Shusuke Yoshitake
Group Manager at NuFlare Technology Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (37)

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109570N (2019) https://doi.org/10.1117/12.2515511
KEYWORDS: SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Extreme ultraviolet, Atomic force microscopy, Critical dimension metrology, Optical lithography, Data modeling, Multilayers

SPIE Journal Paper | 18 March 2019
JM3, Vol. 18, Issue 01, 013506, (March 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.013506
KEYWORDS: Photomasks, Nickel, Extreme ultraviolet, Inspection, Signal to noise ratio, Line edge roughness, Extreme ultraviolet lithography, Reflectivity, Image acquisition, Diffraction

Proceedings Article | 20 March 2018 Paper
Proceedings Volume 10583, 105831H (2018) https://doi.org/10.1117/12.2297381
KEYWORDS: Photomasks, Extreme ultraviolet, Nickel, Inspection, Signal to noise ratio, Extreme ultraviolet lithography, Phase measurement, Optical properties, Mirrors, Absorption

Proceedings Article | 16 October 2017 Presentation + Paper
Proceedings Volume 10450, 1045007 (2017) https://doi.org/10.1117/12.2280528
KEYWORDS: Inspection, Diffraction, Extreme ultraviolet, Sensors, Defect inspection, Reticles, Defect detection, Signal to noise ratio, Photomasks, Reconstruction algorithms

SPIE Journal Paper | 27 July 2017
JM3, Vol. 16, Issue 04, 041003, (July 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041003

Showing 5 of 37 publications
Conference Committee Involvement (9)
Photomask Technology 2024
30 September 2024 | Monterey, California, United States
Photomask Technology 2023
2 October 2023 | Monterey, California, United States
Photomask Technology 2022
26 September 2022 | Monterey, California, United States
Photomask Technology
27 September 2021 | Online Only, United States
Photomask Technology
21 September 2020 | Online Only, California, United States
Showing 5 of 9 Conference Committees
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