Mr. Nobutaka Kikuiri Profile

Nobutaka Kikuiri

Fellow at NuFlare Technology Inc

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Author

Publications (22)

Proceedings Article | 29 September 2021 Presentation

Study of high throughput EUV mask pattern inspection technologies using multi e-beam optics

Tadayuki Sugimori, Riki Ogawa, Hidekazu Takekoshi, John Hartley, David Pinkney, Atsushi Ando, Koichi Ishii, Chosaku Noda, Nobutaka Kikuiri

Proceedings Volume 11855, 118550C (2021) https://doi.org/10.1117/12.2600987

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Optical inspection, Optics manufacturing, EUV optics, Wafer-level optics, Image processing, Extreme ultraviolet lithography, Deep ultraviolet

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Proceedings Article | 23 August 2021 Paper

Study of high throughput EUV mask pattern inspection technologies using multi e-Beam optics

Tadayuki Sugimori, Riki Ogawa, Hidekazu Takekoshi, John Hartley, David Pinckney, Atsushi Ando, Koichi Ishii, Chosaku Noda, Nobutaka Kikuiri

Proceedings Volume 11908, 119080J (2021) https://doi.org/10.1117/12.2598235

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Study of high throughput EUV mask pattern defect inspection technologies using multibeam electron optics

Hidekazu Takekoshi, Riki Ogawa, John Hartley, David Pinckeny, Atsushi Ando, Koichi Ishii, Chosaku Noda, Tadayuki Sugimori, Nobutaka Kikuiri

Proceedings Volume 11611, 116112N (2021) https://doi.org/10.1117/12.2583613

KEYWORDS: Photomasks, Extreme ultraviolet, Optics manufacturing, Inspection, EUV optics, Defect inspection, Extreme ultraviolet lithography, Semiconductor manufacturing, Optical systems, Optical inspection

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Proceedings Article | 23 October 2015 Paper

DUV inspection tool application for beyond optical resolution limit pattern

Hiromu Inoue, Nobutaka Kikuiri, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Takashi Hirano, Ryoji Yoshikawa

Proceedings Volume 9635, 96350R (2015) https://doi.org/10.1117/12.2197890

KEYWORDS: Inspection, Deep ultraviolet, Optical inspection, Photomasks, Nanoimprint lithography, Optical resolution, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection

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Proceedings Article | 28 June 2013 Paper

Improvement of a DUV mask inspection tool to hand over the baton for next-generation tool smoothly

Hideaki Hashimoto, Nobutaka Kikuiri, Eiji Matsumoto, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Manabu Isobe, Kenichi Takahara

Proceedings Volume 8701, 87010V (2013) https://doi.org/10.1117/12.2029363

KEYWORDS: Inspection, Photomasks, Deep ultraviolet, Optical lithography, Extreme ultraviolet, Image sensors, Sensors, Image transmission, Double patterning technology, Lithography

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Proceedings Article | 29 September 2010 Paper

Study of EUV mask inspection technique using DUV light source for hp22nm and beyond

Ryoichi Hirano, Nobutaka Kikuiri, Hideaki Hashimoto, Kenichi Takahara, Masatoshi Hirono, Hiroyuki Shigemura

Proceedings Volume 7823, 782339 (2010) https://doi.org/10.1117/12.866673

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Defect detection, Extreme ultraviolet lithography, Image contrast enhancement, Image enhancement, Lithographic illumination, Image sensors, Light sources

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Proceedings Article | 16 April 2010 Paper

Mask data rank and printability verification function of mask inspection system

Kenichi Takahara, Masakazu Tokita, Hideo Tsuchiya, Masaki Yamabe, Nobutaka Kikuiri, Kinya Usuda

Proceedings Volume 7638, 763833 (2010) https://doi.org/10.1117/12.846412

KEYWORDS: Inspection, Photomasks, Defect detection, Databases, Data conversion, Computer simulations, Semiconductors, Source mask optimization, Defect inspection, Optical proximity correction

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Proceedings Article | 2 April 2010 Paper

A novel defect detection optical system using 199-nm light source for EUVL mask

Ryoichi Hirano, Nobutaka Kikuiri, Masatoshi Hirono, Riki Ogawa, Hiroyuki Sigemura, Kenichi Takahara, Hideaki Hashimoto

