Mr. Matthew Lamantia Profile

Matthew Lamantia

BEOL Engg. Leader at Toppan Photomasks Inc

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Author

Publications (11)

Proceedings Article | 19 May 2011 Paper

193-nm radiation durability study of MoSi binary mask and resulting lithographic performance

Isabelle Servin, Jérôme Belledent, Laurent Pain, Brid Connolly, Martin Sczyrba, Matt Lamantia

Proceedings Volume 8081, 80810X (2011) https://doi.org/10.1117/12.899173

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanners, SRAF, Binary data, Lithography, Cadmium, Metrology, Scattering

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Proceedings Article | 25 September 2010 Paper

Aging study in advanced photomasks: impact of EFM effects on lithographic performance with MoSi binary and 6% attenuated PSM masks

I. Servin, J. Belledent, M. O. Fialeyre, B. Connolly, M. Lamantia, M. Sczyrba, M. K. Jullian, B. Le Gratiet, L. Pain

Proceedings Volume 7823, 78230N (2010) https://doi.org/10.1117/12.864529

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Reticles, Binary data, Scanning electron microscopy, Scanners, Lithography, Optical proximity correction, Metrology

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Proceedings Article | 11 May 2009 Paper

Comparison of lithographic performance between MoSi binary mask and MoSi attenuated PSM

Mitsuharu Yamana, Matthew Lamantia, Vicky Philipsen, Shingo Wada, Tatsuya Nagatomo, Yoji Tonooka

Proceedings Volume 7379, 73791L (2009) https://doi.org/10.1117/12.824298

KEYWORDS: Photomasks, Semiconducting wafers, Electroluminescence, SRAF, Critical dimension metrology, Lithography, Binary data, Quartz, Polarization, Manufacturing

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Proceedings Article | 11 May 2009 Paper

Investigation of EUV mask defectivity via full-field printing and inspection on wafer

Rik Jonckheere, Dieter Van Den Heuvel, Fumio Iwamoto, Nickolay Stepanenko, Alan Myers, Matt Lamantia, Anne-Marie Goethals, Eric Hendrickx, Kurt Ronse

Proceedings Volume 7379, 73790R (2009) https://doi.org/10.1117/12.824268

KEYWORDS: Reticles, Photomasks, Semiconducting wafers, Printing, Wafer inspection, Inspection, Extreme ultraviolet, Scanning electron microscopy, Atomic force microscopy, Distortion

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Proceedings Article | 19 May 2008 Paper

MoSi absorber photomask for 32nm node

Toshio Konishi, Yosuke Kojima, Hiroyuki Takahashi, Masato Tanabe, Takashi Haraguchi, Matthew Lamantia, Yuichi Fukushima, Yoshimitsu Okuda

Proceedings Volume 7028, 702803 (2008) https://doi.org/10.1117/12.796010

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Air contamination, Lithography, Nanoimprint lithography, Printing, Critical dimension metrology, Binary data, Dry etching

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Proceedings Article | 8 November 2005 Paper

Use of excimer laser test system for studying haze growth

Joseph Gordon, Brooke Murray, Larry Frisa, Erik Nelson, Colleen Weins, Michael Green, Matt Lamantia

Proceedings Volume 5992, 59923J (2005) https://doi.org/10.1117/12.632204

KEYWORDS: Air contamination, Pellicles, Photomasks, Contamination, Excimer lasers, Semiconducting wafers, Reticles, Inspection, Reliability, Materials processing

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Proceedings Article | 20 August 2004 Paper

Imaging properties of a leading-edge DUV laser generated photomask

Curt Jackson, Peter Buck, Sarah Cohen, Vishal Garg, Jason Hickethier, Charles Howard, Robert Kiefer, Matt Lamantia, John Manfredo, James Tsou

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557720

KEYWORDS: Deep ultraviolet, Photomasks, Lithography, Semiconducting wafers, Manufacturing, Lithographic illumination, Electron beam lithography, Solids, Tolerancing, Vestigial sideband modulation

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Proceedings Article | 27 December 2002 Paper

Partitioning of photomask processes for defects: II.

Charles Howard, Matthew Lamantia

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467855

KEYWORDS: Inspection, Etching, Photomasks, Reticles, Deep ultraviolet, Plasma etching, Chemically amplified resists, Electron beams, Plasma, Photoresist processing

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Proceedings Article | 27 December 2002 Paper

Reticle defect printability: impact on yield and feedback to suppliers

Robert Vinje, Arthur Klaum, David Chmielewski, Matt Lamantia, Dawn Woolery, Dianna Coburn, Colleen Weins

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468087

KEYWORDS: Reticles, Inspection, Semiconducting wafers, Manufacturing, Defect detection, Semiconductors, Photomasks, Defect inspection, Etching, Wafer inspection

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Proceedings Article | 11 March 2002 Paper

ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

Jerry Chen, John Riddick, Matt Lamantia, Azeddine Zerrade, Robert Henderson, Greg Hughes, Cyrus Tabery, Khoi Phan, Chris Spence, Amy Winder, William Stanton, Eugene Delarosa, John Maltabes, Cecilia Philbin, Lloyd Litt, Anthony Vacca, Scott Pomeroy

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458362

KEYWORDS: Quartz, Photomasks, Semiconducting wafers, Scanning electron microscopy, Etching, Atomic force microscopy, Ions, Reticles, Inspection, Critical dimension metrology

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Proceedings Article | 22 January 2001 Paper

Correlation of reticle defects detectability and repairs to ArF wafer printability for 0.13-um design rule with binary OPC/SB mask

Khoi Phan, Chris Spence, John Riddick, Jerry Chen, Matt Lamantia, Hugo Villa

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410693

KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Inspection, Scanning electron microscopy, Optical proximity correction, Binary data, Printing, 193nm lithography, Defect detection

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Showing 5 of 11 publications

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