Mr. Mandar R. Bhave Profile

Mandar R. Bhave

Applications Engineer at Intel Corp.

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Author

Publications (4)

Proceedings Article | 14 May 2004 Paper

Developer-soluble gap fill materials for patterning metal trenches in via-first dual damascene process

Mandar Bhave, Kevin Edwards, Carlton Washburn, Satoshi Takei, Yasushi Sakaida, Yasuyuki Nakajima

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534338

KEYWORDS: Semiconducting wafers, Etching, Lithography, Standards development, Reactive ion etching, Optical lithography, Metals, Polymers, Photoresist materials, Materials processing

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Proceedings Article | 24 July 2002 Paper

Thin organic bottom antireflective coatings for 193 nm lithography

Mandar Bhave, James Meador, James Claypool, Shreeram Deshpande, Jill Akers, Anne Lindgren

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474183

KEYWORDS: Reflectivity, Photoresist materials, Polymers, Etching, Lithography, Bottom antireflective coatings, 193nm lithography, Absorbance, Optical properties, Critical dimension metrology

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Proceedings Article | 24 August 2001 Paper

Improved crosslinkable polymeric binders for 193-nm bottom antireflective coatings (BARCs)

James Meador, Xie Shao, Mandar Bhave, Chris Cox, John Thompson, Debra Thomas, Stephen Gibbons, Ashley Farnsworth, Michael Rich

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436918

KEYWORDS: Polymers, Photoresist materials, Reflectivity, Etching, Plasma etching, Lithography, Silicon, Scanning electron microscopy, Semiconducting wafers, Ions

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Proceedings Article | 23 June 2000 Paper

Second-generation 193-nm bottom antireflective coatings (BARCs)

James Meador, Xie Shao, Vandana Krishnamurthy, Mikko Arjona, Mandar Bhave, Gu Xu, James Claypool, Anne Lindgren

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388264

KEYWORDS: Reflectivity, Etching, Polymers, Plasma etching, Manufacturing, Photoresist materials, Lithography, Semiconducting wafers, Particles, Absorbance

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