Dr. Tsutomu Shoki
at HOYA Corp
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 18 September 2024 Paper
Daimu Ikeya, Yohei Ikebe, Tsutomu Shoki
Proceedings Volume 13273, 132730L (2024) https://doi.org/10.1117/12.3026940
KEYWORDS: Reflectivity, Extreme ultraviolet, Deep ultraviolet, Lithography, Design, Reflectometry, Multilayers, Extreme ultraviolet lithography, Reflection, Optical simulations

Proceedings Article | 26 August 2024 Paper
Takahiro Onoue, Yohei Ikebe, Hirofumi Kozakai, Haruka Amemiya, Tatsuya Sasaki, Ryotaro Takeuchi, Tsutomu Shoki
Proceedings Volume 13177, 1317702 (2024) https://doi.org/10.1117/12.3034338
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Tantalum, Multilayers, Resolution enhancement technologies, Optical properties, Hydrogen, EUV optics

Proceedings Article | 30 September 2021 Presentation
Ikuya Fukasawa, Yohei Ikebe, Takeshi Aizawa, Tsutomu Shoki, Takahiro Onoue
Proceedings Volume 11855, 118550N (2021) https://doi.org/10.1117/12.2606239

SPIE Journal Paper | 1 September 2017
Yohei Ikebe, Hirofumi Kozakai, Tsutomu Shoki, Takahiro Onoue
JM3, Vol. 16, Issue 04, 041006, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041006
KEYWORDS: Reflectivity, Extreme ultraviolet, Nickel, Photomasks, Diffusion, Interfaces, Etching, Extreme ultraviolet lithography, Lithography, Thin films

Proceedings Article | 23 October 2015 Paper
Jaehyuck Choi, Jinsu Kim, Jeff Lowe, Davide Dattilo, Soowan Koh, Jun Yeol Choi, Uwe Dietze, Tsutomu Shoki, Byung Gook Kim, Chan-Uk Jeon
Proceedings Volume 9635, 96350C (2015) https://doi.org/10.1117/12.2197226
KEYWORDS: Extreme ultraviolet, Carbon, Photomasks, Extreme ultraviolet lithography, Ruthenium, Industrial chemicals, Particles, Scanning probe microscopy, Mask cleaning, Pellicles

SPIE Journal Paper | 1 April 2013 Open Access
Tsutomu Shoki, Masato Ootsuka, Minoru Sakamoto, Tatsuo Asakawa, Ryuuji Sakamoto, Hirofumi Kozakai, Kazuhiro Hamamoto, Takahiro Onoue, Toshihiko Orihara, Osamu Maruyama, Jun-Ichi Horikawa
JM3, Vol. 12, Issue 02, 021008, (April 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.021008
KEYWORDS: Extreme ultraviolet, Inspection, Polishing, Photomasks, Extreme ultraviolet lithography, Glasses, Defect inspection, Silicon, Molybdenum, Wafer-level optics

Proceedings Article | 14 March 2012 Paper
Takahiro Onoue, Kazuhiro Hamamoto, Toshihiko Orihara, Osamu Maruyama, Tsutomu Shoki, Junichi Horikawa
Proceedings Volume 8322, 832226 (2012) https://doi.org/10.1117/12.919745
KEYWORDS: Fermium, Extreme ultraviolet, Frequency modulation, Photomasks, Lithography, Inspection, Extreme ultraviolet lithography, Ruthenium, Ion beams, Electron beams

Proceedings Article | 26 March 2011 Paper
Sungmin Huh, In-Yong Kang, Sang-Hyun Kim, Hwan-seok Seo, Dongwan Kim, Jooon Park, Seong-Sue Kim, Han-Ku Cho, Kenneth Goldberg, Iacopo Mochi, Tsutomu Shoki, Gregg Inderhees
Proceedings Volume 7969, 796902 (2011) https://doi.org/10.1117/12.879384
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect detection, Defect inspection, Extreme ultraviolet lithography, Manufacturing, Particles

SPIE Journal Paper | 1 April 2010
JM3, Vol. 9, Issue 02, 023005, (April 2010) https://doi.org/10.1117/12.10.1117/1.3378154
KEYWORDS: Photomasks, Etching, Extreme ultraviolet lithography, Image processing, Multilayers, Photoresist processing, Photovoltaics, Lithography, Extreme ultraviolet, Coating

