Dr. Dominik Metzler Profile

Dr. Dominik Metzler

Advisory Engineer at IBM Research

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Publications (7)

Proceedings Article | 13 June 2022 Presentation

Etch and patterning development for 2nm node nanosheet devices

Eric Miller, Indira Seshadri, Tsung-Sheng Kang, Dominik Metzler, Joe Lee, Stuart Sieg, Sebastian Engelmann, Jeff Shearer, John Arnold, Nelson Felix

Proceedings Volume PC12056, PC120560A (2022) https://doi.org/10.1117/12.2614316

KEYWORDS: Optical lithography, Etching, Plasma etching, Plasma, Nanotechnology, Extreme ultraviolet, Line width roughness, Ions, Fin field effect transistors, Extreme ultraviolet lithography

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Proceedings Article | 24 March 2020 Presentation

Exploration of pillar local CDU improvement options for AI applications (Conference Presentation)

Chi-Chun Liu, Hao Tang, Yann Mignot, Ashim Dutta, Jennifer Church, Saumya Sharma, Dominik Metzler, Karen Petrillo, Michael Rizzolo, Luciana Meli, John Arnold, Nelson Felix

Proceedings Volume 11326, 113260W (2020) https://doi.org/10.1117/12.2552112

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Proceedings Article | 24 March 2020 Presentation

High-Z metal-based underlayer patterning for improving EUV stochastics (Conference Presentation)

Anuja De Silva, Jennifer Church, Dominik Metzler, Luciana Meli, Nelson Felix, Phil Friddle, Bhaskar Nagabhirava, Siva Kanakasabapathy, Rich Wise

Proceedings Volume 11323, 113230M (2020) https://doi.org/10.1117/12.2551319

KEYWORDS: Optical lithography, Stochastic processes, Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Photoresist materials, Photoresist developing, Lithography, Interfaces, Absorbance

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Proceedings Article | 23 March 2020 Presentation + Paper

Simulation of photoresist defect transfer through subsequent patterning processes

Dominik Metzler, Mohamed Oulmane, Sagarika Mukesh, Phil Stopford, Karthik Yogendra, Lawrence Melvin

Proceedings Volume 11329, 113290H (2020) https://doi.org/10.1117/12.2551731

KEYWORDS: Defect inspection, Etching, Photoresist materials, Photomasks, Stochastic processes, Dielectrics, Data modeling, Process modeling, Lithography, Metals

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Proceedings Article | 16 October 2019 Presentation

High-Z metal-based underlayer to improve EUV stochastics (Conference Presentation)

Anuja De Silva, Jennifer Church Church, Dominik Metzler, Luciana Meli, Phil Friddle, Bhaskar Nagabhirava, Rich Wise, Nader Shamma

Proceedings Volume 11147, 111470W (2019) https://doi.org/10.1117/12.2539272

KEYWORDS: Stochastic processes, Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Photoresist materials, Etching, Photoresist developing, Lithography, Interfaces, Absorbance

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Proceedings Article | 9 April 2018 Paper

Introduction of pre-etch deposition techniques in EUV patterning

Xun Xiang, Genevieve Beique, Lei Sun, Andre Labonte, Catherine Labelle, Bhaskar Nagabhirava, Phil Friddle, Stefan Schmitz, Michael Goss, Dominik Metzler, John Arnold

Proceedings Volume 10589, 105890K (2018) https://doi.org/10.1117/12.2297413

KEYWORDS: Etching, Extreme ultraviolet, Deposition processes, Optical lithography, Line width roughness, Line edge roughness, Plasma etching, Photoresist processing, Plasma, Extreme ultraviolet lithography

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Proceedings Article | 9 April 2018 Presentation + Paper

Polymer brush as adhesion promoter for EUV patterning

Jing Guo, Anuja De Silva, Yann Mignot, Yongan Xu, Abraham Arceo de la Pena, Luciana Meli, Indira Seshadri, Dominik Metzler, Lovejeet Singh, Tsuyoshi Furukawa, Ramakrishnan Ayothi, Nelson Felix, Dan Corliss

Proceedings Volume 10586, 105860I (2018) https://doi.org/10.1117/12.2297113

KEYWORDS: Chemistry, Polymers, Printing, Etching, Optical lithography, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Dielectrics, Semiconducting wafers

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Showing 5 of 7 publications

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