Mr. Tomohiro Iijima Profile

Tomohiro Iijima

at Nuflare Technology Inc

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Author

Publications (6)

Proceedings Article | 23 March 2020 Paper

Electron beam mask writer EBM-8000P for high throughput mask production

Tomohiro Iijima, Satoshi Nakahashi, Ryo Iikubo, Takahiro Honbu, Shinsuke Nishimura, Syoji Mori, Hirohiko Honda, Tsuyoshi Yamashita, Tetsurou Nishiyama, Osamu Kawami, Takao Tamura, Kenji Ohtoshi, Hirokazu Yamada

Proceedings Volume 11324, 113241B (2020) https://doi.org/10.1117/12.2552447

KEYWORDS: Photomasks, Electron beams, Critical dimension metrology, Beam shaping

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Proceedings Article | 17 October 2014 Paper

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito, Hiroyoshi Ando, Hideo Inoue, Noriaki Nakayamada, Takashi Kamikubo, Rieko Nishimura, Yoshinori Kojima, Jun Yashima, Akihito Anpo, Seiichi Nakazawa, Tomohiro Iijima, Kenji Ohtoshi, Hirohito Anze, Victor Katsap, Steven Golladay, Rodney Kendall

Proceedings Volume 9235, 92350X (2014) https://doi.org/10.1117/12.2065551

KEYWORDS: Photomasks, Electron beam melting, Electron beams, Data conversion, Amplifiers, LCDs, Mask making, Seaborgium, Beam shaping

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Proceedings Article | 28 July 2014 Paper

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Proceedings Volume 9256, 925607 (2014) https://doi.org/10.1117/12.2065230

KEYWORDS: Photomasks, Electron beam melting, Amplifiers, Electron beams, Logic, LCDs, Mask making, Objectives, Vestigial sideband modulation

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Proceedings Article | 14 October 2011 Paper

EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond

Shusuke Yoshitake, Takashi Kamikubo, Noriaki Nakayamada, Kiyoshi Hattori, Hiroyoshi Ando, Tomohiro Iijima, Kenji Ohtoshi, Kenichi Saito, Ryoichi Yoshikawa, Shuichi Tamamushi, Rikio Tomiyoshi, Hitoshi Higurashi, Yoshiaki Hattori, Seiichi Tsuchiya, Masayuki Katoh, Kouichi Suzuki, Yuichi Tachikawa, Munehiro Ogasawara, Victor Katsap, Steven Golladay, Rodney Kendall

Proceedings Volume 8166, 81661D (2011) https://doi.org/10.1117/12.898850

KEYWORDS: Photomasks, Lithography, Amplifiers, Data storage servers, Mask making, Immersion lithography, Data conversion, Extreme ultraviolet lithography, Data processing, Data corrections

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SPIE Journal Paper | 1 October 2008

High-accuracy correction of critical dimension errors taking sequence of large-scale integrated circuits fabrication processes into account

Takayuki Abe, Jun Yashima, Hayato Shibata, Yasuo Kato, Hiroshi Matsumoto, Tomohiro Iijama

JM3, Vol. 7, Issue 04, 043008, (October 2008) https://doi.org/10.1117/12.10.1117/1.3013546

KEYWORDS: Critical dimension metrology, Forward error correction, Computed tomography, Semiconducting wafers, Convolution, Modulation, Integrated circuits, Photomasks, Lithography, Error analysis

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Proceedings Article | 11 May 2007 Paper

Electron-beam mask writer EBM-6000 for 45-nm HP node

Jun Yashima, Kenji Ohtoshi, Noriaki Nakayamada, Hirohito Anze, Takehiko Katsumata, Tomohiro Iijima, Rieko Nishimura, Syuuichiro Fukutome, Nobuo Miyamoto, Seiji Wake, Yusuke Sakai, Shinji Sakamoto, Shigehiro Hara, Hitoshi Higurashi, Kiyoshi Hattori, Kenichi Saito, Rodney Kendall, Shuichi Tamamushi

Proceedings Volume 6607, 660703 (2007) https://doi.org/10.1117/12.728917

KEYWORDS: Line edge roughness, Photomasks, Control systems, Standards development, Manufacturing, Monochromatic aberrations, Electron beam melting, Photoresist processing, Beam shaping, Electron beams

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Showing 5 of 6 publications

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