Dr. Frank M. Schellenberg Profile

Dr. Frank M. Schellenberg

Patent Agent

SPIE Involvement:

Author

Publications (29)

Proceedings Article | 21 June 2006 Paper

Consequences of plasmonic effects in photomasks

F. Schellenberg, K. Adam, J. Matteo, L. Hesselink

Proceedings Volume 6281, 62810B (2006) https://doi.org/10.1117/12.692732

KEYWORDS: Photomasks, Polarization, SRAF, Resolution enhancement technologies, Plasmonics, Chromium, Plasmons, Computer simulations, Lithography, Surface plasmons

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Proceedings Article | 24 March 2006 Paper

Using phase-mask algorithms to direct self assembly

F. Schellenberg, J. Torres

Proceedings Volume 6151, 61513L (2006) https://doi.org/10.1117/12.666922

KEYWORDS: Photomasks, Phase shifts, Polymers, Lithography, Picosecond phenomena, Phase shifting, Etching, Polymethylmethacrylate, Photoresist processing, Directed self assembly

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Proceedings Article | 6 May 2005 Paper

Layout compensation for EUV flare

Franklin Schellenberg, James Word, Olivier Toublan

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599999

KEYWORDS: Optical proximity correction, Extreme ultraviolet, Visualization, Lithography, Point spread functions, Extreme ultraviolet lithography, EUV optics, Photomasks, Process modeling, Data modeling

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Proceedings Article | 27 January 2005 Paper

The next generation of RET

Franklin Schellenberg

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.577222

KEYWORDS: Resolution enhancement technologies, Photomasks, Optical proximity correction, Lithography, SRAF, Polarization, Phase shifts, Phase shifting, Computer simulations, Design for manufacturing

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Proceedings Article | 28 May 2004 Paper

Resolution enhancement technology: the past, the present, and extensions for the future

Franklin Schellenberg

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.548923

KEYWORDS: Photomasks, Resolution enhancement technologies, Phase shifts, Optical proximity correction, Lithography, Polarization, Patents, Optical lithography, Photography, Phase shifting

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SPIE Journal Paper | 1 April 2004 Open Access

Mask Technology for Optical Lithography

Frank Schellenberg, Kevin Cummings

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1715096

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Proceedings Article | 16 June 2003 Paper

Design strategies for future lithography technologies (or: OPC will never die)

Franklin Schellenberg

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484931

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Resolution enhancement technologies, Extreme ultraviolet, Semiconducting wafers, Calibration, Nanoimprint lithography, Polarization, Electron beam lithography

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SPIE Journal Paper | 1 April 2003

Contrast analysis and optimization for resolution enhancement technique

Juan Torres, Yuri Granik, Franklin Schellenberg

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1562931

KEYWORDS: Resolution enhancement technologies, Optical proximity correction, SRAF, Model-based design, Lithography, Image processing, Photomasks, Inspection, Solids, Scattering

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Proceedings Article | 1 August 2002 Paper

Advanced data preparation and design automation

Franklin Schellenberg

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476929

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Resolution enhancement technologies, Optical proximity correction, Inspection, Databases, Data processing, Lithography, Data conversion

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Proceedings Article | 30 July 2002 Paper

Model-assisted double dipole decomposition

Andres Torres, Franklin Schellenberg, Olivier Toublan

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474589

KEYWORDS: Optical proximity correction, Model-based design, Image processing, Systems modeling, Feature extraction, Visualization, Optical lithography, Photomasks, Resolution enhancement technologies

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Proceedings Article | 12 July 2002 Paper

Adoption costs and hierarchy efficiency for 100 nm and beyond

Franklin Schellenberg

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475691

KEYWORDS: Photomasks, Optical proximity correction, Reticles, Resolution enhancement technologies, Semiconducting wafers, Data compression, Lithography, Inspection, Fiber optic illuminators, SRAF

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Proceedings Article | 12 July 2002 Paper

Design verification flow for model-assisted double-dipole decomposition

Juan Andres Torres, Franklin Schellenberg, Olivier Toublan

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475695

KEYWORDS: Manufacturing, Photomasks, Optical proximity correction, Lithography, Data modeling, Optics manufacturing, Image acquisition, Resolution enhancement technologies, Image processing, Lithographic illumination

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Proceedings Article | 19 July 2000 Paper

Integration of optical proximity correction strategies in strong phase-shifter design for polygate layers

