Hideo Shite
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 19 March 2018 Paper
Proceedings Volume 10583, 105831V (2018) https://doi.org/10.1117/12.2297203
KEYWORDS: Semiconducting wafers, Particles, Critical dimension metrology, Extreme ultraviolet lithography, Extreme ultraviolet, Manufacturing, Photoresist processing, System on a chip, Coating, Yield improvement

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10143, 1014326 (2017) https://doi.org/10.1117/12.2257931
KEYWORDS: Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Coating, High volume manufacturing, Semiconducting wafers, Neodymium, Particles, System on a chip, Silicon

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86792T (2013) https://doi.org/10.1117/12.2011514
KEYWORDS: Photoresist processing, Semiconducting wafers, Extreme ultraviolet, Line width roughness, Standards development, Extreme ultraviolet lithography, Coating, Inspection, Image processing, Plasma

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83222Y (2012) https://doi.org/10.1117/12.916388
KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line width roughness, Photoresist processing, Image processing, Scanners, Manufacturing, Particles

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 796937 (2011) https://doi.org/10.1117/12.879406
KEYWORDS: Photoresist processing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Standards development, Manufacturing, Particles, Critical dimension metrology

Proceedings Article | 7 April 2011 Paper
Proceedings Volume 7969, 796911 (2011) https://doi.org/10.1117/12.879449
KEYWORDS: Extreme ultraviolet, Lithography, Photoresist processing, Data modeling, Calibration, Polymers, Semiconducting wafers, Extreme ultraviolet lithography, Autoregressive models, Data mining

SPIE Journal Paper | 1 January 2011
JM3, Vol. 10, Issue 1, 013017, (January 2011) https://doi.org/10.1117/12.10.1117/1.3555090
KEYWORDS: Extreme ultraviolet, Diffusion, Polymers, Data modeling, Line width roughness, Extreme ultraviolet lithography, Quantum efficiency, Absorbance, Silicon, Contamination

Proceedings Article | 30 March 2010 Paper
Proceedings Volume 7639, 763914 (2010) https://doi.org/10.1117/12.846318
KEYWORDS: Line width roughness, Photoresist processing, Etching, Image processing, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Image analysis, Coating, Critical dimension metrology

Proceedings Article | 26 March 2010 Paper
Proceedings Volume 7639, 76390M (2010) https://doi.org/10.1117/12.847489
KEYWORDS: Extreme ultraviolet, Polymers, Diffusion, Line width roughness, Data modeling, Quantum efficiency, Silicon, Absorbance, Interfaces, Contamination

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 763630 (2010) https://doi.org/10.1117/12.846610
KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Photomasks, Photoresist processing, Manufacturing, Wafer testing, Lithography, Reticles

Proceedings Article | 1 April 2009 Paper
K. Nafus, T. Shimoaoki, M. Enomoto, H. Shite, T. Otsuka, H. Kosugi, T. Shibata, J. Mallmann, R. Maas, C. Verspaget, E. van der Heijden, E. van Setten, J. Finders, S. Wang, N. Boudou, C. Zoldesi
Proceedings Volume 7273, 727338 (2009) https://doi.org/10.1117/12.813485
KEYWORDS: Semiconducting wafers, Particles, Scanners, Critical dimension metrology, Photomicroscopy, Photoresist processing, Contamination, Etching, Polymers, Bridges

Proceedings Article | 1 April 2009 Paper
T. Tomita, H. Weichert, S. Hornig, S. Trepte, H. Shite, R. Uemura, J. Kitano
Proceedings Volume 7273, 72734C (2009) https://doi.org/10.1117/12.814174
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Control systems, Immersion lithography, Manufacturing, High volume manufacturing, Process control, Polymers, Lithography

Proceedings Article | 14 May 2004 Paper
Yuichi Terashita, Mamoko Shizukuishi, Hideo Shite, Hideharu Kyoda, Kazuhiko Oshima, Kosuke Yoshihara
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534997
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photoresist materials, Photoresist developing, Temperature metrology, Diffusion, Photomasks, Semiconductor manufacturing, Manufacturing, Optical lithography

Showing 5 of 13 publications
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