Prof. Satoshi Takei
Chemist at Toyama Prefectural Univ
Profile Summary

Satoshi Takei is a professor in Toyama Prefectural University, and a visiting academic staff in Osaka University. He was a member in Nissan Chemical Industries from 1998 to 2010. In 2001, he was a visiting assignee in IMEC. In 2009, he was a visiting scientist of Prof. C. Grant Willson laboratory in University of Texas at Austin and NNIN.
Publications (58)

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10958, 1095818 (2019) https://doi.org/10.1117/12.2514790
KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Quartz, Liquids, Applied physics, Coating, Industrial chemicals, Glasses, Silicon, Semiconducting wafers

Proceedings Article | 9 October 2018 Paper
Proceedings Volume 10787, 107870W (2018) https://doi.org/10.1117/12.2324962
KEYWORDS: Lithography, Bioalcohols, Etching, Microopto electromechanical systems, High volume manufacturing, Polymers, Nanofabrication, Nanostructures, Electron beam lithography, Coating

Proceedings Article | 9 October 2018 Paper
Proceedings Volume 10787, 107870X (2018) https://doi.org/10.1117/12.2325315
KEYWORDS: Metals, Microelectromechanical systems, 3D printing, X-rays, Computed tomography, Nanoimprint lithography, Printing, Laser cutting, X-ray imaging, Digital cameras

Proceedings Article | 9 October 2018 Paper
Proceedings Volume 10787, 107870Y (2018) https://doi.org/10.1117/12.2325321
KEYWORDS: Metals, Microelectromechanical systems, Confocal microscopy, Microscopes, Glasses, Electronic components, Ultraviolet radiation, Nanoimprint lithography, 3D printing, Lithography

Proceedings Article | 19 March 2018 Paper
Proceedings Volume 10584, 1058416 (2018) https://doi.org/10.1117/12.2297093
KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Transmittance, Manufacturing

Proceedings Article | 19 March 2018 Paper
Proceedings Volume 10584, 1058415 (2018) https://doi.org/10.1117/12.2295147
KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Silicon, Optical lithography, Oxygen, Quartz, Nanofibers, Scanning electron microscopy, Lithography, Industrial chemicals

Proceedings Article | 19 March 2018 Paper
Proceedings Volume 10584, 1058414 (2018) https://doi.org/10.1117/12.2295145
KEYWORDS: Etching, Photoresist processing, Electron beam lithography, Image processing, Lithography, Polymers, Carbon, Chemical reactions, Oxygen, Chemical species

Proceedings Article | 31 August 2017 Paper
Proceedings Volume 10354, 1035414 (2017) https://doi.org/10.1117/12.2271024
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Photoresist processing, Electron beams, Manufacturing, Semiconductors, Electron beam lithography, Microelectromechanical systems, Nanoelectromechanical systems

Proceedings Article | 31 August 2017 Paper
Proceedings Volume 10354, 103541E (2017) https://doi.org/10.1117/12.2273464
KEYWORDS: Silicon, Crystals, Composites, Electronic components, Nanofibers, Solar cells, Antennas, Temperature metrology, Crystallography

Proceedings Article | 31 August 2017 Paper
Proceedings Volume 10354, 103541F (2017) https://doi.org/10.1117/12.2273503
KEYWORDS: Crystals, Silicon, Composites, Metals, Crystallography

Proceedings Article | 31 August 2017 Paper
Proceedings Volume 10354, 103541B (2017) https://doi.org/10.1117/12.2273270
KEYWORDS: Nanoimprint lithography

Proceedings Article | 31 August 2017 Paper
Proceedings Volume 10354, 103541Q (2017) https://doi.org/10.1117/12.2275105
KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Nanostructures, Lithography, Natural surfaces, Photoresist processing, Contamination, Nanoelectronics

