Dr. Christopher J. Progler
Chief Technology Officer at Photronics Inc
SPIE Involvement:
Author
Publications (77)

Proceedings Article | 20 November 2024 Poster + Paper
Proceedings Volume 13216, 132162P (2024) https://doi.org/10.1117/12.3031853
KEYWORDS: Manufacturing, Control systems, Process control, Photomasks, Statistical analysis, Databases, Critical dimension metrology, Advanced process control, Failure analysis, Visualization

Proceedings Article | 20 November 2024 Poster + Paper
Mohamed Ramadan, Young Ham, Juergen Preuninger, Hans-Jurgen Stock, Jirka Schatz, Heath Wheeler, Chris Progler
Proceedings Volume 13216, 1321629 (2024) https://doi.org/10.1117/12.3034705
KEYWORDS: Point spread functions, Monte Carlo methods, Data modeling, Mathematical optimization, Electron beams, Critical dimension metrology, Optical simulations, Manufacturing, Extreme ultraviolet, Error analysis

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13216, 132160C (2024) https://doi.org/10.1117/12.3037087
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Etching, Semiconducting wafers, Electron beam lithography, Optical lithography, Manufacturing, Photoresist processing, Photomask technology

Proceedings Article | 12 November 2024 Presentation + Paper
Mohamed Ramadan, Chris Progler, Henry Kamberian, Jinju Beineke, Michael Green, Guangming Xiao, Ming-Feng Shen, Kai-Hsiang Chang, Kyle Braam, Alex Zepka, Yu-Po Tang, Szu Ping Chen, Eric Huang, Gloria Yeh, Nicole Wu, Chun-Cheng Liao
Proceedings Volume 13216, 132161Q (2024) https://doi.org/10.1117/12.3042434
KEYWORDS: Semiconducting wafers, Printing, Vestigial sideband modulation, Photoresist processing, Simulations, Design rules, Chip manufacturing, SRAF, Optical proximity correction, Lithography

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12956, PC1295607 (2024) https://doi.org/10.1117/12.3012272
KEYWORDS: Metrology, Industrial applications, Virtual reality, Systems modeling, Photomasks, Modeling, Mask making, Manufacturing, Lithography, Industry

Proceedings Article | 21 November 2023 Presentation + Paper
Michael Green, Scott Halle, Mohamed Ramadan, Romain Lallement, Henry Kamberian, Martin Burkhardt, Jinju Beineke, Jed Rankin, Chris Progler, Steven McDermott
Proceedings Volume 12751, 127510M (2023) https://doi.org/10.1117/12.2689665
KEYWORDS: SRAF, Extreme ultraviolet, Optical lithography, Resolution enhancement technologies, Opacity, Extreme ultraviolet lithography, Optical proximity correction, Line edge roughness, Semiconducting wafers, Printing

Proceedings Article | 21 November 2023 Presentation + Paper
Mohamed Ramadan, Christopher Progler, Michael Green, Henry Kamberian, Jinju Beineke
Proceedings Volume 12751, 127510I (2023) https://doi.org/10.1117/12.2688168
KEYWORDS: Data modeling, Photomasks, Biomedical applications, Internet of things, Industrial applications, Product engineering, Optical lithography, Medical devices, Manufacturing, Laser applications

Proceedings Article | 1 December 2022 Poster + Paper
Young Ham, Tooru Suzuki, Akira Uchida, Kei Kurebayashi, Freeman Sung, Robert Bendernagel, Myung Yong Kim, Chris Progler
Proceedings Volume 12293, 122930S (2022) https://doi.org/10.1117/12.2644329
KEYWORDS: Photomasks, Lithography, Manufacturing, Glasses, Transmittance, Quartz, Inspection, Fused quartz, Optical lithography, Optics manufacturing

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC1205102 (2022) https://doi.org/10.1117/12.2615103
KEYWORDS: Photomasks, Semiconducting wafers, Printing, Manufacturing, Mask making, Resolution enhancement technologies, Lithography, Image processing, Extreme ultraviolet

Proceedings Article | 23 August 2021 Paper
Mohamed Ramadan, Brian Dillon, Michael Green, Chris Progler, Young Ham, Ahmad Syukri
Proceedings Volume 11908, 1190804 (2021) https://doi.org/10.1117/12.2601855
KEYWORDS: Process modeling, Photomasks, Extreme ultraviolet, Model-based design, Extreme ultraviolet lithography, Deep ultraviolet, Photoresist processing, Modeling, Logic, Lithography

