Dr. Todd C. Bailey
Pathfinding OPC Manager at GlobalFoundries
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12495, 124951V (2023) https://doi.org/10.1117/12.2661150
KEYWORDS: Data modeling, Semiconducting wafers, Metrology, Modeling, Machine learning, Fabrication, Data processing, Semiconductors, Process modeling, Deposition processes

Proceedings Article | 26 September 2019 Presentation + Paper
Proceedings Volume 11148, 111480H (2019) https://doi.org/10.1117/12.2536745
KEYWORDS: Photomasks, Process modeling, Model-based design, Optical lithography, Optical proximity correction, Critical dimension metrology, 193nm lithography, Lithography, Tolerancing, Modeling

Proceedings Article | 22 October 2018 Presentation + Paper
Proceedings Volume 10810, 108100P (2018) https://doi.org/10.1117/12.2501973
KEYWORDS: Photomasks, SRAF, Printing, Lithography, Vestigial sideband modulation, Semiconducting wafers, Optical proximity correction, Manufacturing, Image quality, Image processing

SPIE Journal Paper | 31 July 2018
JM3, Vol. 18, Issue 01, 011003, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011003
KEYWORDS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography

Proceedings Article | 19 March 2018 Paper
Proceedings Volume 10583, 105830N (2018) https://doi.org/10.1117/12.2297410
KEYWORDS: SRAF, Photomasks, Extreme ultraviolet lithography, Image quality, Source mask optimization, Optical proximity correction

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105831N (2018) https://doi.org/10.1117/12.2297492
KEYWORDS: Line edge roughness, Stochastic processes, Calibration, Edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Metals, Photoresist materials, Absorption, Monte Carlo methods

Proceedings Article | 27 March 2017 Presentation + Paper
Alec Bowen, Azat Latypov, Todd Bailey
Proceedings Volume 10146, 1014610 (2017) https://doi.org/10.1117/12.2258709
KEYWORDS: Thermal effects, Lithography, Molecules, Molecular self-assembly, Annealing, Integrated circuits, Applied physics, Directed self assembly, Fluctuations and noise, Polymers

Proceedings Article | 27 March 2017 Presentation + Paper
Proceedings Volume 10146, 101460B (2017) https://doi.org/10.1117/12.2258693
KEYWORDS: Monte Carlo methods, Stochastic processes, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, EUV optics, Lithography, Chemically amplified resists, Calibration, Edge roughness, Photoresist processing

Proceedings Article | 24 March 2017 Paper
John Biafore, Azat Latypov, Anindarupa Chunder, Andy Brendler, Todd Bailey, Harry Levinson
Proceedings Volume 10143, 101432B (2017) https://doi.org/10.1117/12.2258707
KEYWORDS: Line edge roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Optimization (mathematics), Stochastic processes, Photoresist materials, Edge roughness, Photoresist processing, Critical dimension metrology, Diffusion, Diffractive optical elements, Tolerancing

SPIE Journal Paper | 7 February 2017
Kafai Lai, Chi-Chun Liu, Hsinyu Tsai, Yongan Xu, Cheng Chi, Ananthan Raghunathan, Parul Dhagat, Lin Hu, Oseo Park, Sunggon Jung, Wooyong Cho, Jaime Morillo, Jed Pitera, Kristin Schmidt, Mike Guillorn, Markus Brink, Daniel Sanders, Nelson Felix, Todd Bailey, Matthew Colburn
JM3, Vol. 16, Issue 01, 013502, (February 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.1.013502
KEYWORDS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Photomasks, 3D modeling, Computational lithography, Optical proximity correction

SPIE Journal Paper | 12 October 2016
Nobuhiro Okai, Erin Lavigne, Keiichiro Hitomi, Scott Halle, Shoji Hotta, Shunsuke Koshihara, Atsuko Yamaguchi, Junichi Tanaka, Todd Bailey
JM3, Vol. 15, Issue 04, 044001, (October 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.4.044001
KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Electron microscopes, Extreme ultraviolet lithography, Electron beams, Image processing, Double patterning technology, Solids, Precision measurement

Proceedings Article | 1 April 2016 Paper
Yongan Xu, Tom Faure, Ramya Viswanathan, Granger Lobb, Richard Wistrom, Sean Burns, Lin Hu, Ioana Graur, Ben Bleiman, Dan Fischer, Yann Mignot, Yoshifumi Sakamoto, Yusuke Toda, John Bolton, Todd Bailey, Nelson Felix, John Arnold, Matthew Colburn
Proceedings Volume 9780, 978006 (2016) https://doi.org/10.1117/12.2219778
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Transmittance, Resolution enhancement technologies, Printing, SRAF, Critical dimension metrology, Phase shifts

