Dr. Anuja De Silva
Technical Director at Lam Research
SPIE Involvement:
Membership & Communities Committee | Conference Program Committee | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author
Publications (54)

Proceedings Article | 13 November 2024 Presentation
Ali Haider, Shruti Jambaldini, Mohand Brouri, Francesco Gullo, Zhengtao Chen, Anuja De Silva, Rich Wise, Matteo Beggiato, Christophe Beral, Hyo Seon Suh, Danilo De Simone
Proceedings Volume PC13215, PC1321506 (2024) https://doi.org/10.1117/12.3034635
KEYWORDS: Extreme ultraviolet, Optical lithography, Photoresist processing, Printing, Plasma, Inspection, Extreme ultraviolet lithography, Chemistry, Chemical composition, Capillaries

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12954, 129540L (2024) https://doi.org/10.1117/12.3010127
KEYWORDS: SRAF, Printing, Semiconducting wafers, Optical proximity correction, Photoresist processing, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet

SPIE Journal Paper | 17 November 2023
JM3, Vol. 22, Issue 04, 044001, (November 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.044001
KEYWORDS: Line width roughness, Fourier transforms, Critical dimension metrology, Metrology, Signal to noise ratio, Film thickness, Extreme ultraviolet lithography, Scanning electron microscopy, Photoresist processing, Image analysis

Proceedings Article | 30 April 2023 Presentation
Hyo Seon Suh, Danilo De Simone, Christophe Beral, Mihir Gupta, Nadia Vandenbroeck, Anuja De Silva, Ali Haider, Ching-Chung Huang, Mohand Brouri, Francesco Gullo, Shruti Jambaldinni, Benjamin Kam, Hicham Zaid, Elisseos Verveniotis, Samantha Tan, Tim Weidman, Jengyi Yu, Da Li, Jun Xue, Younghee Lee
Proceedings Volume 12498, 1249803 (2023) https://doi.org/10.1117/12.2661652
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist processing, Materials processing, Interfaces

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 1249612 (2023) https://doi.org/10.1117/12.2658280
KEYWORDS: Fourier transforms, Signal to noise ratio, Bridges, Inspection, Printing, Metrology, Film thickness, Extreme ultraviolet lithography, Atomic force microscopy, Defect detection

SPIE Journal Paper | 13 December 2022 Open Access
JM3, Vol. 21, Issue 04, 041401, (December 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041401
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Photoresist developing, Industry, Extreme ultraviolet, Stochastic processes, Semiconductors, Metals, High volume manufacturing, Electron beam lithography

Proceedings Article | 13 June 2022 Presentation
Mohammed Alvi, Richard Gottscho, Ali Haider, Seongjun Heo, PingYen Hsieh, Ching-Chung Huang, Gosia Jurczak, Benjamin Kam, Ji Yeon Kim, Billie Li, Da Li, Henry Nguyen, Yang Pan, Daniel Peter, Nader Shamma, Anuja De Silva, Samantha Tan, Ethen Wang, Timothy Weidman, Rich Wise, Morrey Wu, Elisseos Verveniotis, Boris Volosskiy, Jengyi Yu, Hicham Zaid
Proceedings Volume PC12055, PC120550B (2022) https://doi.org/10.1117/12.2623499
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Optical lithography, Electron beam lithography, Semiconducting wafers, Photoresist processing, Etching, Inspection, Wafer inspection

Proceedings Article | 24 February 2021 Presentation + Paper
Proceedings Volume 11609, 116090U (2021) https://doi.org/10.1117/12.2582563
KEYWORDS: Optical lithography, Etching, Stochastic processes, Semiconducting wafers, Resolution enhancement technologies, Extreme ultraviolet lithography, Scanners, Inspection, Source mask optimization, Photoresist processing

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11609, 116090P (2021) https://doi.org/10.1117/12.2583566
KEYWORDS: Extreme ultraviolet lithography, Roads, Extreme ultraviolet, Optical lithography, Yield improvement, Transistors, Printing, Modulation, Metals, Materials processing

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11609, 116090G (2021) https://doi.org/10.1117/12.2582476
KEYWORDS: Optical lithography, Stochastic processes, Extreme ultraviolet, Photon counting, Modulation, Lithography, Extreme ultraviolet lithography, Deep ultraviolet

