Dr. Mohamed Talbi Profile

Dr. Mohamed Talbi

at IBM Corp

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 25 September 2010 Paper

Physical resist model calibration for implant level using laser-written photomasks

Dongbing Shao, Bidan Zhang, Sajan Marokkey, Todd Bailey, Derren Dunn, Emily Gallagher, Yea-Sen Lin, Takashi Murakami, Seiji Nakagawa, Chandrasekhar Sarma, Mohamed Talbi

Proceedings Volume 7823, 78230U (2010) https://doi.org/10.1117/12.865131

KEYWORDS: Photomasks, Data modeling, Calibration, 3D modeling, Semiconducting wafers, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Process modeling, Silicon

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Proceedings Article | 3 April 2010 Paper

3D physical modeling for patterning process development

Chandra Sarma, Amr Abdo, Todd Bailey, Will Conley, Derren Dunn, Sajan Marokkey, Mohamed Talbi

Proceedings Volume 7641, 76410B (2010) https://doi.org/10.1117/12.846637

KEYWORDS: 3D modeling, Critical dimension metrology, Data modeling, Process modeling, Scanning electron microscopy, Semiconducting wafers, Etching, Optical lithography, Printing, 3D image processing

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Proceedings Article | 13 March 2010 Paper

Three-dimensional physical photoresist model calibration and profile-based pattern verification

Mohamed Talbi, Amr Abdo, Todd Bailey, Will Conley, Derren Dunn, Masashi Fujimoto, John Nickel, No Young Chung, Sajan Marokkey, Si Hyeung Lee, Chandrasekhar Sarma, Dongbing Shao, Ramya Viswanathan

Proceedings Volume 7640, 76401D (2010) https://doi.org/10.1117/12.846466

KEYWORDS: 3D modeling, Photoresist materials, Data modeling, Calibration, Scanning electron microscopy, Critical dimension metrology, Photomasks, 3D image processing, Statistical modeling, Optical lithography

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Proceedings Article | 5 April 2007 Paper

OPC model data collection for 45-nm technology node using automatic CD-SEM offline recipe creation

Daniel Fischer, Mohamed Talbi, Alex Wei, Ovadya Menadeva, Roger Cornell

Proceedings Volume 6518, 65181E (2007) https://doi.org/10.1117/12.712718

KEYWORDS: Optical proximity correction, Metrology, Data modeling, Pattern recognition, Semiconducting wafers, Reticles, Time metrology, Target recognition, Optical lithography, Quality measurement

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Proceedings Article | 20 October 2006 Paper

The effect of OPC optical and resist model parameters on the model accuracy, run time, and stability

Amr Abdo, Rami Fathy, Ahmed Seoud, James Oberschmidt, Scott Mansfield, Mohamed Talbi

Proceedings Volume 6349, 634923 (2006) https://doi.org/10.1117/12.686093

KEYWORDS: Optical proximity correction, Data modeling, Performance modeling, Diffusion, Optics manufacturing, Scanning electron microscopy, Model-based design, Calibration, Apodization, Optical lithography

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Proceedings Article | 24 March 2006 Paper

Model-based calculation of weighting in OPC model calibration

Mohamed Talbi, Amr Abdo, Daniel Fischer, Geng Han, Scott Mansfield, James Oberschmidt, Ramya Viswanathan

Proceedings Volume 6152, 615202 (2006) https://doi.org/10.1117/12.656568

KEYWORDS: Optical proximity correction, Data modeling, Calibration, Scanning electron microscopy, Statistical modeling, Model-based design, Error analysis, Metrology, Statistical analysis, Computer simulations

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Proceedings Article | 9 November 2005 Paper

The effect of calibration feature weighting on OPC optical and resist models: investigating the influence on model coefficients and on the overall model fitting

Amr Abdo, Rami Fathy, Kareem Madkour, James Oberschmidt, Daniel Fischer, Mohamed Talbi

Proceedings Volume 5992, 599253 (2005) https://doi.org/10.1117/12.631817

KEYWORDS: Calibration, Optical proximity correction, Data modeling, Process modeling, 3D modeling, Optimization (mathematics), Model-based design, Photoresist processing, Integrated circuits, Optical lithography

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Showing 5 of 7 publications

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