Proceedings Volume 7638, 76382Z (2010) https://doi.org/10.1117/12.848679

KEYWORDS: Photomasks, Inspection, Defect detection, Image contrast enhancement, Signal detection, Extreme ultraviolet lithography, Extreme ultraviolet, Image enhancement, Lithography, Image sensors

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Proceedings Article | 17 February 2010 Paper

Highly reliable 198-nm light source for semiconductor inspection based on dual fiber lasers

Shinichi Imai, Kazuto Matsuki, Nobutaka Kikuiri, Katsuhiko Takayama, Osamu Iwase, Yoshiharu Urata, Tatsuya Shinozaki, Yoshio Wada, Satoshi Wada

Proceedings Volume 7580, 75800H (2010) https://doi.org/10.1117/12.840467

KEYWORDS: Light sources, Inspection, Fiber lasers, Fiber amplifiers, Photomasks, Optical amplifiers, Semiconductors, Pulsed laser operation, Oscillators

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Proceedings Article | 30 September 2009 Paper

Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics

Nobutaka Kikuiri, Masatoshi Hirono, Ryoichi Hirano, Tsuyoshi Amano, Osamu Suga, Hiroyuki Shigemura, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda

Proceedings Volume 7488, 74882O (2009) https://doi.org/10.1117/12.829747

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, EUV optics, Image contrast enhancement, Laser sources, Optical inspection, Defect detection, Super resolution, Optical alignment

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Proceedings Article | 30 September 2009 Paper

Study of EUVL mask defect inspection using 199-nm inspection tool with super-resolution method

Hiroyuki Shigemura, Tsuyoshi Amano, Yukiyasu Arisawa, Osamu Suga, Hideaki Hashimoto, Masanori Saito, Masaya Takeda, Nobutaka Kikuiri, Ryoichi Hirano

Proceedings Volume 7488, 74882I (2009) https://doi.org/10.1117/12.829748

KEYWORDS: Photomasks, Inspection, Opacity, Defect inspection, Defect detection, Extreme ultraviolet lithography, Semiconducting wafers, Reflectivity, Signal analysis, Scanning electron microscopy

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Proceedings Article | 23 September 2009 Paper

Printability verification function of mask inspection system

Hideo Tsuchiya, Masaki Yamabe, Masakazu Tokita, Kenichi Takahara, Kinya Usuda, Fumio Ozaki, Nobutaka Kikuiri

Proceedings Volume 7488, 74880B (2009) https://doi.org/10.1117/12.829739

KEYWORDS: Inspection, Photomasks, Lithography, Defect detection, Image transmission, Semiconducting wafers, SRAF, Optical inspection, Telecommunications, Sensors

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Proceedings Article | 23 September 2009 Paper

Defect printability analysis by lithographic simulation from high resolution mask images

George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Yasuko Saito, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji

Proceedings Volume 7488, 74880A (2009) https://doi.org/10.1117/12.831475

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Lithography, Scanners, Sensors, Image resolution, Optical inspection, Wafer-level optics, Printing

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Proceedings Article | 11 May 2009 Paper

Evaluation of EUVL mask pattern defect inspection using 199nm inspection tool with super-resolution method

Hiroyuki Shigemura, Tsuyoshi Amano, Yasushi Nishiyama, Osamu Suga, Yukiyasu Arisawa, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda, Nobutaka Kikuiri, Ryoichi Hirano

Proceedings Volume 7379, 73792K (2009) https://doi.org/10.1117/12.824334

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Defect inspection, Reflectivity, Optical inspection, Defect detection, Signal detection, Opacity, Finite-difference time-domain method

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Proceedings Article | 11 May 2009 Paper

Mask-LMC: lithographic simulation and defect detection from high-resolution mask images

George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji

Proceedings Volume 7379, 73791B (2009) https://doi.org/10.1117/12.824288

KEYWORDS: Photomasks, Inspection, Lithography, Semiconducting wafers, Scanners, Sensors, Defect detection, Optical inspection, Wafer-level optics, Image resolution

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Proceedings Article | 24 March 2009 Paper

Study of advanced mask inspection optics with super-resolution method for next-generation mask fabrication