Proceedings Article | 27 March 2017 Paper
Makoto Hanabata, Satoshi Takei, Shinya Nakajima, Naoto Sugino, Yoko Matsumoto, Atsushi Sekiguchi
Proceedings Volume 10146, 101461I (2017) https://doi.org/10.1117/12.2257095
KEYWORDS: Nanoimprint lithography, Quartz, Nanostructures, Ultraviolet radiation, Polymers, Optical lithography, Nanofibers, Adsorption, Silicon, Oxygen, Lithography, Liquids, Scanning electron microscopy, Line edge roughness

Proceedings Article | 27 March 2017 Paper
Atsushi Sekiguchi, Yoko Matsumoto, Yoshihisa Sensu, Satoshi Takei, Makoto Hanabata, Hatsuyuki Tanaka
Proceedings Volume 10146, 101461K (2017) https://doi.org/10.1117/12.2257548
KEYWORDS: Lithography, Flat panel displays, Microelectromechanical systems, Picture Archiving and Communication System, Electroluminescence, Optical lithography, Polymers, Manufacturing, Photoresist processing, Solids

Proceedings Article | 5 October 2016 Paper
Takao Kameda, Naoto Sugino, Satoshi Takei
Proceedings Volume 9985, 99852D (2016) https://doi.org/10.1117/12.2243417
KEYWORDS: Polymers, Lithography, Measurement devices, Metals, Sensors, Protactinium, Transducers, Eye, Temperature metrology, Molecules

Proceedings Article | 5 October 2016 Paper
Satoshi Takei, Naoto Sugino, Takao Kameda, Shinya Nakajima, Makoto Hanabata
Proceedings Volume 9985, 99852C (2016) https://doi.org/10.1117/12.2243401
KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Photomasks, Adsorption, Optical lithography, Materials processing, Ultraviolet radiation, Optical lithography, Glucose, Oxygen, Resistance, Scanning probe microscopy

Proceedings Article | 5 October 2016 Paper
Proceedings Volume 9985, 99852B (2016) https://doi.org/10.1117/12.2243399
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Polymers, Photoresist processing, Lithography, Etching, Manufacturing, Silicon, Chemical species

Proceedings Article | 4 October 2016 Paper
Naoto Sugino, Shinya Nakajima, Takao Kameda, Satoshi Takei, Makoto Hanabata
Proceedings Volume 9985, 99851I (2016) https://doi.org/10.1117/12.2243418
KEYWORDS: Nanofibers, Nanoimprint lithography, Transmittance, Lithography, Ultraviolet radiation, Nanotechnology, Transparency, Silicon, Optical lithography, Polymers

Proceedings Article | 1 April 2016 Paper
Makoto Hanabata, Satoshi Takei, Kigen Sugahara, Shinya Nakajima, Naoto Sugino, Takao Kameda, Jiro Fukushima, Yoko Matsumoto, Atsushi Sekiguchi
Proceedings Volume 9777, 97771G (2016) https://doi.org/10.1117/12.2217483
KEYWORDS: Nanoimprint lithography, Nanostructures, Ultraviolet radiation, Quartz, Polymers, Nanofibers, Nanotechnology, Lithography, Silicon, Scanning electron microscopy, Polymerization, Resistance, Oxygen, Materials processing

Proceedings Article | 25 March 2016 Paper
Proceedings Volume 9779, 97791L (2016) https://doi.org/10.1117/12.2218948
KEYWORDS: Picture Archiving and Communication System, Lithography, Astatine, Optical lithography, Flat panel displays, Microelectromechanical systems, Electroluminescence, Solids, Manufacturing, Photoresist processing

Proceedings Article | 21 March 2016 Paper
Proceedings Volume 9779, 977929 (2016) https://doi.org/10.1117/12.2217481
KEYWORDS: Lithography, Extreme ultraviolet lithography, Photoresist processing, Electron beam lithography, Electron beams, Extreme ultraviolet, Etching, Silicon, Polymers, Chemical species, Oxygen

