Photomasks, Waveguides, Photonic devices, Lithography, Line edge roughness, Stochastic processes, Photonics, Signal to noise ratio

Showing 5 of 14 publications
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