Dr. Seung-Hune Yang Profile

Dr. Seung-Hune Yang

Master(VP of Technology) at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Conference Program Committee | Author

Publications (29)

Proceedings Article | 21 November 2023 Presentation + Paper

Deep learning-based detection of mask rule check violations in curvilinear mask

Sooyong Lee, Jeeyong Lee, Sinjeung Park, Byungjun Kang, Juyun Park, Bongkeun Kim, Joonsung Kim, Seung-Hune Yang, Seongtae Jeong

Proceedings Volume 12751, 1275109 (2023) https://doi.org/10.1117/12.2685488

KEYWORDS: Transformers, Visualization, Design and modelling, Deep learning, Image classification, Data modeling

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Proceedings Article | 1 May 2023 Presentation + Paper

A novel approach to etch-process-aware intensive layout retarget

Jeeyong Lee, Yangwoo Heo, Ryanggeun Lee, Sangwook Kim, Jisuk Hong, Kyoil Koo, Changmook Yim, Jungmin Kim, Sooyong Lee, Joonsung Kim, Dongho Kim, Seung-Hune Yang, Seongtae Jeong

Proceedings Volume 12499, 124990C (2023) https://doi.org/10.1117/12.2657880

KEYWORDS: Etching, Data modeling, Modeling, Machine learning, Design and modelling, Statistical modeling, Optical proximity correction, Reflection, Feature extraction, Artificial intelligence

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Proceedings Article | 28 April 2023 Paper

Fast and accurate machine learning assisted mask optimization

Moojoon Shin, Sooyong Lee, Joonsung Kim, Seung-Hune Yang, Heedon Hwang

Proceedings Volume 12495, 124951S (2023) https://doi.org/10.1117/12.2658321

KEYWORDS: Optical proximity correction, Machine learning, Artificial neural networks

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Proceedings Article | 4 April 2017 Paper

Early stage hot spot analysis through standard cell base random pattern generation

Joong-Won Jeon, Jaewan Song, Jeong-Lim Kim, Seongyul Park, Seung-Hune Yang, Sooryong Lee, Hokyu Kang, Kareem Madkour, Wael ElManhawy, SeungJo Lee, Joe Kwan

Proceedings Volume 10148, 101480S (2017) https://doi.org/10.1117/12.2257830

KEYWORDS: Optical proximity correction, Lithography, Resolution enhancement technologies, Optical lithography, Logic, Standards development, Electroluminescence, Metals, Product engineering, Composites, Signal detection

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Proceedings Article | 19 March 2015 Paper

Verification of directed self-assembly (DSA) guide patterns through machine learning

Seongbo Shim, Sibo Cai, Jaewon Yang, Seunghune Yang, Byungil Choi, Youngsoo Shin

Proceedings Volume 9423, 94231E (2015) https://doi.org/10.1117/12.2085644

KEYWORDS: Global Positioning System, Lithography, Machine learning, Photomasks, Polymers, Optical lithography, Optical proximity correction, 193nm lithography, Electrical engineering, Directed self assembly

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Proceedings Article | 31 March 2014 Paper

Study of lens heating behavior and thick mask effects with a computational method

Ningning Jia, Seung-Hune Yang, Sangwook Kim, Jungdal Choi

Proceedings Volume 9052, 905209 (2014) https://doi.org/10.1117/12.2045366

KEYWORDS: Wavefronts, Photomasks, Diffraction, Reticles, Zernike polynomials, Binary data, Logic, Logic devices, Lenses, Lithography

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Proceedings Article | 9 September 2013 Paper

OPC modeling using AFM CD measurement

Kyoil Koo, Gyengseop Kim, Sanghun Kim, Seunghune Yang, Sooryong Lee, Youngchang Kim, Jungdal Choi, Hokyu Kang

Proceedings Volume 8880, 88801Q (2013) https://doi.org/10.1117/12.2025552

KEYWORDS: Data modeling, Scanning electron microscopy, Atomic force microscopy, Calibration, Optical proximity correction, Optical calibration, Instrument modeling, Critical dimension metrology, Metrology, Data conversion

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Proceedings Article | 12 April 2013 Paper

The effect of mask and source complexity on source mask optimization

Seung-Hune Yang, Ningning Jia, SeongBo Shim, Dmitry Vengertsev, Jungdal Choi, Ho-Kyu Kang, Young-Chang Kim

Proceedings Volume 8683, 86830C (2013) https://doi.org/10.1117/12.2011993

KEYWORDS: Photomasks, Critical dimension metrology, Source mask optimization, Electron beams, Optical proximity correction, Neodymium, Error analysis, Lithography, Semiconducting wafers, Monte Carlo methods

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Proceedings Article | 8 November 2012 Paper

The new test pattern selection method for OPC model calibration, based on the process of clustering in a hybrid space