Ryoichi Hirano, Masatoshi Hirono, Riki Ogawa, Nobutaka Kikuiri, Kenichi Takahara, Hideaki Hashimoto, Hiroyuki Shigemura

Proceedings Volume 7272, 72722A (2009) https://doi.org/10.1117/12.814466

KEYWORDS: Photomasks, Inspection, Super resolution, Lithography, Image transmission, Polarization, Optical inspection, 193nm lithography, Defect detection, Image contrast enhancement

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Proceedings Article | 17 October 2008 Paper

The study of EUVL mask defect inspection technology for 32-nm half-pitch node device and beyond

Hiroyuki Shigemura, Tsuyoshi Amano, Yasushi Nishiyama, Osamu Suga, Tsuneo Terasawa, Yukiyasu Arisawa, Hideaki Hashimoto, Norio Kameya, Masaya Takeda, Nobutaka Kikuiri, Ryoichi Hirano, Masatoshi Hirono

Proceedings Volume 7122, 71222F (2008) https://doi.org/10.1117/12.801550

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Reflectivity, Defect inspection, Opacity, Scanning electron microscopy, Defect detection, Optical inspection, Finite-difference time-domain method

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Proceedings Article | 15 May 2007 Paper

Evaluation of defect inspection sensitivity using 199-nm inspection optics

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Hideaki Hashimoto, Shingo Murakami, Nobutaka Kikuiri

Proceedings Volume 6607, 66073F (2007) https://doi.org/10.1117/12.729034

KEYWORDS: Inspection, Opacity, Photomasks, Extreme ultraviolet lithography, Optical inspection, Defect inspection, Reflectivity, Scanning electron microscopy, Deep ultraviolet, Defect detection

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Proceedings Article | 5 April 2007 Paper

Development of advanced mask inspection optics with transmitted and reflected light image acquisition

Ryoichi Hirano, Riki Ogawa, Hitoshi Suzuki, Kenichi Takahara, Yoshitake Tsuji, Shingo Murakami, Nobutaka Kikuiri, Kinya Usuda

Proceedings Volume 6518, 65181U (2007) https://doi.org/10.1117/12.712774

KEYWORDS: Inspection, Photomasks, Image transmission, Image acquisition, Defect detection, Sensors, Lithography, Defect inspection, Optical inspection, 193nm lithography

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Proceedings Article | 20 October 2006 Paper

Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics

Yoshitake Tsuji, Nobutaka Kikuiri, Shingo Murakami, Kenichi Takahara, Ikunao Isomura, Yukio Tamura, Kyoji Yamashita, Ryoichi Hirano, Motonari Tateno, Kenichi Matsumura, Naohisa Takayama, Kinya Usuda

Proceedings Volume 6349, 63493M (2006) https://doi.org/10.1117/12.692811

KEYWORDS: Inspection, Image transmission, Computer aided design, Photomasks, Optical inspection, Image processing, Laser optics, Image enhancement, Image sensors, Point spread functions

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Proceedings Article | 19 May 2006 Paper

Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond

Nobutaka Kikuiri, Shingo Murakami, Hideo Tsuchiya, Motonari Tateno, Kenichi Takahara, Shinichi Imai, Ryoichi Hirano, Ikunao Isomura, Yoshitake Tsuji, Yukio Tamura, Kenichi Matsumura, Kinya Usuda, Masao Otaki, Osamu Suga, Katsumi Ohira

Proceedings Volume 6283, 62830Y (2006) https://doi.org/10.1117/12.683579

KEYWORDS: Inspection, Photomasks, Image transmission, Laser optics, Optical inspection, Lithography, Defect detection, Sensors, Objectives, Image sensors

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Proceedings Article | 28 June 1999 Paper

Development of tilt servo system using 4-axis lens actuator for disk tilt compensation

Y. Motegi, M. Nagasato, Yoriyuki Ishibashi, Hiroshi Someya, Nobutaka Kikuiri

Proceedings Volume 3864, 386407 (1999) https://doi.org/10.1117/12.997618

KEYWORDS: Servomechanisms, Actuators, Control systems, Objectives, Telecommunications, Sensors, Semiconductor lasers, Magnetism, Optical storage, Optical circuits

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Showing 5 of 22 publications

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