Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications

Anuja De Silva; Linda K. Sundberg; Ratnam Sooriyakumaran; Luisa Bozano; Greg Breyta; William D. Hinsberg; Masaki Fujiwara

doi:10.1117/12.881735

15 April 2011 Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications

Anuja De Silva, Linda K. Sundberg, Ratnam Sooriyakumaran, Luisa Bozano, Greg Breyta, William D. Hinsberg, Masaki Fujiwara

Author Affiliations +

Proceedings Volume 7972, Advances in Resist Materials and Processing Technology XXVIII; 79721Z (2011) https://doi.org/10.1117/12.881735
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Molecular glass resists have gained attention for the past decade as a potential platform for high resolution lithography. Several molecular resist materials based on the calix[4]resorcinarene system have been developed. Though this molecular system is very versatile, there are several challenges with the synthesis and processing of these materials. The difficulty to synthesize a monodipserse unit, the poor solubility in casting solvents and incompatibility with conventional developer are some noted challenges. We have addressed these issues by designing a new calix[4]resorcinarene resist material with hexafluro alcohol (HFA) units. The resist platform has been evaluated with e-beam and EUV lithography.

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Anuja De Silva, Linda K. Sundberg, Ratnam Sooriyakumaran, Luisa Bozano, Greg Breyta, William D. Hinsberg, and Masaki Fujiwara "Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications", Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79721Z (15 April 2011); https://doi.org/10.1117/12.881735

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