Proceedings Article | 20 March 2010 Paper
Tsutomu Shoki, Masaru Mitsui, Minoru Sakamoto, Noriyuki Sakaya, Masato Ootsuka, Tasuto Asakawa, Takeyuki Yamada, Hideaki Mitsui
Proceedings Volume 7636, 76360U (2010) https://doi.org/10.1117/12.849363
KEYWORDS: Extreme ultraviolet, Polishing, Inspection, Extreme ultraviolet lithography, Photomasks, Annealing, Reflectivity, Coating, Mask making, Ruthenium

Proceedings Article | 30 September 2009 Paper
Proceedings Volume 7488, 748818 (2009) https://doi.org/10.1117/12.829873
KEYWORDS: Photomasks, Etching, Image processing, Extreme ultraviolet lithography, Multilayers, Photoresist processing, Scanners, Coating, Optical lithography, Lithography

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790Q (2009) https://doi.org/10.1117/12.824267
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet lithography, Finite element methods, Extreme ultraviolet, Polishing, Distortion, Overlay metrology, Optical alignment

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 712227 (2008) https://doi.org/10.1117/12.801576
KEYWORDS: Photomasks, Etching, Reflectivity, Extreme ultraviolet lithography, Multilayers, Photoresist processing, Coating, Extreme ultraviolet, Lawrencium, Lithography

Proceedings Article | 30 October 2007 Paper
Tsutomu Shoki, Takeyuki Yamada, Shouji Shimojima, Yuuki Shiota, Mitsuharu Tsukahara, Kesahiro Koike, Hiroaki Shishido, Osamu Nozawa, Toshiyuki Sakamoto, Morio Hosoya
Proceedings Volume 6730, 673015 (2007) https://doi.org/10.1117/12.748369
KEYWORDS: Extreme ultraviolet, Polishing, Reflectivity, Photomasks, Extreme ultraviolet lithography, Glasses, Inspection, Silicon, Molybdenum, Defect inspection

Proceedings Article | 20 October 2006 Paper
Tsukasa Abe, Akiko Fujii, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi, Tsutomu Shoki, Takeyuki Yamada, Osamu Nozawa, Ryo Ohkubo, Masao Ushida
Proceedings Volume 6349, 63493G (2006) https://doi.org/10.1117/12.692519
KEYWORDS: Etching, Reflectivity, Extreme ultraviolet, Photomasks, Silicon, Photoresist processing, Scanning electron microscopy, Dry etching, Defect inspection, Inspection

Proceedings Article | 23 March 2006 Paper
Kazuhiro Hamamoto, Yuzuru Tanaka, Takahiro Yoshizumi, Yasuyuki Fukushima, Hideaki Shiotani, Noriyuki Sakaya, Morio Hosoya, Tsutomu Shoki, Takeo Watanabe, Hiroo Kinoshita
Proceedings Volume 6151, 615119 (2006) https://doi.org/10.1117/12.655430
KEYWORDS: Extreme ultraviolet, Microscopes, Photomasks, Multilayers, X-ray optics, X-rays, Extreme ultraviolet lithography, Inspection, EUV optics, Glasses

Proceedings Article | 6 May 2005 Paper
Mitsuhiro Kureishi, Ryo Ohkubo, Morio Hosoya, Tsutomu Shoki, Noriyuki Sakaya, Hideo Kobayashi, Osamu Nozawa, Yoh-ichi Usui, Osamu Nagarekawa
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598613
KEYWORDS: Etching, Extreme ultraviolet, Multilayers, Reflectivity, Silicon, Photomasks, Atomic force microscopy, Dry etching, Scanning electron microscopy, Transmission electron microscopy

Proceedings Article | 17 December 2003 Paper
Takeru Kinoshita, Tsutomu Shoki, Hideo Kobayashi, Ryo Ohkubo, You-Ichi Usui, Morio Hosoya, Noriyuki Sakaya, Osamu Nagarekawa
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517836
KEYWORDS: Multilayers, Extreme ultraviolet, Transmission electron microscopy, Defect inspection, Atomic force microscopy, Inspection, Glasses, Photomasks, Silicon, Coating

Proceedings Article | 28 August 2003 Paper
Takeo Watanabe, Tsuneyuki Haga, Tsutomu Shoki, Kazuhiro Hamamoto, Shintaro Takada, Naoki Kazui, Satoshi Kakunai, Harushige Tsubakino, Hiroo Kinoshita
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504240
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Microscopes, Inspection, Scanning electron microscopy, Multilayers, Mask making, Dry etching, Surface roughness

Proceedings Article | 28 August 2003 Paper
Morio Hosoya, Tsutomu Shoki, Takeru Kinoshita, Noriyuki Sakaya, Osamu Nagarekawa
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504072
KEYWORDS: Reflectivity, Multilayers, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Silicon, Optical simulations, Chromium, Molybdenum, Ruthenium