Proceedings Article | 7 May 2015 Paper
Proceedings Volume 9507, 95070U (2015) https://doi.org/10.1117/12.2178347
KEYWORDS: Ultraviolet radiation, Etching, Silica, Nanoimprint lithography, Titanium, Carbon, Sol-gels, Quartz, Nanostructures, Titanium dioxide

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 94251V (2015) https://doi.org/10.1117/12.2081820
KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Transparency, Antireflective coatings, Nanostructures, Fluorine, Lithography, Optical lithography, Liquids, Metals

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 94251M (2015) https://doi.org/10.1117/12.2081825
KEYWORDS: Polymers, Light scattering, LCDs, Light emitting diodes, Nanoparticles, Polymer thin films, Epoxies, Organic light emitting diodes, LED backlight, Oxygen

Proceedings Article | 20 March 2015 Paper
Proceedings Volume 9425, 94251P (2015) https://doi.org/10.1117/12.2081829
KEYWORDS: Photoresist processing, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Etching, Polymers, Silicon, Oxygen, Chemical species, Thin films

SPIE Journal Paper | 16 July 2014 Open Access
Tsuyoshi Ogawa, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Satoshi Takei, Makoto Hanabata, C. Grant Willson
JM3, Vol. 13, Issue 03, 031302, (July 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031302
KEYWORDS: Etching, Ultraviolet radiation, Lithography, Silicon, Scanning electron microscopy, Industrial chemicals, Coating, Liquids, Plasma etching, Epoxies

Proceedings Article | 14 May 2014 Paper
Satoshi Takei, Kenta Ito, Gaku Murakami, Tsutomu Obata, Yoshiyuki Yokoyama, Kigenn Sugahara, Takumi Ichikawa, Wataru Mizuno, Junji Sumioka, Masayuki Fujii, Tetsuro Okada
Proceedings Volume 9140, 91400V (2014) https://doi.org/10.1117/12.2045640
KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Lithography, Glucose, Silicon, Liquids, Refractive index, Optical lithography, Polymers, Microscopes

Proceedings Article | 8 May 2014 Paper
Satoshi Takei, Akihiro Oshima, Tomoko Oyama, Kenta Ito, Kigenn Sugahara, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa
Proceedings Volume 9129, 912917 (2014) https://doi.org/10.1117/12.2045633
KEYWORDS: Nanostructures, Lithography, Transparency, Antireflective coatings, Refractive index, Biomedical optics, Polymers, Electron beam lithography, Interfaces, Biology

Proceedings Article | 2 May 2014 Paper
Satoshi Takei, Akihiro Oshima, Kenta Ito, Kigenn Sugahara, Miki Kashiwakura, Tomoko Oyama, Takahiro Kozawa, Seiichi Tagawa, Makoto Hanabata
Proceedings Volume 9130, 913011 (2014) https://doi.org/10.1117/12.2045636
KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Polymers, Nanoelectromechanical systems, Etching, Microelectromechanical systems, Glucose, Dry etching

SPIE Journal Paper | 29 August 2013 Open Access
Satoshi Takei, Gaku Murakami, Yuto Mori, Takumi Ichikawa, Atsushi Sekiguchi, Tsutomu Obata, Yoshiyuki Yokoyama, Wataru Mizuno, Junji Sumioka, Yuji Horita
JM3, Vol. 12, Issue 03, 031113, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031113
KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Refractive index, Glucose, Polymers, Nanostructures, LCDs, Polymerization, Scanning probe microscopy, Liquids

Proceedings Article | 29 March 2013 Paper
Satoshi Takei, Akihiro Oshima, Tomoko Oyama, Takumi Ichikawa, Atsushi Sekiguchi, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa
Proceedings Volume 8682, 86821T (2013) https://doi.org/10.1117/12.2010643
KEYWORDS: Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist processing, Absorption, Image processing, Polymers, Etching, Safety, Optical lithography

