Mr. Kenichi Takahara Profile

Kenichi Takahara

Senior Manager at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 28 June 2013 Paper

Improvement of a DUV mask inspection tool to hand over the baton for next-generation tool smoothly

Hideaki Hashimoto, Nobutaka Kikuiri, Eiji Matsumoto, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Manabu Isobe, Kenichi Takahara

Proceedings Volume 8701, 87010V (2013) https://doi.org/10.1117/12.2029363

KEYWORDS: Inspection, Photomasks, Deep ultraviolet, Optical lithography, Extreme ultraviolet, Image sensors, Sensors, Image transmission, Double patterning technology, Lithography

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Proceedings Article | 29 September 2010 Paper

Study of EUV mask inspection technique using DUV light source for hp22nm and beyond

Ryoichi Hirano, Nobutaka Kikuiri, Hideaki Hashimoto, Kenichi Takahara, Masatoshi Hirono, Hiroyuki Shigemura

Proceedings Volume 7823, 782339 (2010) https://doi.org/10.1117/12.866673

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Defect detection, Extreme ultraviolet lithography, Image contrast enhancement, Image enhancement, Lithographic illumination, Image sensors, Light sources

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Proceedings Article | 25 September 2010 Paper

Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction

Masaki Yamabe, Tadao Inoue, Masahiro Shoji, Akio Yamada, Hiromichi Hoshi, Kenichi Takahara

Proceedings Volume 7823, 78230S (2010) https://doi.org/10.1117/12.864196

KEYWORDS: Photomasks, Inspection, Logic, Manufacturing, Vestigial sideband modulation, Image transmission, System integration, Extreme ultraviolet, Diagnostics, Parallel processing

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Proceedings Article | 25 May 2010 Paper

Mask inspection system with variable sensitivity and printability verification function

Takafumi Inoue, Kenichi Takahara, Hideo Tsuchiya, Masakazu Tokita, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7748, 77481G (2010) https://doi.org/10.1117/12.864415

KEYWORDS: Photomasks, Inspection, Defect detection, Semiconducting wafers, Data conversion, Image sensors, Databases, Image transmission, Source mask optimization

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Proceedings Article | 16 April 2010 Paper

Mask data rank and printability verification function of mask inspection system

Kenichi Takahara, Masakazu Tokita, Hideo Tsuchiya, Masaki Yamabe, Nobutaka Kikuiri, Kinya Usuda

Proceedings Volume 7638, 763833 (2010) https://doi.org/10.1117/12.846412

KEYWORDS: Inspection, Photomasks, Defect detection, Databases, Data conversion, Computer simulations, Semiconductors, Source mask optimization, Defect inspection, Optical proximity correction

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Proceedings Article | 2 April 2010 Paper

A novel defect detection optical system using 199-nm light source for EUVL mask

Ryoichi Hirano, Nobutaka Kikuiri, Masatoshi Hirono, Riki Ogawa, Hiroyuki Sigemura, Kenichi Takahara, Hideaki Hashimoto

Proceedings Volume 7638, 76382Z (2010) https://doi.org/10.1117/12.848679

KEYWORDS: Photomasks, Inspection, Defect detection, Image contrast enhancement, Signal detection, Extreme ultraviolet lithography, Extreme ultraviolet, Image enhancement, Lithography, Image sensors

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Proceedings Article | 30 September 2009 Paper

Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics

Nobutaka Kikuiri, Masatoshi Hirono, Ryoichi Hirano, Tsuyoshi Amano, Osamu Suga, Hiroyuki Shigemura, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda

Proceedings Volume 7488, 74882O (2009) https://doi.org/10.1117/12.829747

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, EUV optics, Image contrast enhancement, Laser sources, Optical inspection, Defect detection, Super resolution, Optical alignment

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Proceedings Article | 23 September 2009 Paper

Printability verification function of mask inspection system

Hideo Tsuchiya, Masaki Yamabe, Masakazu Tokita, Kenichi Takahara, Kinya Usuda, Fumio Ozaki, Nobutaka Kikuiri

Proceedings Volume 7488, 74880B (2009) https://doi.org/10.1117/12.829739

KEYWORDS: Inspection, Photomasks, Lithography, Defect detection, Image transmission, Semiconducting wafers, SRAF, Optical inspection, Telecommunications, Sensors

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Proceedings Article | 11 May 2009 Paper

Evaluation of EUVL mask pattern defect inspection using 199nm inspection tool with super-resolution method

Hiroyuki Shigemura, Tsuyoshi Amano, Yasushi Nishiyama, Osamu Suga, Yukiyasu Arisawa, Hideaki Hashimoto, Kenichi Takahara, Kinya Usuda, Nobutaka Kikuiri, Ryoichi Hirano

Proceedings Volume 7379, 73792K (2009) https://doi.org/10.1117/12.824334

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Defect inspection, Reflectivity, Optical inspection, Defect detection, Signal detection, Opacity, Finite-difference time-domain method

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Proceedings Article | 24 March 2009 Paper

Study of advanced mask inspection optics with super-resolution method for next-generation mask fabrication

Ryoichi Hirano, Masatoshi Hirono, Riki Ogawa, Nobutaka Kikuiri, Kenichi Takahara, Hideaki Hashimoto, Hiroyuki Shigemura

Proceedings Volume 7272, 72722A (2009) https://doi.org/10.1117/12.814466

KEYWORDS: Photomasks, Inspection, Super resolution, Lithography, Image transmission, Polarization, Optical inspection, 193nm lithography, Defect detection, Image contrast enhancement

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Proceedings Article | 5 April 2007 Paper

Development of advanced mask inspection optics with transmitted and reflected light image acquisition

Ryoichi Hirano, Riki Ogawa, Hitoshi Suzuki, Kenichi Takahara, Yoshitake Tsuji, Shingo Murakami, Nobutaka Kikuiri, Kinya Usuda

Proceedings Volume 6518, 65181U (2007) https://doi.org/10.1117/12.712774

KEYWORDS: Inspection, Photomasks, Image transmission, Image acquisition, Defect detection, Sensors, Lithography, Defect inspection, Optical inspection, 193nm lithography

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Proceedings Article | 20 October 2006 Paper

Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics

Yoshitake Tsuji, Nobutaka Kikuiri, Shingo Murakami, Kenichi Takahara, Ikunao Isomura, Yukio Tamura, Kyoji Yamashita, Ryoichi Hirano, Motonari Tateno, Kenichi Matsumura, Naohisa Takayama, Kinya Usuda

Proceedings Volume 6349, 63493M (2006) https://doi.org/10.1117/12.692811

KEYWORDS: Inspection, Image transmission, Computer aided design, Photomasks, Optical inspection, Image processing, Laser optics, Image enhancement, Image sensors, Point spread functions

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Proceedings Article | 19 May 2006 Paper

Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond

Nobutaka Kikuiri, Shingo Murakami, Hideo Tsuchiya, Motonari Tateno, Kenichi Takahara, Shinichi Imai, Ryoichi Hirano, Ikunao Isomura, Yoshitake Tsuji, Yukio Tamura, Kenichi Matsumura, Kinya Usuda, Masao Otaki, Osamu Suga, Katsumi Ohira

Proceedings Volume 6283, 62830Y (2006) https://doi.org/10.1117/12.683579

KEYWORDS: Inspection, Photomasks, Image transmission, Laser optics, Optical inspection, Lithography, Defect detection, Sensors, Objectives, Image sensors

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Showing 5 of 13 publications

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