Mr. Yusaku Hashimoto Profile

Yusaku Hashimoto

at Tokyo Electron Kyushu Ltd

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 23 March 2020 Paper

CD uniformity improvement for sub 20 nm DRAM process with negative tone development

Y. C. Lin, Mifong Wu, Le Wang, Baijun Sun, Hiroki Ohtaguro, Takeshi Shimoaoki, Yusaku Hashimoto, Koichi Hontake

Proceedings Volume 11326, 1132620 (2020) https://doi.org/10.1117/12.2551835

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Image processing, Particles, Manufacturing, Inspection, Photomasks, Arsenic, Extreme ultraviolet lithography, Etching

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Proceedings Article | 10 October 2018 Paper

Improvement of CD stability and defectivity in resist coating and developing process in EUV lithography process

Yuya Kamei, Shinichiro Kawakami, Masahide Tadokoro, Yusaku Hashimoto, Takeshi Shimoaoki, Masashi Enomoto, Kathleen Nafus, Akihiro Sonoda, Philippe Foubert

Proceedings Volume 10809, 1080924 (2018) https://doi.org/10.1117/12.2500896

KEYWORDS: Particles, Critical dimension metrology, Extreme ultraviolet lithography, Coating, Photoresist processing, Semiconducting wafers, Stochastic processes, Scanners, System on a chip, Extreme ultraviolet

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SPIE Journal Paper | 5 September 2018

Defect detection strategies and process partitioning for single-expose EUV patterning

Luciana Meli, Karen Petrillo, Anuja De Silva, John Arnold, Nelson Felix, Chris Robinson, Benjamin Briggs, Shravan Matham, Yann Mignot, Jeffrey Shearer, Bassem Hamieh, Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Ko Akiteru, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Hiroshi Ichinomiya, Akiko Kai, Koichiro Tanaka, Ankit Jain, Heungsoo Choi, Barry Saville, Chet Lenox

JM3, Vol. 18, Issue 01, 011006, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011006

KEYWORDS: Inspection, Semiconducting wafers, Stochastic processes, Extreme ultraviolet, Etching, Defect detection, Electron beam lithography, Modulation, Coating, Extreme ultraviolet lithography

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Proceedings Article | 28 March 2018 Presentation + Paper

Defect detection strategies and process partitioning for SE EUV patterning

Proceedings Volume 10583, 105830E (2018) https://doi.org/10.1117/12.2297362

KEYWORDS: Inspection, Semiconducting wafers, Etching, Stochastic processes, Extreme ultraviolet, Modulation, Defect detection, Extreme ultraviolet lithography, Coating, Electron beam lithography

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Proceedings Article | 19 March 2018 Paper

Resist coating and developing process technology toward EUV manufacturing sub-7nm node

Yuya Kamei, Takahiro Shiozawa, Shinichiro Kawakami, Hideo Shite, Hiroshi Ichinomiya, Yusaku Hashimoto, Masashi Enomoto, Kathleen Nafus, Akihiro Sonoda, Marc Demand, Philippe Foubert

Proceedings Volume 10583, 105831V (2018) https://doi.org/10.1117/12.2297203

KEYWORDS: Semiconducting wafers, Particles, Critical dimension metrology, Extreme ultraviolet lithography, Extreme ultraviolet, Manufacturing, Photoresist processing, System on a chip, Coating, Yield improvement

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Proceedings Article | 16 October 2017 Paper

Coater/developer based techniques to improve high-resolution EUV patterning defectivity

Koichi Hontake, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Akiteru Ko, Shinichiro Kawakami, Takeshi Shimoaoki, Yusaku Hashimoto, Koichiro Tanaka, Karen Petrillo, Luciana Meli, Anuja De Silva, Yongan Xu, Nelson Felix, Richard Johnson, Cody Murray, Alex Hubbard

Proceedings Volume 10450, 104501U (2017) https://doi.org/10.1117/12.2280506

KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Line width roughness, Coating, Manufacturing, Contamination

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Showing 5 of 6 publications

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