SPIE Journal Paper | 1 July 2020 Open Access
JM3, Vol. 19, Issue 03, 034001, (July 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.3.034001
KEYWORDS: Stochastic processes, Fiber optic illuminators, Line edge roughness, Critical dimension metrology, Defect inspection, Extreme ultraviolet, Inspection, Optical lithography, Yield improvement

Proceedings Article | 24 March 2020 Presentation
Proceedings Volume 11323, 113230M (2020) https://doi.org/10.1117/12.2551319
KEYWORDS: Optical lithography, Stochastic processes, Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Photoresist materials, Photoresist developing, Lithography, Interfaces, Absorbance

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11323, 113230O (2020) https://doi.org/10.1117/12.2551487
KEYWORDS: Stochastic processes, Line edge roughness, Inspection, Defect inspection, Critical dimension metrology, Extreme ultraviolet, Optical lithography, Etching, Bridges

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11323, 113230P (2020) https://doi.org/10.1117/12.2551612
KEYWORDS: Scanners, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Carbon, Contamination, Calibration, Sensors, Extreme ultraviolet

Proceedings Article | 23 March 2020 Paper
Proceedings Volume 11326, 1132609 (2020) https://doi.org/10.1117/12.2551967
KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Ions, Optical lithography, Stochastic processes, Data modeling, Interfaces, Solids, Systems modeling

Proceedings Article | 16 October 2019 Presentation
Proceedings Volume 11147, 111470W (2019) https://doi.org/10.1117/12.2539272
KEYWORDS: Stochastic processes, Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Photoresist materials, Etching, Photoresist developing, Lithography, Interfaces, Absorbance

Proceedings Article | 16 October 2019 Presentation
Proceedings Volume 11147, 1114718 (2019) https://doi.org/10.1117/12.2539037
KEYWORDS: Stochastic processes, Modulation, Extreme ultraviolet lithography, Optical lithography, Image resolution, Photomasks, Etching, Extreme ultraviolet, Line edge roughness

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109570F (2019) https://doi.org/10.1117/12.2515926
KEYWORDS: Stochastic processes, Extreme ultraviolet, Diffusion, Etching, Optical lithography, Critical dimension metrology, Line edge roughness, Inspection, Modulation, Extreme ultraviolet lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 1095710 (2019) https://doi.org/10.1117/12.2515365
KEYWORDS: Phase shifts, Extreme ultraviolet lithography, Palladium, Phase shifting, Extreme ultraviolet, Nickel, Photomasks, Lithography, Lithographic illumination, Defect inspection

Proceedings Article | 25 March 2019 Presentation
Proceedings Volume 10960, 109600P (2019) https://doi.org/10.1117/12.2515465
KEYWORDS: Atomic layer deposition, Etching, Lithography, Self-assembled monolayers, Photomasks, Overlay metrology, Semiconductors, Hydrogen, Polymer thin films, Polymers

Proceedings Article | 3 October 2018 Presentation + Paper
Proceedings Volume 10809, 1080916 (2018) https://doi.org/10.1117/12.2501824
KEYWORDS: Polymers, Semiconductors, Interfaces, Silicon, Head-mounted displays, Etching, Electron beam lithography, Optical lithography, Semiconductor materials, Oxides

SPIE Journal Paper | 5 September 2018
Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson Felix, Chris Robinson, Benjamin Briggs, Shravan Matham, Yann Mignot, Jeffrey Shearer, Bassem Hamieh, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Ko Akiteru, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Hiroshi Ichinomiya, Akiko Kai, Koichiro Tanaka, Ankit Jain, Heungsoo Choi, Barry Saville, Chet Lenox
JM3, Vol. 18, Issue 01, 011006, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011006
KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

SPIE Journal Paper | 31 July 2018
JM3, Vol. 18, Issue 01, 011004, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011004
KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Head-mounted displays, Silicon, Chemistry, Amorphous silicon, Argon, Polymers, Interfaces

Proceedings Article | 9 April 2018 Presentation + Paper
Proceedings Volume 10586, 105860I (2018) https://doi.org/10.1117/12.2297113
KEYWORDS: Chemistry, Polymers, Printing, Etching, Optical lithography, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Dielectrics, Semiconducting wafers

Proceedings Article | 28 March 2018 Presentation + Paper
Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson Felix, Chris Robinson, Benjamin Briggs, Shravan Matham, Yann Mignot, Jeffrey Shearer, Bassem Hamieh, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Ko Akiteru, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Hiroshi Ichinomiya, Akiko Kai, Koichiro Tanaka, Ankit Jain, Heungsoo Choi, Barry Saville, Chet Lenox
Proceedings Volume 10583, 105830E (2018) https://doi.org/10.1117/12.2297362
KEYWORDS: Inspection, Semiconducting wafers, Etching, Stochastic processes, Extreme ultraviolet, Modulation, Defect detection, Extreme ultraviolet lithography, Coating, Electron beam lithography

