Model-assisted double dipole decomposition

Andres Torres; Franklin M. Schellenberg; Olivier Toublan

doi:10.1117/12.474589

30 July 2002 Model-assisted double dipole decomposition

Andres Torres, Franklin M. Schellenberg, Olivier Toublan

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474589
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Double dipole processes in general have been considered for full Manhattan design styles. However, with the assistance of current model-based OPC tools and high-resolution optical systems, it is possible to analyze the requirements for all angle designs. When angled features present in the design layout are located in regions where only connectivity and not CD control is critical, the method generates an acceptable solution for a given set of optical conditions. The present methodology investigates the use of selective edge biases for clear-field double dipole decomposition. Such an approach is based on the double exposure nature of the method. In full Manhattan designs, two different contrast values are associated to every edge, and in general one is higher than the other. On the contrary, angled edges may have the same contrast depending on the shape of the pupil and local proximity environment. This method maximizes the overall contrast of the layout by creating selective feature biases. These biases are placed in the non-optimal optical direction and protect the regions that have a higher contrast in the complementary dipole direction. The initial decomposition generates two masks in which a maximum global contrast function is maximized. This initial decomposition is later fed to a two-layer model based correction. The final result is analyzed in terms of contrast, pattern fidelity and focus dependence in order to determine the feasibility of printing Manhattan and angled features using a double dipole approach for sub 100 nm processes.

Citation Download Citation

Andres Torres, Franklin M. Schellenberg, and Olivier Toublan "Model-assisted double dipole decomposition", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474589

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available