Proceedings Article | 28 March 2016 Paper
Lin Hu, Sunwook Jung, Jianliang Li, Young Kim, Yuval Bar, Granger Lobb, Jim Liang, Atsushi Ogino, John Sturtevant, Todd Bailey
Proceedings Volume 9780, 97800N (2016) https://doi.org/10.1117/12.2219237
KEYWORDS: Etching, Metals, Reactive ion etching, Cadmium, Optical proximity correction, Data modeling, Semiconducting wafers, 3D modeling, Back end of line, Image processing

Proceedings Article | 31 March 2015 Paper
Proceedings Volume 9426, 94260Y (2015) https://doi.org/10.1117/12.2176406
KEYWORDS: Calibration, Data modeling, Cadmium sulfide, Optical proximity correction, Scanning electron microscopy, Statistical modeling, Finite element methods, Semiconducting wafers, Front end of line, Optical lithography

Proceedings Article | 19 March 2015 Paper
Proceedings Volume 9424, 942419 (2015) https://doi.org/10.1117/12.2087093
KEYWORDS: Defect detection, Scatterometry, Semiconducting wafers, Scanning electron microscopy, Process control, Inspection, Metrology, Optical lithography, Image analysis, Directed self assembly

Proceedings Article | 19 March 2015 Paper
Narender Rana, Yunlin Zhang, Donald Wall, Bachir Dirahoui, Todd Bailey
Proceedings Volume 9424, 94241I (2015) https://doi.org/10.1117/12.2087406
KEYWORDS: Data modeling, Resistance, Neural networks, Metrology, Semiconducting wafers, Capacitance, Critical dimension metrology, Chemical mechanical planarization, Machine learning, Extreme ultraviolet

Proceedings Article | 19 March 2015 Paper
Nobuhiro Okai, Erin Lavigne, Keiichiro Hitomi, Scott Halle, Shoji Hotta, Shunsuke Koshihara, Junichi Tanaka, Todd Bailey
Proceedings Volume 9424, 94240H (2015) https://doi.org/10.1117/12.2175841
KEYWORDS: Extreme ultraviolet, Electron beams, Extreme ultraviolet lithography, Scanning electron microscopy, Precision measurement, Metrology, Image processing, Optical testing, Error analysis, Electron microscopes

SPIE Journal Paper | 29 December 2014
Narender Rana, Yunlin Zhang, Taher Kagalwala, Todd Bailey
JM3, Vol. 13, Issue 04, 041415, (December 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041415
KEYWORDS: Data modeling, Metrology, Critical dimension metrology, Scatterometry, Atomic force microscopy, Process modeling, Machine learning, Analytics, Optical lithography, Calibration

SPIE Journal Paper | 29 October 2014
Robin Chao, Kriti Kohli, Yunlin Zhang, Anita Madan, Gangadhara Raja Muthinti, Augustin Hong, David Conklin, Judson Holt, Todd Bailey
JM3, Vol. 13, Issue 04, 041411, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041411
KEYWORDS: Metrology, Scatterometry, Silicon, Diffraction, X-rays, Data modeling, Semiconducting wafers, X-ray diffraction, 3D modeling

Proceedings Article | 2 April 2014 Paper
Proceedings Volume 9050, 90501X (2014) https://doi.org/10.1117/12.2045375
KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Electron beams, Extreme ultraviolet lithography, Photoresist processing, Critical dimension metrology, Metrology, Precision measurement, Photomasks, Image processing

Proceedings Article | 2 April 2014 Paper
Narender Rana, Yunlin Zhang, Taher Kagalwala, Lin Hu, Todd Bailey
Proceedings Volume 9050, 905005 (2014) https://doi.org/10.1117/12.2046502
KEYWORDS: Data modeling, Metrology, Critical dimension metrology, Atomic force microscopy, Optical lithography, Process modeling, Scatterometry, Calibration, Semiconducting wafers, Neural networks

