Consequences of plasmonic effects in photomasks

F. M. Schellenberg; K. Adam; J. Matteo; L. Hesselink

doi:10.1117/12.692732

21 June 2006 Consequences of plasmonic effects in photomasks

F. M. Schellenberg, K. Adam, J. Matteo, L. Hesselink

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Proceedings Volume 6281, 22nd European Mask and Lithography Conference; 62810B (2006) https://doi.org/10.1117/12.692732
Event: 22nd European Mask and Lithography Conference, 2006, Dresden, Germany

Abstract

For 45nm lithography and beyond, polarization and other electromagnetic effects such as surface plasmons may begin to affect the transmission through a photomask. Such phenomena are highly polarization sensitive, and may amplify the effects of line-edge roughness (LER) and variations in mask composition. A reduction in the mask material conductivity can mitigate the impact of these effects, but more accurate simulation is required to predict these effects well.

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F. M. Schellenberg, K. Adam, J. Matteo, and L. Hesselink "Consequences of plasmonic effects in photomasks", Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810B (21 June 2006); https://doi.org/10.1117/12.692732

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