Dmitry Vengertsev, Kihyun Kim, Seung-Hune Yang, Seongbo Shim, Seongho Moon, Artem Shamsuarov, Sooryong Lee, Seong-Woon Choi, Jungdal Choi, Ho-Kyu Kang

Proceedings Volume 8522, 85221A (2012) https://doi.org/10.1117/12.953827

KEYWORDS: Optical proximity correction, Calibration, Semiconducting wafers, Data modeling, Statistical modeling, Logic devices, Principal component analysis, Model-based design, Lithography, Optics manufacturing

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Proceedings Article | 3 April 2012 Paper

Optical performance comparison between negative tone development and positive tone development

Seung-Hune Yang, Eun Sung Kim, Seongho Moon, Sooryong Lee, Seong-Woon Choi, Jungdal Choi

Proceedings Volume 8325, 832504 (2012) https://doi.org/10.1117/12.915931

KEYWORDS: Photomasks, Binary data, Critical dimension metrology, Image quality, 3D acquisition, Image processing, Mathematical modeling, Image enhancement, Semiconducting wafers, 3D image processing

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Proceedings Article | 13 March 2012 Paper

Computational process optimization of array edges

Bernd Küchler, Artem Shamsuarov, Thomas Mülders, Ulrich Klostermann, Seung-Hune Yang, Seongho Moon, Vitaliy Domnenko, Sung-Woon Park

Proceedings Volume 8326, 83260H (2012) https://doi.org/10.1117/12.916528

KEYWORDS: SRAF, Source mask optimization, Tolerancing, Array processing, Photomasks, Printing, Optimization (mathematics), Manufacturing, Lithography, Optical proximity correction

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Proceedings Article | 23 March 2011 Paper

Fine calibration of physical resist models: the importance of Jones pupil, laser bandwidth, mask error and CD metrology for accurate modeling at advanced lithographic nodes

Seongho Moon, Seunghune Yang, Artem Shamsuarov, Eunju Kim, Junghoon Ser, Youngchang Kim, Seongwoon Choi, Changjin Kang, Ulrich Klostermann, Bernd Küchler, John Lewellen, Thomas Schmöller, Sooryong Lee

Proceedings Volume 7973, 79730X (2011) https://doi.org/10.1117/12.879592

KEYWORDS: Calibration, Photomasks, Scanning electron microscopy, Cadmium, Metrology, Data modeling, Critical dimension metrology, 3D modeling, Optical proximity correction, Laser metrology

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Proceedings Article | 25 September 2010 Paper

New method to determine process window considering pattern failure

Seung-Hune Yang, Seongho Moon, Junghoon Ser, Young-Chang Kim, Sung-Woon Choi, Chang-Jin Kang

Proceedings Volume 7823, 78230H (2010) https://doi.org/10.1117/12.864301

KEYWORDS: Bridges, Failure analysis, Critical dimension metrology, Semiconducting wafers, Image processing, Lithography, Image analysis, Optical inspection, Remote sensing, Line edge roughness

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Proceedings Article | 20 October 2006 Paper

Experimental investigation of photomask with near-field polarization imaging

Tao Chen, Tom Milster, Seung-Hune Yang

Proceedings Volume 6349, 634953 (2006) https://doi.org/10.1117/12.686420

KEYWORDS: Polarization, Near field, Photomasks, Image resolution, Atomic force microscopy, Objectives, Imaging systems, Solids, Phase shifts, Spatial resolution

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Proceedings Article | 5 November 2005 Paper

Semiconductor pattern analysis with induced polarization

Tao Chen, Tom Milster, Seung Hune Yang

Proceedings Volume 5992, 59921L (2005) https://doi.org/10.1117/12.632240

KEYWORDS: Polarization, Near field, Image resolution, Microscopes, Semiconductors, Objectives, Solids, Microscopy, Refractive index, Reflection

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Proceedings Article | 12 May 2005 Paper

Experimental investigation of solid immersion lens lithography

Tao Chen, Tom Milster, Dongseok Nam, Seung Yang

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600065

KEYWORDS: Lithography, Objectives, Near field optics, Solids, Microscopes, Collimation, Photomasks, Semiconductor lasers, Semiconducting wafers, Polarization

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Proceedings Article | 20 August 2004 Paper

Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system

Sung-Hoon Jang, Seung-Hune Yang, Byoung-Sup Ahn, Won-Tai Ki, Ji-Hyeon Choi, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557757

KEYWORDS: Photomasks, Critical dimension metrology, Modulation, Vestigial sideband modulation, Error analysis, Optical simulations, Electron beam lithography, Electron beams, Beam shaping, Data modeling

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Proceedings Article | 20 August 2004 Paper

Analysis of mask CD error by dose modulation for fogging effect

Hojune Lee, Seung-Hune Yang, Byung-Gook Kim, Sung-Yong Moon, Sung-Woon Choi, Hee-Sun Yoon, Woo-Sung Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557713

KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Electron beams, Modulation, Monte Carlo methods, Optical testing, Optical simulations, Systems modeling, Laser scattering

