Experimental investigation of photomask with near-field polarization imaging

Tao Chen; Tom D. Milster; Seung-Hune Yang

doi:10.1117/12.686420

20 October 2006 Experimental investigation of photomask with near-field polarization imaging

Tao Chen, Tom D. Milster, Seung-Hune Yang

Proceedings Volume 6349, Photomask Technology 2006; 634953 (2006) https://doi.org/10.1117/12.686420
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

Near-field induced polarization imaging with a solid immersion lens (SIL) is used to provide high lateral resolution for both native and induced polarization (cross polarized) images. A new technique is used to obtain height information from the near-field induced polarization image. An AltPSM mask sample is studied with this imaging technique, and compared to imaging with an AFM and a PSI interferometer. Topological data from the near-field induced polarization image are within a few nanometer of the AFM result, without contacting surface. In addition, features due to undercutting the Cr are observable in the induced polarization image.

Citation Download Citation

Tao Chen, Tom D. Milster, and Seung-Hune Yang "Experimental investigation of photomask with near-field polarization imaging", Proc. SPIE 6349, Photomask Technology 2006, 634953 (20 October 2006); https://doi.org/10.1117/12.686420

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