Chris Spence, Marina Plat, Emile Sahouria, Nicolas Cobb, Franklin Schellenberg

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392102

KEYWORDS: Optical proximity correction, Photomasks, Model-based design, Semiconducting wafers, Phase shifts, Distortion, Binary data, Transistors, Visualization, Logic

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Proceedings Article | 5 July 2000 Paper

OPC beyond 0.18 mm: OPC on PSM gates

Franklin Schellenberg, Olivier Toublan, Nicolas Cobb, Emile Sahouria, Greg Hughes, Susan MacDonald, Craig West

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388942

KEYWORDS: Photomasks, Reticles, Optical proximity correction, Phase shifts, Phase shifting, Semiconducting wafers, Lithography, Manufacturing, Phase measurement, Etching

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Proceedings Article | 5 July 2000 Paper

Phase aware proximity correction for advanced masks

Olivier Toublan, Emile Sahouria, Nicolas Cobb, Thuy Do, Tom Donnelly, Yuri Granik, Franklin Schellenberg, Patrick Schiavone

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388972

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Phase shifts, Image processing, Critical dimension metrology, Manufacturing, Photoresist processing, Mathematical modeling, Model-based design

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Proceedings Article | 2 June 2000 Paper

New process monitor for reticles and wafers: the MEEF meter

Franklin Schellenberg, Pat LaCour, Olivier Toublan, Geoffrey Anderson, Raymond Yip

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386471

KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Cadmium, Photomasks, Metrology, Lithography, Scanning electron microscopy, Photoresist processing, Resolution enhancement technologies

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Proceedings Article | 30 December 1999 Paper

Integration of optical proximity correction strategies in strong phase shifters design for poly-gate layers

Chris Spence, Marina Plat, Emile Sahouria, Nicolas Cobb, Franklin Schellenberg

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373322

KEYWORDS: Optical proximity correction, Photomasks, Model-based design, Phase shifts, Semiconducting wafers, Distortion, Transistors, Binary data, Computer aided design, Data modeling

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Proceedings Article | 30 December 1999 Paper

MEEF in theory and practice

Franklin Schellenberg, Chris Mack

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373313

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Spatial frequencies, Image processing, Lithography, Optical proximity correction, Imaging systems, Coherence imaging, Fourier transforms

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Proceedings Article | 25 August 1999 Paper

Implementation issues for production OPC

Franklin Schellenberg, Pat LaCour

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360254

KEYWORDS: Optical proximity correction, Reticles, Manufacturing, Inspection, Photomasks, Semiconducting wafers, Data processing, Detection and tracking algorithms, Data modeling, Process modeling

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Proceedings Article | 26 July 1999 Paper

Impact of mask errors on full chip error budgets

Franklin Schellenberg, Victor Boksha, Nicolas Cobb, J. Lai, C. Chen, Chris Mack

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354339

KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Etching, Optical proximity correction, Lithography, Image processing, Optical lithography, Critical dimension metrology, Photoresist processing

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Proceedings Article | 29 June 1998 Paper

SEMATECH J111 project: OPC validation

Franklin Schellenberg, Hua Zhang, Jim Morrow

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310719

KEYWORDS: Optical proximity correction, Semiconducting wafers, Reticles, Photomasks, Deep ultraviolet, Etching, Manufacturing, Lithography, Scanning electron microscopy, Inspection

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Proceedings Article | 7 July 1997 Paper

Interferometric lithography exposure tool for 180-nm structures

Saleem Zaidi, Steven Brueck, Franklin Schellenberg, R. Mackay, K. Uekert, Jeffrey Persoff

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275785

KEYWORDS: Semiconducting wafers, Lithography, Interferometry, Wafer-level optics, Photoresist processing, Digital signal processing, Laser sources, Photoresist materials, Manufacturing, Optical lithography

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Proceedings Article | 24 July 1996 Paper

DUV printability of laser repairs on binary and attenuated phase-shift masks

James Reynolds, Franklin Schellenberg, Michael Hibbs, Dennis Hayden

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245225

KEYWORDS: Photomasks, Carbon, Semiconducting wafers, Reticles, Atomic force microscopy, Binary data, Inspection, Scanning electron microscopy, Deep ultraviolet

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Proceedings Article | 7 June 1996 Paper

Evaluation of OPC efficacy

Franklin Schellenberg, Hua Zhang, Jim Morrow

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240986

KEYWORDS: Optical proximity correction, Scanning electron microscopy, Image processing, Computer aided design, Lithography, Photomasks, Distortion, Electron microscopes, Critical dimension metrology, Image quality