Proceedings Article | 1 August 2002 Paper
Tsutomu Shoki, Morio Hosoya, Takeru Kinoshita, Hideo Kobayashi, Youichi Usui, Ryo Ohkubo, Shinichi Ishibashi, Osamu Nagarekawa
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477007
KEYWORDS: Reflectivity, Extreme ultraviolet, Multilayers, Photomasks, Silicon, Chromium, Ion beams, Glasses, Etching, Inspection

Proceedings Article | 25 August 1999 Paper
Tsutomu Shoki, Akinori Kurikawa, Takamitsu Kawahara, Tadashi Sakurai
Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360243
KEYWORDS: Silicon carbide, X-rays, Low pressure chemical vapor deposition, Photomasks, Polishing, Semiconducting wafers, Chemical vapor deposition, Surface finishing, Prototyping, X-ray lithography

Proceedings Article | 7 July 1997 Paper
Tsutomu Miyatake, Masaoki Hirose, Tsutomu Shoki, Ryo Ohkubo, Kuniaki Yamazaki
Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275780
KEYWORDS: Optical alignment, Photomasks, Semiconducting wafers, Silicon carbide, X-rays, Objectives, X-ray lithography, Autoregressive models, Light scattering, Opacity

Proceedings Article | 24 July 1996 Paper
Ryo Ohkubo, Tsutomu Shoki, Hideaki Mitsui, Noromichi Annaka, Yoichi Yamaguchi
Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245215
KEYWORDS: Etching, Chromium, Silicon carbide, Sputter deposition, Xenon, Polishing, X-rays, Argon, Photomasks, Dry etching

Proceedings Article | 24 July 1996 Paper
Kinya Ashikaga, Shinji Tsuboi, Yoshio Yamashita, Shinji Sugihara, Yoshio Gomei, Tsutomu Shoki, Yoichi Yamaguchi, Tsuneaki Ohta
Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245200
KEYWORDS: X-rays, Tantalum, Photomasks, Silicon, Semiconducting wafers, Silicon carbide, Oxygen, Electron beams, Photoresist processing, Sputter deposition

Proceedings Article | 3 July 1995 Paper
Tsutomu Shoki, Ryo Ohkubo, Gregory Wells, Yoichi Yamaguchi, Kuniaki Yamazaki, Franco Cerrina
Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212815
KEYWORDS: Silicon carbide, Annealing, X-rays, Tantalum, Photomasks, Sputter deposition, X-ray lithography, Argon, Silicon, Semiconducting wafers

Proceedings Article | 3 July 1995 Paper
Shinji Tsuboi, Tsutomu Shoki, Tsuneaki Ohta, Hiroshi Okuyama, Kinya Ashikaga, Yoshio Yamashita, Ryo Ohkubo, Yoichi Yamaguchi, Hiroshi Hoga
Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212773
KEYWORDS: Silicon carbide, Photomasks, Distortion, Silicon, Semiconducting wafers, X-rays, Glasses, Mask making, Lithography, Electron beams

Proceedings Article | 3 November 1994 Paper
Tsutomu Shoki, Yoichi Yamaguchi, Noromichi Annaka, Isao Amemiya
Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191943
KEYWORDS: Silicon carbide, Transmittance, Polishing, Refractive index, Optical properties, X-rays, Surface roughness, Annealing, Surface finishing, Photomasks

Proceedings Article | 13 May 1994 Paper
Hiroshi Okuyama, Yoshio Yamashita, Kenji Marumoto, Hideki Yabe, Yasuji Matsui, Yoichi Yamaguchi, Tsutomu Shoki, Hiroyuki Nagasawa
Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175799
KEYWORDS: Silicon carbide, X-rays, Photomasks, Distortion, Sputter deposition, Semiconducting wafers, X-ray optics, Electron beams, Refractive index, Antireflective coatings

Proceedings Article | 24 June 1993 Paper
Tsutomu Shoki, Hiroyuki Nagasawa, Hiroyuki Kosuga, Yoichi Yamaguchi, Noromichi Annaka, Isao Amemiya, Osamu Nagarekawa
Proceedings Volume 1924, (1993) https://doi.org/10.1117/12.146526
KEYWORDS: Silicon carbide, Transmittance, Protactinium, X-rays, Radium, Polishing, Reactive ion etching, Surface roughness, Transparency, Semiconducting wafers

Showing 5 of 30 publications
Conference Committee Involvement (9)
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography
22 February 2010 | San Jose, California, United States
Showing 5 of 9 Conference Committees
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