Proceedings Article | 29 March 2013 Paper
Satoshi Takei, Gaku Murakami, Yuto Mori, Takumi Ichikawa, Atsushi Sekiguchi, Tsutomu Obata, Yoshiyuki Yokoyama, Wataru Mizuno, Junji Sumioka, Yuji Horita
Proceedings Volume 8682, 868224 (2013) https://doi.org/10.1117/12.2010645
KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Silicon, Refractive index, Glucose, Polymers, Scanning probe microscopy, Nanostructures, Optical lithography, Lithography

Proceedings Article | 29 March 2013 Paper
Satoshi Takei, Naoya Kubo, Takumi Ichikawa, Kazuki Maekawa, Yoshiyuki Yokoyama
Proceedings Volume 8682, 86821M (2013) https://doi.org/10.1117/12.2010646
KEYWORDS: Polymers, Light scattering, LCDs, Light emitting diodes, Polymer thin films, Epoxies, Oxygen, LED backlight, Organic light emitting diodes, Particles

Proceedings Article | 9 May 2012 Paper
Proceedings Volume 8428, 84281U (2012) https://doi.org/10.1117/12.924636
KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Nanotechnology, Photoresist processing, Lithography, Light emitting diodes, Excimer lasers, Optical lithography, Nanostructures, Solar cells

Proceedings Article | 9 May 2012 Paper
Satoshi Takei, Kazuhide Mochizuki, Naoya Kubo, Yoshiyuki Yokoyama
Proceedings Volume 8428, 84281T (2012) https://doi.org/10.1117/12.924633
KEYWORDS: Polymers, LCDs, Polymer thin films, Molecular self-assembly, Light emitting diodes, Epoxies, Light scattering, LED backlight, LED displays, Transmittance

Proceedings Article | 9 May 2012 Paper
Satoshi Takei, Akihiro Oshima, Takanori Wakabayashi, Atsushi Sekiguchi, Takahiro Kozawa, Seiichi Tagawa
Proceedings Volume 8428, 84281V (2012) https://doi.org/10.1117/12.924802
KEYWORDS: Lithography, Photoresist processing, Polymers, Dry etching, Silicon, Etching, Electronic components, Coating, Semiconducting wafers, Safety

Proceedings Article | 16 April 2011 Paper
Satoshi Takei, Tsuyoshi Ogawa
Proceedings Volume 7972, 79722C (2011) https://doi.org/10.1117/12.881495
KEYWORDS: Photomasks, Ultraviolet radiation, Nanoimprint lithography, Fluorine, Silicon, Photoresist processing, Lithography, Optical lithography, Contamination, Epoxies

Proceedings Article | 16 April 2011 Paper
Satoshi Takei, Akihiro Oshima, Naomi Yanamori, Atsushi Sekiguchi, Takahiro Kozawa, Seiichi Tagawa
Proceedings Volume 7972, 797229 (2011) https://doi.org/10.1117/12.878451
KEYWORDS: Lithography, Etching, Electron beam lithography, Photoresist processing, Glucose, Polymerization, Carbon, Oxygen, Photomasks, Electron beams

SPIE Journal Paper | 1 July 2010
JM3, Vol. 9, Issue 03, 033006, (July 2010) https://doi.org/10.1117/12.10.1117/1.3475951

Proceedings Article | 3 April 2010 Paper
Proceedings Volume 7637, 763708 (2010) https://doi.org/10.1117/12.846430
KEYWORDS: Silicon, Ultraviolet radiation, Etching, Oxygen, Silicon carbide, Lithography, Scanning electron microscopy, Coating, Liquids, Epoxies

Proceedings Article | 31 March 2010 Paper
Proceedings Volume 7639, 76391C (2010) https://doi.org/10.1117/12.853200
KEYWORDS: Lithography, Photomasks, Ultraviolet radiation, Etching, Photoresist processing, Nanoimprint lithography, Electron beam lithography, Oxygen, Resistance, Silicon

