Dong-Seok Nam
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 25 September 2010 Paper
Sung-Won Kwon, Dong-Chan Kim, Dong-Seok Nam, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume 7823, 78230F (2010) https://doi.org/10.1117/12.866828
KEYWORDS: Etching, Chromium, Plasma, Photomasks, Plasma etching, Oxygen, Chlorine, Dry etching, Emission spectroscopy, Mask making

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 737917 (2009) https://doi.org/10.1117/12.824284
KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Lithography, Image processing, Line edge roughness, Edge roughness, Electron beam lithography, Critical dimension metrology, Vestigial sideband modulation

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70281X (2008) https://doi.org/10.1117/12.793074
KEYWORDS: Photomasks, Etching, Image processing, Error analysis, Image registration, Electrons, Electron beam lithography, Lithography, Finite element methods, Critical dimension metrology

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67302Z (2007) https://doi.org/10.1117/12.746810
KEYWORDS: Etching, Critical dimension metrology, Chromium, Photomasks, Curium, Ions, Electron beams, Plasma etching, Photoresist processing, Information operations

Proceedings Article | 15 May 2007 Paper
Proceedings Volume 6607, 660725 (2007) https://doi.org/10.1117/12.728988
KEYWORDS: Mask making, Photomasks, Electron beam lithography, Monte Carlo methods, Control systems, Optical proximity correction, Electron beams, Laser scattering, Scattering, Backscatter

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634928 (2006) https://doi.org/10.1117/12.686534
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Tolerancing, Photoresist processing, Optical proximity correction, Mask making, Semiconductors, Manufacturing, Computer simulations

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62831J (2006) https://doi.org/10.1117/12.681744
KEYWORDS: Photomasks, Particles, Inspection, Laser systems engineering, Mask making, SRAF, Printing, Semiconducting wafers, Light sources, Optical simulations

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61520G (2006) https://doi.org/10.1117/12.657324
KEYWORDS: Critical dimension metrology, Scatterometry, Spectroscopy, Process control, Diffraction, Diffraction gratings, Sensors, In situ metrology, Time metrology, Photomasks

Proceedings Article | 24 March 2006 Paper
Chan Hwang, Dong-Woon Park, Jang-Ho Shin, Dong-Seok Nam, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Proceedings Volume 6152, 61521M (2006) https://doi.org/10.1117/12.657054
KEYWORDS: Polarization, Photomasks, Polarizers, Semiconducting wafers, Diffraction, Optical lithography, Lithographic illumination, Reticles, Critical dimension metrology, Printing

Proceedings Article | 9 November 2005 Paper
Proceedings Volume 5992, 59924U (2005) https://doi.org/10.1117/12.632078
KEYWORDS: Etching, Critical dimension metrology, Modulation, Dry etching, Photomasks, System on a chip, Backscatter, Data modeling, Electron beams, Electron beam lithography

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 59922W (2005) https://doi.org/10.1117/12.632066
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Tolerancing, Optical testing, Mask making, Scanning electron microscopy, Lithography, Semiconductors, Data processing

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600065
KEYWORDS: Lithography, Objectives, Near field optics, Solids, Microscopes, Collimation, Photomasks, Semiconductor lasers, Semiconducting wafers, Polarization

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600082
KEYWORDS: Light sources, Near field, Refractive index, Photoresist materials, Solids, Lithography, Polarization, Near field optics, Optical lithography, Immersion lithography

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569328
KEYWORDS: Transducers, Lithography, Semiconducting wafers, Dielectrics, Photoresist materials, Maskless lithography, Photomasks, Near field optics, Near field, Solids

Proceedings Article | 28 May 2004 Paper
Ho-Chul Kim, Dong-Seok Nam, Gi-Sung Yeo, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.533373
KEYWORDS: Stray light, Scattering, Optical proximity correction, Light scattering, Critical dimension metrology, Optical testing, Electronics, Lithography, Chromium, Optical lithography

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536362
KEYWORDS: Optical lithography, Genetic algorithms, Computing systems, Computer simulations, Optimization (mathematics), Image enhancement, Resolution enhancement technologies, Optical resolution, Light sources, Optical proximity correction

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485406
KEYWORDS: Photomasks, Nanoimprint lithography, Phase shifts, Manufacturing, Chlorine, Lithography, Scanners, Semiconducting wafers, Quartz, Scanning electron microscopy

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485383
KEYWORDS: Monte Carlo methods, Lithographic illumination, Spectrum analysis, Resolution enhancement technologies, Critical dimension metrology, Lithography, Double patterning technology, Scanners, Image enhancement, Electronics

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485409
KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Transmittance, Contamination, Cadmium, Control systems, Quartz, Optical lithography, Semiconductors

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485384
KEYWORDS: Lithographic illumination, Diffraction, Double patterning technology, Monte Carlo methods, Lithography, Resolution enhancement technologies, Image processing, Semiconducting wafers, Optical lithography, Image storage

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467504
KEYWORDS: Photomasks, Nanoimprint lithography, Phase shifts, Lithography, Scanners, Surface plasmons, Scanning electron microscopy, Manufacturing, Quartz, Semiconducting wafers

Proceedings Article | 30 July 2002 Paper
Dongseok Nam, Eunmi Lee, Sung-gon Jung, Young Kang, Gisung Yeo, Junghyun Lee, Hanku Cho, Woo-Sung Han, Joo-Tae Moon
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474608
KEYWORDS: Contamination, Critical dimension metrology, Scattering, Light scattering, Reticles, Photomasks, Semiconductors, Standards development, Projection systems, Optical lithography

Proceedings Article | 24 July 2002 Paper
Hyun-Woo Kim, Sook Lee, Sang-Jun Choi, Sung-Ho Lee, Yool Kang, Sang-Gyun Woo, Dongseok Nam, Yun-Sook Chae, Jisoo Kim, Joo-Tae Moon, Robert Kavanagh, George Barclay
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474253
KEYWORDS: Etching, Polymers, Lithography, Manufacturing, Resistance, Dry etching, Chemistry, Scanners, Scanning electron microscopy, Line edge roughness

Proceedings Article | 5 July 2000 Paper
Manhyoung Ryoo, Dongseok Nam, Hanku Cho, Joo-Tae Moon, Sangin Lee
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389019
KEYWORDS: Critical dimension metrology, Optical proximity correction, Monochromatic aberrations, Photomasks, Logic devices, Lithography, Semiconducting wafers, Scanning electron microscopy, Metrology, Optical lithography

Proceedings Article | 5 July 2000 Paper
Dongseok Nam, Nakgeuon Seong, Hanku Cho, Joo-Tae Moon, Sangin Lee
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389017
KEYWORDS: Photomasks, Lithography, Optical lithography, Optical alignment, Lithographic illumination, Critical dimension metrology, Double patterning technology, Photoresist developing, Semiconducting wafers, Domes

Proceedings Article | 29 June 1998 Paper
Dongseok Nam, Junghyun Lee, Chang-Hwan Kim, Seong-Woon Choi, Hoyoung Kang, Joo-Tae Moon
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310727
KEYWORDS: Photomasks, Lithography, Critical dimension metrology, 193nm lithography, Photoresist processing, Photoresist developing, Monochromatic aberrations, Optical lithography, Control systems, Photoresist materials

Showing 5 of 26 publications
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