Dr. Hsinyu Tsai
Research Staff Member at IBM Research - Almaden
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 16 August 2019 Presentation
Proceedings Volume 10958, 109580U (2019) https://doi.org/10.1117/12.2515630
KEYWORDS: Analog electronics, Neural networks, Algorithm development, Evolutionary algorithms, Tolerancing, Applied physics, Computer architecture, Structural design, Digital electronics, Lithography

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10146, 1014603 (2017) https://doi.org/10.1117/12.2260479
KEYWORDS: Directed self assembly, Plasma etching, Optical lithography, Etching, Logic, Lithography, Manufacturing, Nanofabrication, Silicon, Metals, Extreme ultraviolet, Line edge roughness, Optical alignment, Critical dimension metrology

Proceedings Article | 21 March 2017 Presentation + Paper
Robert Bruce, Gloria Fraczak, John Papalia, HsinYu Tsai, Matt BrightSky, Hiroyuki Miyazoe, Yu Zhu, Sebastian Engelmann, Hsiang-Lan Lung, Takeshi Masuda, Koukou Suu, Chi-Chun Liu, Hao Tang, John Arnold, Nelson Felix, Chung Lam
Proceedings Volume 10149, 101490J (2017) https://doi.org/10.1117/12.2257829
KEYWORDS: Plasma etching, Etching, Chalcogenides, Atomic layer deposition, Dry etching, Directed self assembly, Reactive ion etching, Picosecond phenomena, Polymethylmethacrylate, Scanning electron microscopy, Critical dimension metrology

SPIE Journal Paper | 7 February 2017
Kafai Lai, Chi-Chun Liu, Hsinyu Tsai, Yongan Xu, Cheng Chi, Ananthan Raghunathan, Parul Dhagat, Lin Hu, Oseo Park, Sunggon Jung, Wooyong Cho, Jaime Morillo, Jed Pitera, Kristin Schmidt, Mike Guillorn, Markus Brink, Daniel Sanders, Nelson Felix, Todd Bailey, Matthew Colburn
JM3, Vol. 16, Issue 01, 013502, (February 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.1.013502
KEYWORDS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Photomasks, 3D modeling, Computational lithography, Optical proximity correction

Proceedings Article | 25 March 2016 Paper
HsinYu Tsai, Hiroyuki Miyazoe, Ankit Vora, Teddie Magbitang, Noel Arellano, Chi-Chun Liu, Michael Maher, William Durand, Simon Dawes, James Bucchignano, Lynne Gignac, Daniel Sanders, Eric Joseph, Matthew Colburn, C. Grant Willson, Christopher Ellison, Michael Guillorn
Proceedings Volume 9779, 977910 (2016) https://doi.org/10.1117/12.2219544
KEYWORDS: Line edge roughness, Line width roughness, Lithography, Polymers, Etching, Semiconductors, Manufacturing, Directed self assembly, Silicon, Plasma, Oxygen

Showing 5 of 17 publications
Conference Committee Involvement (6)
Novel Patterning Technologies 2022
25 April 2022 | San Jose, California, United States
Novel Patterning Technologies 2021
22 February 2021 | Online Only, California, United States
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
24 February 2020 | San Jose, California, United States
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
25 February 2019 | San Jose, California, United States
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Showing 5 of 6 Conference Committees
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