Proceedings Article | 1 April 2009 Paper
Kentaro Matsunaga, Tomoya Oori, Hirokazu Kato, Eishi Shiobara, Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Yusuke Horiguchi, Tomoya Ohashi, Satoshi Takei, Shinichi Ito
Proceedings Volume 7273, 72734E (2009) https://doi.org/10.1117/12.813647
KEYWORDS: Ultraviolet radiation, Coating, Lithography, Materials processing, Atomic force microscopy, Critical dimension metrology, Semiconducting wafers, Photoresist processing, Polymers, Scanning transmission electron microscopy

Proceedings Article | 1 April 2009 Paper
Satoshi Takei, Michael Lin, Sangwoong Yoon, Tomoya Ohashi, Yasuyuki Nakajima, C. Grant Willson
Proceedings Volume 7273, 72730W (2009) https://doi.org/10.1117/12.813530
KEYWORDS: Ultraviolet radiation, Coating, Lithography, Etching, Semiconducting wafers, Liquids, Chemical analysis, Antireflective coatings, Dielectrics, Industrial chemicals

SPIE Journal Paper | 1 October 2008
Satoshi Takei, Yusuke Horiguchi, Tomoya Ohashi, Yuichi Mano, Makoto Muramatsu, Mitsuaki Iwashita, Katsuhiro Tsuchiya, Akira Samura
JM3, Vol. 7, Issue 04, 043005, (October 2008) https://doi.org/10.1117/12.10.1117/1.2990739
KEYWORDS: Extreme ultraviolet, Ultraviolet radiation, Semiconducting wafers, Etching, Lithography, Chemical mechanical planarization, Materials processing, Coating, Silicon, Dielectrics

Proceedings Article | 4 September 2008 Paper
Satoshi Takei, Makoto Muramatsu, Yusuke Horiguchi, Tomoya Ohashi, Yasuyuki Nakajima, Yuichi Mano, Mitsuaki Iwashita, Katsuhiro Tsuchiya, Tadayuki Yamaguchi
Proceedings Volume 7030, 703010 (2008) https://doi.org/10.1117/12.797401
KEYWORDS: Ultraviolet radiation, Semiconducting wafers, Materials processing, Lithography, Coating, Silicon, Etching, Wet etching, Photoresist materials, Standards development

Proceedings Article | 15 April 2008 Paper
Satoshi Takei, Yasushi Sakaida, Tetsuya Shinjo, Keisuke Hashimoto, Yasuyuki Nakajima
Proceedings Volume 6923, 69232P (2008) https://doi.org/10.1117/12.771902
KEYWORDS: Etching, Lithography, Polymers, Reflectivity, Coating, Semiconducting wafers, Silicon, Reactive ion etching, Dielectrics, Bottom antireflective coatings

Proceedings Article | 26 March 2008 Paper
Satoshi Takei, Yusuke Horiguchi, Tomoya Ohashi, Bang-Ching Ho, Yasuyuki Nakajima, Yuichi Mano, Makoto Muramatsu, Mitsuaki Iwashita, Katsuhiro Tsuchiya, Akira Samura, Yoshiaki Yamada, Tadayuki Yamaguchi
Proceedings Volume 6923, 69232K (2008) https://doi.org/10.1117/12.771934
KEYWORDS: Ultraviolet radiation, Etching, Semiconducting wafers, Chemical mechanical planarization, Coating, Lithography, Dielectrics, Silicon, Double patterning technology, Materials processing

Proceedings Article | 2 April 2007 Paper
Yasushi Sakaida, Makoto Nakajima, Shigeo Kimura, Takahiro Sakaguchi, Keisuke Hashimoto, Hikaru Imamura
Proceedings Volume 6519, 65192A (2007) https://doi.org/10.1117/12.711382
KEYWORDS: System on a chip, Etching, Silicon, Reflectivity, Lithography, Immersion lithography, Photoresist processing, Reflection, Sensors, Semiconducting wafers

Proceedings Article | 30 March 2007 Paper
Proceedings Volume 6519, 65192V (2007) https://doi.org/10.1117/12.711308
KEYWORDS: Lithography, Polymers, Semiconducting wafers, Coating, Silicon, Etching, Bottom antireflective coatings, Photoresist processing, Copper, Semiconductors