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Proceedings Article | 17 December 2003 Paper

Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect

Hojune Lee, Seung-Hune Yang, Jin-Hong Park, Seong-Yong Moon, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518283

KEYWORDS: Monte Carlo methods, Modulation, Etching, Critical dimension metrology, Photomasks, Scattering, Dry etching, Lithography, Cadmium, Error analysis

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Proceedings Article | 27 December 2002 Paper

Analytical approach to X-phenomenon in alternating phase-shifting masks

Jong Rak Park, Soon Ho Kim, Hojune Lee, Il-Yong Jang, Yo-Han Choi, Seung-Hune Yang, Jeong-Yoon Lee, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468092

KEYWORDS: Photomasks, Phase shifts, Error analysis, Semiconducting wafers, Fourier transforms, Reticles, Wafer-level optics, Convolution, Image acquisition, Holmium

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Proceedings Article | 27 December 2002 Paper

Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes

Yo-Han Choi, Jong-Rak Park, Moon-Gyu Sung, Seung-Hune Yang, Soon-Ho Kim, Ho-June Lee, Jeong-Yun Lee, Il-Yong Jang, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468099

KEYWORDS: Photomasks, Critical dimension metrology, Error analysis, Photoresist processing, Data modeling, Quantitative analysis, Chemically amplified resists, Integrated circuits, Semiconducting wafers, Etching

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Proceedings Article | 27 December 2002 Paper

Fogging effect consideration in mask process at 50-KeV e-beam systems

Seung-Hune Yang, Yo-Han Choi, Jong-Rak Park, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468100

KEYWORDS: Gaussian beams, Modulation, Vestigial sideband modulation, Critical dimension metrology, Beam shaping, Raster graphics, Electron beams, Photomasks, Mask making, Electrons

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Proceedings Article | 16 July 2002 Paper

Proximity effect correction optimization considering fogging and loading effects compensation

Seung-Hune Yang, Yo-Han Choi, Jong Park, Yong-Hoon Kim, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473426

KEYWORDS: Critical dimension metrology, Etching, Beam shaping, Mask making, Backscatter, Scattering, Cadmium, Electron beam lithography, Modulation, Photomasks

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Proceedings Article | 14 September 2001 Paper

Mask considerations for manufacturing assist features

Ji-Hyeon Choi, Won-Il Cho, Byeongsoo Kim, Seung-Hune Yang, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435681

KEYWORDS: Photomasks, Inspection, Optical proximity correction, Manufacturing, Critical dimension metrology, Semiconducting wafers, Transmittance, Defect detection, Phase shifts, Mask making

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Proceedings Article | 5 September 2001 Paper

Prediction of MEEF using a simple model and MEEF enhancement parameters

Dong-Hoon Chung, Seung-Hune Yang, Hyung-Do Kim, In-Gyun Shin, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438343

KEYWORDS: Photomasks, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Optical lithography, Image enhancement, Image processing, Diffusion, Semiconductors, Mask making

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Proceedings Article | 5 September 2001 Paper

Application of chemically amplified resist to 10-keV e-beam system

Sung-Hee Ahn, Chang-Hwan Kim, Seung-Hune Yang, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438348

KEYWORDS: Chromium, Chemically amplified resists, Scattering, Fluctuations and noise, Photomasks, Mask making, Etching, Electron beam lithography, Lithography, Scanning electron microscopy

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Proceedings Article | 22 January 2001 Paper

Effect of beam blur in mask fabrication

Seung-Hune Yang, Won-Tai Ki, Seong-Yong Moon, Tae Moon Jeong, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410725

KEYWORDS: Beam shaping, Critical dimension metrology, Electron beams, Photoresist processing, Scanning electron microscopy, Optical simulations, Beam analyzers, Mask making, Convolution, Monte Carlo methods

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Proceedings Article | 22 January 2001 Paper

Analysis of photomask distortion caused by blank materials and open ratios

Seong-Yong Moon, Won-Tai Ki, Seung-Hune Yang, Tae Moon Jeong, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410697

KEYWORDS: Photomasks, Chromium, Distortion, Semiconducting wafers, Error analysis, Lithography, Scanners, Printing, Overlay metrology, Dry etching

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Proceedings Article | 19 July 2000 Paper

Dose latitude dependency on resist contrast in e-beam mask lithography

Byung-Cheol Cha, Seong-Yong Moon, Won-Tai Ki, Seung-Hune Yang, Seong-Woon Choi, Woo-Sung Han, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392058

KEYWORDS: Photoresist processing, Photomasks, Etching, Electron beam lithography, Beam shaping, Critical dimension metrology, Lithography, Dry etching, Gaussian beams, Scattering

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Showing 5 of 29 publications

Conference Committee Involvement (2)

Photomask Technology 2024

29 September 2024 | Monterey, California, United States

Photomask Technology 2023

2 October 2023 | Monterey, California, United States

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