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Proceedings Article | 8 December 1995 Paper

Printability of laser mask repairs at deep UV

James Reynolds, Franklin Schellenberg

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228165

KEYWORDS: Semiconducting wafers, Photomasks, Reticles, Samarium, Atomic force microscopy, Printing, Scanning electron microscopy, Inspection, Nonimpact printing, Deep ultraviolet

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Proceedings Article | 3 July 1995 Paper

Printability of laser mask repairs at deep UV

James Reynolds, Franklin Schellenberg

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212794

KEYWORDS: Semiconducting wafers, Photomasks, Reticles, Scanning electron microscopy, Printing, Nonimpact printing, Deep ultraviolet, Atomic force microscopy, Inspection, Information operations

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Proceedings Article | 1 January 1994 Paper

Technology development in the U.S. and Japan: the case of the phase-shifting mask

Frank Schellenberg, Dan Okimoto, Jim Raphael, Norihiko Shirouzu

Proceedings Volume 10273, 102730F (1994) https://doi.org/10.1117/12.177435

KEYWORDS: Phase shifts, Photomasks, Manufacturing, Semiconductors

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Proceedings Article | 26 March 1993 Paper

Real and imaginary phase-shifting masks

Franklin Schellenberg, David Levenson

Proceedings Volume 1809, (1993) https://doi.org/10.1117/12.142145

KEYWORDS: Photomasks, Phase shifts, Lithography, Fourier transforms, Computer aided design, Photoresist materials, Solids, Bessel beams, Inspection, Spatial frequencies

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Proceedings Article | 1 January 1992 Paper

Optimization of real phase-mask performance

Franklin Schellenberg, David Levenson, Phillip Brock

Proceedings Volume 1604, (1992) https://doi.org/10.1117/12.56948

KEYWORDS: Photomasks, Phase shifts, Bessel beams, Bessel functions, Lithography, Etching, Fourier transforms, Spatial frequencies, Image transmission, Optical simulations

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Showing 5 of 29 publications

Proceedings Volume Editor (4)

SPIE Conference Volume | 17 March 2009

Alternative Lithographic Technologies

SPIE Conference Volume | 29 April 2008

Emerging Lithographic Technologies XII

SPIE Conference Volume | 13 March 2007

Emerging Lithographic Technologies XI

SPIE Conference Volume | 10 March 2006

Emerging Lithographic Technologies X

Conference Committee Involvement (24)

Novel Patterning Technologies 2018

26 February 2018 | San Jose, California, United States

Emerging Patterning Technologies 2017

27 February 2017 | San Jose, California, United States

Alternative Lithographic Technologies VIII

22 February 2016 | San Jose, California, United States

Alternative Lithographic Technologies VII

23 February 2015 | San Jose, California, United States

Alternative Lithographic Technologies VI

24 February 2014 | San Jose, California, United States

Alternative Lithographic Technologies V

25 February 2013 | San Jose, California, United States

Alternative Lithographic Technologies IV

13 February 2012 | San Jose, California, United States

Alternative Lithographic Technologies III

1 March 2011 | San Jose, California, United States

Photomask Technology

13 September 2010 | Monterey, California, United States

Alternative Lithographic Technologies II

23 February 2010 | San Jose, California, United States

Photomask Technology

15 September 2009 | Monterey, California, United States

Alternative Lithographic Technologies

24 February 2009 | San Jose, California, United States

Photomask Technology

7 October 2008 | Monterey, California, United States

Emerging Lithographic Technologies XII

26 February 2008 | San Jose, California, United States

Emerging Lithographic Technologies XI

27 February 2007 | San Jose, California, United States

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

Emerging Lithographic Technologies X

21 February 2006 | San Jose, California, United States

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

Emerging Lithographic Technologies IX

1 March 2005 | San Jose, California, United States

Photomask and Next-Generation Lithography Mask Technology XI

14 April 2004 | Yokohama, Japan

Emerging Lithographic Technologies VIII

24 February 2004 | Santa Clara, California, United States

Photomask and NGL Mask Technology X

16 April 2003 | Yokohama, Japan

Cost and Performance in Integrated Circuit Creation

27 February 2003 | Santa Clara, CA, United States

Emerging Lithographic Technologies VII

25 February 2003 | Santa Clara, California, United States

Showing 5 of 24 Conference Committees

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