Proceedings Article | 26 March 2007 Paper
Satoshi Takei, Yusuke Horiguchi, Tetsuya Shinjo, Bang-Ching Ho, Yuichi Mano, Yasuyuki Nakajima, Makoto Muramatsu, Mitsuaki Iwashita, Katsuhiro Tsuchiya
Proceedings Volume 6519, 651933 (2007) https://doi.org/10.1117/12.711362
KEYWORDS: Extreme ultraviolet, Ultraviolet radiation, Lithography, Etching, Semiconducting wafers, Silicon, Optical lithography, Photoresist processing, Dry etching, Photoresist materials

Proceedings Article | 23 March 2007 Paper
Tetsuya Shinjo, Satoshi Takei, Yusuke Horiguchi, Yasuyuki Nakajima
Proceedings Volume 6519, 651930 (2007) https://doi.org/10.1117/12.712461
KEYWORDS: Semiconducting wafers, Etching, Photoresist materials, Standards development, Lithography, Photoresist developing, Reactive ion etching, Thin film coatings, Coating, Antireflective coatings

Proceedings Article | 11 April 2006 Paper
Makoto Nakajima, Takahiro Sakaguchi, Keisuke Hashimoto, Rikimaru Sakamoto, Takahiro Kishioka, Satoshi Takei, Tomoyuki Enomoto, Yasuyuki Nakajima
Proceedings Volume 6153, 61532L (2006) https://doi.org/10.1117/12.656132
KEYWORDS: System on a chip, Etching, Photoresist processing, Lithography, Photomasks, Silicon, Semiconducting wafers, Reflectivity, Bottom antireflective coatings, Carbon

Proceedings Article | 11 April 2006 Paper
Satoshi Takei, Tetsuya Shinjo, Yasushi Sakaida, Yusuke Horiguchi, Yasuyuki Nakajima
Proceedings Volume 6153, 61532Q (2006) https://doi.org/10.1117/12.655398
KEYWORDS: Etching, Photoresist materials, Semiconducting wafers, Polymers, Silicon, Coating, Lithography, 193nm lithography, Reflectivity, Absorbance

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 61532O (2006) https://doi.org/10.1117/12.655529
KEYWORDS: Contamination, Photoresist processing, Lithography, Chemical reactions, Annealing, Diffusion, Semiconducting wafers, Silicon, Cadmium sulfide, Polymers

Proceedings Article | 4 May 2005 Paper
Tetsuya Shinjo, Satoshi Takei, Yasushi Sakaida, Anwei Qin, Yasuyuki Nakajima
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599249
KEYWORDS: Etching, Photoresist materials, Semiconducting wafers, Silicon, Reflectivity, Coating, Lithography, Copper, Polymers, Dielectrics

Proceedings Article | 14 May 2004 Paper
Tomoyuki Enomoto, Satoshi Takei, Takahiro Kishioka, Tadashi Hatanaka, Rikimaru Sakamoto, Yasuyuki Nakajima
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534653
KEYWORDS: Reflectivity, Photoresist materials, Etching, Silicon, Semiconducting wafers, Plasma etching, Oxides, Bottom antireflective coatings, Thin films, Reflection

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534338
KEYWORDS: Semiconducting wafers, Etching, Lithography, Standards development, Reactive ion etching, Optical lithography, Metals, Polymers, Photoresist materials, Materials processing

Proceedings Article | 24 August 2001 Paper
Yubao Wang, Xiaoming Wu, Gu Xu, James Lamb, John Sullivan, James Claypool, Jackie Backus, Sean Trautman, Xie Shao, Satoshi Takei, Yasuhisa Sone, Kenichi Mizusawa, Hiroyoshi Fukuro
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436917
KEYWORDS: Coating, Etching, Photoresist materials, Semiconducting wafers, Bottom antireflective coatings, Antireflective coatings, Lithography, Thin films, Critical dimension metrology, Deep ultraviolet

Showing 5 of 58 publications
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