OPC beyond 0.18 mm: OPC on PSM gates

Franklin M. Schellenberg; Olivier Toublan; Nicolas B. Cobb; Emile Y. Sahouria; Greg P. Hughes; Susan S. MacDonald; Craig A. West

doi:10.1117/12.388942

5 July 2000 OPC beyond 0.18 μm: OPC on PSM gates

Franklin M. Schellenberg, Olivier Toublan, Nicolas B. Cobb, Emile Y. Sahouria, Greg P. Hughes, Susan S. MacDonald, Craig A. West

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388942
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

For lithography smaller that 180 nm using 248 nm steppers, phase-shifting lithography is becoming more routine. However, when applied to very small dimensions, OPC effects begin to become pronounced. We have design a new phase- shifting test structure for reticles to address these phase shifting distortions, and report on its use.

Citation Download Citation

Franklin M. Schellenberg, Olivier Toublan, Nicolas B. Cobb, Emile Y. Sahouria, Greg P. Hughes, Susan S. MacDonald, and Craig A. West "OPC beyond 0.18 μm: OPC on PSM gates", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388942

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