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830V (2018) https://doi.org/10.1117/12.2296751
KEYWORDS: Etching, Optical lithography, Chemistry, Head-mounted displays, Silicon, Argon, Amorphous silicon, Polymers, Extreme ultraviolet, Interfaces

Proceedings Article | 16 October 2017 Presentation + Paper
Anuja De Silva, Yann Mignot, Luciana Meli, Scott DeVries, Yongan Xu, Indira Seshadri, Nelson Felix, Wilson Zeng, Yong Cao, Khoi Phan, Huixiong Dai, Christopher Ngai, Michael Stolfi, Daniel Diehl
Proceedings Volume 10450, 104501A (2017) https://doi.org/10.1117/12.2280607
KEYWORDS: Amorphous silicon, Optical lithography, Etching, Photoresist materials, Silicon, Head-mounted displays, Silicon films, Chemical vapor deposition, Extreme ultraviolet, Physical vapor deposition

Proceedings Article | 16 October 2017 Paper
Proceedings Volume 10450, 104501U (2017) https://doi.org/10.1117/12.2280506
KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Line width roughness, Coating, Manufacturing, Contamination

SPIE Journal Paper | 28 August 2017
JM3, Vol. 16, Issue 03, 033506, (August 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.033506
KEYWORDS: Oxides, Polymers, Extreme ultraviolet, Optical lithography, Head-mounted displays, Etching, Atomic layer deposition, Chemistry, Plasma enhanced chemical vapor deposition, Printing

SPIE Journal Paper | 23 May 2017
Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hoa Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy
JM3, Vol. 16, Issue 02, 023504, (May 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023504
KEYWORDS: Titanium dioxide, Metals, Atomic layer deposition, Optical lithography, Etching, Dry etching, Contamination, Modulation, Wet etching, Lithography

Proceedings Article | 28 March 2017 Paper
Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson Felix, Richard Johnson, Cody Murray, Alex Hubbard, Danielle Durrant, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Shinichiro Kawakami, Koichi Matsunaga
Proceedings Volume 10143, 101430Y (2017) https://doi.org/10.1117/12.2260146
KEYWORDS: Extreme ultraviolet, Optical lithography, Coating, Composites, Manufacturing, Inspection, Semiconducting wafers, Scanning electron microscopy, Extreme ultraviolet lithography, Defect detection, Laser scattering, Air contamination

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10146, 1014607 (2017) https://doi.org/10.1117/12.2257933
KEYWORDS: Extreme ultraviolet, Etching, Image resolution, Line width roughness, Interfaces, Semiconducting wafers, Materials processing, Photoresist processing, Silicon, Head-mounted displays, Extreme ultraviolet lithography, Systems modeling, Oxides

Proceedings Article | 27 March 2017 Presentation + Paper
Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hao Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy
Proceedings Volume 10146, 1014615 (2017) https://doi.org/10.1117/12.2258380
KEYWORDS: Metals, Titanium, Lithography, Optical lithography, Dry etching, Etching, Photoresist materials, Titanium dioxide, Wet etching, Plasma, Carbon

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10146, 1014603 (2017) https://doi.org/10.1117/12.2260479
KEYWORDS: Directed self assembly, Plasma etching, Optical lithography, Etching, Logic, Lithography, Manufacturing, Nanofabrication, Silicon, Metals, Extreme ultraviolet, Line edge roughness, Optical alignment, Critical dimension metrology

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10143, 101431G (2017) https://doi.org/10.1117/12.2261216
KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Materials processing, Photoresist processing, Etching, Metals, Quantum efficiency, Photoresist materials, Interfaces, Silicon

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10143, 101431D (2017) https://doi.org/10.1117/12.2258565
KEYWORDS: Extreme ultraviolet, Optical lithography, Polymers, Etching, Extreme ultraviolet lithography, Photoresist materials, Lithography, Photoresist processing, Back end of line, Oxides, Head-mounted displays, Atomic layer deposition, Chemistry