Proceedings Article | 2 April 2014 Paper
Robin Chao, Kriti Kohli, Yunlin Zhang, Anita Madan, G. Raja Muthinti, Augustin Hong, David Conklin, Judson Holt, Todd Bailey
Proceedings Volume 9050, 90501E (2014) https://doi.org/10.1117/12.2057402
KEYWORDS: Scatterometry, Silicon, Metrology, Data modeling, X-ray diffraction, Diffraction, X-rays, Semiconducting wafers, Diffraction gratings, Critical dimension metrology

Proceedings Article | 23 March 2011 Paper
Chandra Sarma, Todd Bailey, Adam Lyons, Dongbing Shao
Proceedings Volume 7973, 797315 (2011) https://doi.org/10.1117/12.879213
KEYWORDS: 3D modeling, Semiconducting wafers, Photoresist processing, Critical dimension metrology, Silicon, Photovoltaics, Lithography, Data modeling, Visualization, Metrology

Proceedings Article | 25 September 2010 Paper
Dongbing Shao, Bidan Zhang, Sajan Marokkey, Todd Bailey, Derren Dunn, Emily Gallagher, Yea-Sen Lin, Takashi Murakami, Seiji Nakagawa, Chandrasekhar Sarma, Mohamed Talbi
Proceedings Volume 7823, 78230U (2010) https://doi.org/10.1117/12.865131
KEYWORDS: Photomasks, Data modeling, Calibration, 3D modeling, Semiconducting wafers, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Process modeling, Silicon

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 78233U (2010) https://doi.org/10.1117/12.865134
KEYWORDS: Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Silicon, Data modeling, Photomasks, Calibration, Printing, Reflectivity, Photoresist processing

Proceedings Article | 3 April 2010 Paper
Proceedings Volume 7641, 76410B (2010) https://doi.org/10.1117/12.846637
KEYWORDS: 3D modeling, Critical dimension metrology, Data modeling, Process modeling, Scanning electron microscopy, Semiconducting wafers, Etching, Optical lithography, Printing, 3D image processing

Proceedings Article | 13 March 2010 Paper
Mohamed Talbi, Amr Abdo, Todd Bailey, Will Conley, Derren Dunn, Masashi Fujimoto, John Nickel, No Young Chung, Sajan Marokkey, Si Hyeung Lee, Chandrasekhar Sarma, Dongbing Shao, Ramya Viswanathan
Proceedings Volume 7640, 76401D (2010) https://doi.org/10.1117/12.846466
KEYWORDS: 3D modeling, Photoresist materials, Data modeling, Calibration, Scanning electron microscopy, Critical dimension metrology, Photomasks, 3D image processing, Statistical modeling, Optical lithography

Proceedings Article | 1 April 2009 Paper
Hyung-Rae Lee, Irene Popova, JoAnn Rolick, Juan-Manuel Gomez, Todd Bailey
Proceedings Volume 7273, 72730Y (2009) https://doi.org/10.1117/12.814269
KEYWORDS: Photoresist processing, Semiconducting wafers, Reflectivity, Optical proximity correction, Lithography, Photomasks, Line edge roughness, Process control, Critical dimension metrology, Etching

Proceedings Article | 1 April 2008 Paper
Todd Bailey, Greg McIntyre, Bidan Zhang, Ryan Deschner, Sohan Mehta, Won Song, Hyung-Rae Lee, Yu Hue, MaryJane Brodsky
Proceedings Volume 6924, 69244F (2008) https://doi.org/10.1117/12.773102
KEYWORDS: Critical dimension metrology, Oxides, Reflectivity, Lithography, Semiconducting wafers, Photomasks, Chemical mechanical planarization, Silicon, Control systems, Etching

Proceedings Article | 2 April 2007 Paper
T. Bailey, J. Maynollo, J. J. Perez, I. Popova, B. Zhang
Proceedings Volume 6519, 65190S (2007) https://doi.org/10.1117/12.712318
KEYWORDS: Head-mounted displays, Reflectivity, Semiconducting wafers, Silicon, Lithography, Critical dimension metrology, Ozone, Oxides, Photoresist processing, Atomic force microscopy

Proceedings Article | 12 May 2005 Paper
D. Gil, T. Bailey, D. Corliss, M. Brodsky, P. Lawson, M. Rutten, Z. Chen, N. Lustig, T. Nigussie, K. Petrillo, C. Robinson
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598855
KEYWORDS: Semiconducting wafers, Immersion lithography, Scanners, Lithography, Critical dimension metrology, Semiconductor manufacturing, Manufacturing, Bacteria, Resistance, Polishing

Showing 5 of 31 publications
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