Mr. Riki Ogawa Profile

Riki Ogawa

at Advanced Mask Inspection Technology Inc

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 28 June 2013 Paper

Improvement of a DUV mask inspection tool to hand over the baton for next-generation tool smoothly

Hideaki Hashimoto, Nobutaka Kikuiri, Eiji Matsumoto, Hideo Tsuchiya, Riki Ogawa, Ikunao Isomura, Manabu Isobe, Kenichi Takahara

Proceedings Volume 8701, 87010V (2013) https://doi.org/10.1117/12.2029363

KEYWORDS: Inspection, Photomasks, Deep ultraviolet, Optical lithography, Extreme ultraviolet, Image sensors, Sensors, Image transmission, Double patterning technology, Lithography

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Proceedings Article | 2 April 2010 Paper

A novel defect detection optical system using 199-nm light source for EUVL mask

Ryoichi Hirano, Nobutaka Kikuiri, Masatoshi Hirono, Riki Ogawa, Hiroyuki Sigemura, Kenichi Takahara, Hideaki Hashimoto

Proceedings Volume 7638, 76382Z (2010) https://doi.org/10.1117/12.848679

KEYWORDS: Photomasks, Inspection, Defect detection, Image contrast enhancement, Signal detection, Extreme ultraviolet lithography, Extreme ultraviolet, Image enhancement, Lithography, Image sensors

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Proceedings Article | 24 March 2009 Paper

Study of advanced mask inspection optics with super-resolution method for next-generation mask fabrication

Ryoichi Hirano, Masatoshi Hirono, Riki Ogawa, Nobutaka Kikuiri, Kenichi Takahara, Hideaki Hashimoto, Hiroyuki Shigemura

Proceedings Volume 7272, 72722A (2009) https://doi.org/10.1117/12.814466

KEYWORDS: Photomasks, Inspection, Super resolution, Lithography, Image transmission, Polarization, Optical inspection, 193nm lithography, Defect detection, Image contrast enhancement

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Proceedings Article | 1 November 2007 Paper

Development of a captured image simulator for the differential interference contrast microscopes aiming to design 199 nm mask inspection tools

Masataka Shiratsuchi, Yoshinori Honguh, Ryoichi Hirano, Riki Ogawa, Masatoshi Hirono, Takehiko Nomura

Proceedings Volume 6730, 67304W (2007) https://doi.org/10.1117/12.747909

KEYWORDS: Digital image correlation, Prisms, Inspection, Microscopes, Diffraction, Phase shifting, Photomasks, Phase shifts, Image quality, Polarization

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Proceedings Article | 15 May 2007 Paper

Development of a captured image simulator for 199-nm mask inspection tools

Masataka Shiratsuchi, Yoshinori Honguh, Ryoichi Hirano, Riki Ogawa

Proceedings Volume 6607, 66072J (2007) https://doi.org/10.1117/12.729002

KEYWORDS: Inspection, Diffraction, Photomasks, Chromium, Phase shifting, Glasses, Resolution enhancement technologies, Phase shifts, Optical design, Optical inspection

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Proceedings Article | 5 April 2007 Paper

Development of advanced mask inspection optics with transmitted and reflected light image acquisition

Ryoichi Hirano, Riki Ogawa, Hitoshi Suzuki, Kenichi Takahara, Yoshitake Tsuji, Shingo Murakami, Nobutaka Kikuiri, Kinya Usuda

Proceedings Volume 6518, 65181U (2007) https://doi.org/10.1117/12.712774

KEYWORDS: Inspection, Photomasks, Image transmission, Image acquisition, Defect detection, Sensors, Lithography, Defect inspection, Optical inspection, 193nm lithography

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Proceedings Article | 6 December 2004 Paper

Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance

Toru Tojo, Ryoich Hirano, Hideo Tsuchiya, Junji Oaki, Takeshi Nishizaka, Yasushi Sanada, Kazuto Matsuki, Ikunao Isomura, Riki Ogawa, Noboru Kobayashi, Kazuhiro Nakashima, Shinji Sugihara, Hiromu Inoue, Shinichi Imai, Hitoshi Suzuki, Akihiko Sekine, Makoto Taya, Akemi Miwa, Nobuyuki Yoshioka, Katsumi Ohira, Dong-Hoon Chung, Masao Otaki

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579133

KEYWORDS: Inspection, Photomasks, Sensors, Image sensors, Defect detection, Algorithm development, Speckle, Modulation transfer functions, Image processing, Optical inspection

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Proceedings Article | 20 August 2004 Paper

257-nm wavelength mask inspection for 65-nm node reticles

Ryoji Yoshikawa, Hiroyuki Tanizaki, Tomohide Watanabe, Hiromu Inoue, Riki Ogawa, Satoshi Endo, Masami Ikeda, Yoichiro Takahashi, Hidehiro Watanabe

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557725

KEYWORDS: Inspection, Sensors, Photomasks, Image sensors, Reticles, Light sources, Point spread functions, Image processing, Computer aided design, Phase shifting

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Proceedings Article | 17 December 2003 Paper

Characteristics of an autofocus system on a grating with period smaller than the focus-beam wavelength

Riki Ogawa, Shinji Sugihara, Yoshinori Honguh, Hiroyuki Nagahama, Toshiyuki Watanabe, Hideo Tsuchiya

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517820

KEYWORDS: Polarization, Photomasks, Light, Visible radiation, Error analysis, Data transmission, Inspection, Light sources, Servomechanisms, Deep ultraviolet

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Showing 5 of 9 publications

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