Proceedings Article | 4 April 2016 Paper
Proceedings Volume 9777, 97770L (2016) https://doi.org/10.1117/12.2219706
KEYWORDS: Directed self assembly, Polymethylmethacrylate, Picosecond phenomena, Etching, Global Positioning System, Critical dimension metrology, Optical lithography, Lithography, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 18 March 2016 Paper
Nelson Felix, Dan Corliss, Karen Petrillo, Nicole Saulnier, Yongan Xu, Luciana Meli, Hao Tang, Anuja De Silva, Bassem Hamieh, Martin Burkhardt, Yann Mignot, Richard Johnson, Chris Robinson, Mary Breton, Indira Seshadri, Derren Dunn, Stuart Sieg, Eric Miller, Genevieve Beique, Andre Labonte, Lei Sun, Geng Han, Erik Verduijn, Eunshoo Han, Bong Cheol Kim, Jongsu Kim, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Shinichiro Kawakami, Koichi Matsunaga
Proceedings Volume 9776, 97761O (2016) https://doi.org/10.1117/12.2219894
KEYWORDS: Extreme ultraviolet, Optical lithography, Lithography, Extreme ultraviolet lithography, Oxides, Neodymium, Ions, Etching

Proceedings Article | 27 March 2014 Paper
Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, Srinivasan Balakrishnan, Luisa Bozano, Ananthakrishnan Sankaranarayanan, Krishna Bajjuri, Daniel Sanders, Carl Larson, Anuja DeSilva, Martin Glodde
Proceedings Volume 9051, 905115 (2014) https://doi.org/10.1117/12.2046357
KEYWORDS: Fourier transforms, Chemical vapor deposition, Photoresist materials, Resistance, Carbon, Photomasks, Optical lithography, Lithography, Glasses

Proceedings Article | 9 September 2013 Paper
Dongbing Shao, Bidan Zhang, Shayak Banerjee, Hong Kry, Anuja De Silva, Ranee Kwong, Kisup Chung, Yea-Sen Lin, Alan Leslie
Proceedings Volume 8880, 88802L (2013) https://doi.org/10.1117/12.2029356
KEYWORDS: Critical dimension metrology, Silicon, Etching, Semiconducting wafers, Optical proximity correction, Reflectivity, Near field optics, Computational lithography, Optical lithography, Data modeling

Proceedings Article | 20 March 2012 Paper
Goji Wakamatsu, Kentaro Goto, Yoshi Hishiro, Taiichi Furukawa, Satoru Murakami, Masayuki Motonari, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Anuja DeSilva, Noel Arellano, Luisa Bozano, Carl Larson, Martin Glodde, Ratnam Sooriyakumaran
Proceedings Volume 8325, 83250T (2012) https://doi.org/10.1117/12.915698
KEYWORDS: Etching, Resistance, Hydrogen, Chemical vapor deposition, Fluorine, Fourier transforms, Optical lithography, Critical dimension metrology, Double patterning technology, Extreme ultraviolet

Proceedings Article | 16 April 2011 Paper
Martin Glodde, Sebastian Engelmann, Michael Guillorn, Sivananda Kanakasabapathy, Erin Mclellan, Chiew-Seng Koay, Yunpeng Yin, Muthumanickam Sankarapandian, John Arnold, Karen Petrillo, Markus Brink, Hiroyuki Miyazoe, E. Anuja de Silva, Hakeem Yusuff, Kwang-sub Yoon, Yayi Wei, Chung-hsi Wu, P. Rao Varanasi
Proceedings Volume 7972, 797216 (2011) https://doi.org/10.1117/12.879442
KEYWORDS: Reactive ion etching, Etching, Ions, Plasma, Hydrogen, Gases, Plasma etching, Silicon, Oxides, Electron beam lithography

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 79721Z (2011) https://doi.org/10.1117/12.881735
KEYWORDS: Magnesium, Lithography, Glasses, Silicon, Extreme ultraviolet lithography, Electron beam lithography, Molecules, Extreme ultraviolet, Polymers, Thin films

Proceedings Article | 3 April 2010 Paper
David Pires, Armin Knoll, Urs Duerig, Ute Drechsler, Michel Despont, Heiko Wolf, James Hedrick, Ekmini de Silva
Proceedings Volume 7637, 76371E (2010) https://doi.org/10.1117/12.847290
KEYWORDS: Optical lithography, Glasses, Silicon, Reactive ion etching, Lithography, Etching, Electron beam lithography, Molecules, Nanostructures, Sensors

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72732N (2009) https://doi.org/10.1117/12.814147
KEYWORDS: Etching, Glasses, Molecules, Resistance, Lithography, Magnesium, 193nm lithography, Polymers, Boron, Photoresist materials

Proceedings Article | 1 April 2009 Paper
W. Wallace, K. Flynn, C. Guttman, D. VanderHart, V. Prabhu, A. De Silva, N. Felix, C. Ober
Proceedings Volume 7273, 72732L (2009) https://doi.org/10.1117/12.813680
KEYWORDS: Ions, Mass spectrometry, Calibration, Polymers, Molecular spectroscopy, Glasses, Molecules, Photoresist materials, Ionization, Molecular lasers

Proceedings Article | 15 April 2008 Paper
Proceedings Volume 6923, 692317 (2008) https://doi.org/10.1117/12.773018
KEYWORDS: Diffusion, Polymers, Photoresist materials, Glasses, FT-IR spectroscopy, Switches, Temperature metrology, Solids, Image resolution, Extreme ultraviolet

Proceedings Article | 15 April 2008 Paper
Proceedings Volume 6923, 69231L (2008) https://doi.org/10.1117/12.772644
KEYWORDS: Magnesium, Line edge roughness, Polymers, Glasses, Lithography, Extreme ultraviolet lithography, Etching, Extreme ultraviolet, Photoresist materials, Resistance

Proceedings Article | 15 April 2008 Paper
Proceedings Volume 6923, 69231M (2008) https://doi.org/10.1117/12.773048
KEYWORDS: Magnesium, Diffusion, Polarization, Crystals, Molecules, Glasses, Thermodynamics, Photoresist materials, Solids, Spherical lenses

Proceedings Article | 4 April 2008 Paper
Proceedings Volume 6923, 69233L (2008) https://doi.org/10.1117/12.772635
KEYWORDS: Glasses, Polymers, Photoresist materials, Molecules, Carbon dioxide, Photoresist developing, Magnesium, Optical lithography, Silicon, Electron beam lithography

Proceedings Article | 3 April 2008 Paper
Proceedings Volume 6923, 69232B (2008) https://doi.org/10.1117/12.773036
KEYWORDS: Line width roughness, Magnesium, Extreme ultraviolet lithography, Atomic force microscopy, Extreme ultraviolet, Photoresist materials, Image processing, Switches, Image quality, Photoresist developing

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69230O (2008) https://doi.org/10.1117/12.772667
KEYWORDS: Magnesium, Glasses, Polymers, Line edge roughness, Molecules, Extreme ultraviolet lithography, Photoresist materials, Optical lithography, Lithography, Photoresist developing

Proceedings Article | 15 March 2007 Paper
Xavier André, Jin Kyun Lee, Anuja De Silva, Nelson Felix, Christopher Ober, Heidi Cao, Hai Deng, Hiroto Kudo, Daisuke Watanabe, Tadatomi Nishikubo
Proceedings Volume 6519, 65194B (2007) https://doi.org/10.1117/12.722919
KEYWORDS: Glasses, Lithography, Magnesium, Photoresist materials, Electron beam lithography, Deep ultraviolet, Photoresist developing, Polymers, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 615341 (2006) https://doi.org/10.1117/12.656559
KEYWORDS: Glasses, Silicon, Extreme ultraviolet lithography, Photoresist materials, Crystals, Molecules, Extreme ultraviolet, Chemical species, Chlorine, Lithography

Showing 5 of 54 publications
Conference Committee Involvement (14)
International Conference on Extreme Ultraviolet Lithography 2025
21 September 2025 | Monterey, California, United States
Advances in Patterning Materials and Processes XLII
24 February 2025 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2024
30 September 2024 | Monterey, California, United States
Advances in Patterning Materials and Processes XLI
26 February 2024 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2023
2 October 2023 | Monterey, California, United States
Advances in Patterning Materials and Processes XL
27 February 2023 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2022
26 September 2022 | Monterey, California, United States
Advances in Patterning Materials and Processes XXXIX
25 April 2022 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2021
27 September 2021 | Online Only, United States
Advances in Patterning Materials and Processes XXXVIII
22 February 2021 | Online Only, California, United States
International Conference on Extreme Ultraviolet Lithography 2020
21 September 2020 | Online Only, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2019
16 September 2019 | Monterey, California, United States
Advances in Patterning Materials and Processes XXXVI
25 February 2019 | San Jose, California, United States
Showing 5 of 14 Conference Committees
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