Proceedings Article | 20 October 2020 Presentation + Paper
Michael Green, Tsu-Wen Huang, Mohamed Ramadan, Hung-Chang Szu, Yeu Dong Gau, Chih-Ying Tsai, Young Ham, Chun-Cheng Liao, Lucien Bouchard, Eric Huang, Wei-Cheng Shiu, Chris Progler
Proceedings Volume 11518, 115180N (2020) https://doi.org/10.1117/12.2574713
KEYWORDS: Photomasks, Optical lithography, Semiconducting wafers, Lithography, Optical proximity correction, Immersion lithography, 193nm lithography, Critical dimension metrology

Proceedings Article | 23 March 2020 Presentation + Paper
Michael Green, Romain Lallement, Mohamed Ramadan, Derren Dunn, Henry Kamberian, Stuart Sieg, Young Ham, Chris Progler
Proceedings Volume 11323, 113230Q (2020) https://doi.org/10.1117/12.2560545
KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Line edge roughness, Stochastic processes, Optical proximity correction, SRAF, Metals, Lithography

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11148, 111481H (2019) https://doi.org/10.1117/12.2537935
KEYWORDS: Lithography, Photomasks, Process modeling, Optical proximity correction, Semiconducting wafers, Machine learning, Resolution enhancement technologies, Source mask optimization, Critical dimension metrology, Computer simulations

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109570L (2019) https://doi.org/10.1117/12.2515071
KEYWORDS: Photomasks, Semiconducting wafers, Image processing, Extreme ultraviolet lithography, Electron beam lithography, Stochastic processes, Inspection, Line edge roughness, Extreme ultraviolet, Optical proximity correction

Proceedings Article | 3 October 2018 Paper
Yohan Choi, William Chou, Jeffrey Cheng, C. H. Twu, Adder Lee, Chih Hsuan Chao, Hsin Fu Chou, Sweet Chen, James Cheng, Colbert Lu, Josh Tzeng, Jackie Cheng, Hong Jen Lee, Michael Green, Mohamed Ramadan, Young Ham, Chris Progler
Proceedings Volume 10810, 108101K (2018) https://doi.org/10.1117/12.2501427
KEYWORDS: Optical proximity correction, Photomasks, Lithography

Proceedings Article | 16 October 2017 Presentation + Paper
Proceedings Volume 10450, 1045005 (2017) https://doi.org/10.1117/12.2281132
KEYWORDS: Photomasks, SRAF, Extreme ultraviolet, Manufacturing, Optical proximity correction, Extreme ultraviolet lithography, Metals, Inspection, Scanning electron microscopy, Metrology

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 96350T (2015) https://doi.org/10.1117/12.2199273
KEYWORDS: Photomasks, Data modeling, Calibration, Process modeling, Metrology, Critical dimension metrology, Mask making, Data processing, Photoresist processing, Optical proximity correction

SPIE Journal Paper | 25 June 2013 Open Access
JM3, Vol. 12, Issue 02, 021001, (June 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.021001
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Process modeling, Instrument modeling, Reflectivity, Defect inspection, Inspection, Mask making, Printing

SPIE Journal Paper | 1 July 2011
JM3, Vol. 10, Issue 03, 033021, (July 2011) https://doi.org/10.1117/12.10.1117/1.3633246
KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet lithography, Manufacturing, Lithography, Inspection, Extreme ultraviolet, Data modeling

Proceedings Article | 3 April 2010 Paper
Proceedings Volume 7641, 76410A (2010) https://doi.org/10.1117/12.848350
KEYWORDS: Metals, Double patterning technology, Photomasks, Etching, Optical lithography, Semiconducting wafers, Lithography, Scanning electron microscopy, Optical proximity correction, Fiber optic illuminators

Proceedings Article | 11 December 2009 Paper
Proceedings Volume 7520, 752017 (2009) https://doi.org/10.1117/12.838246
KEYWORDS: Photomasks, Lithography, SRAF, Quartz, Optical proximity correction, Etching, Critical dimension metrology, Manufacturing, Phase shifts, Lithographic illumination

Proceedings Article | 16 March 2009 Paper
Christopher Progler, Bhaskar Banerjee, M. Haniff, T. Mahzabeen
Proceedings Volume 7275, 72750G (2009) https://doi.org/10.1117/12.816509
KEYWORDS: Lithography, Analog electronics, Transistors, Photomasks, Critical dimension metrology, Oscillators, Mirrors, Error analysis, Manufacturing, Complex systems

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67301T (2007) https://doi.org/10.1117/12.747039
KEYWORDS: Diffraction, Polarization, Photomasks, Monochromatic aberrations, Binary data, Birefringence, Electromagnetism, Chromium, Commercial off the shelf technology, Reticles

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65202D (2007) https://doi.org/10.1117/12.712368
KEYWORDS: Reticles, Resolution enhancement technologies, Image transmission, Nano opto mechanical systems, Semiconducting wafers, Image processing, 193nm lithography, Etching, Lithography, Databases

Proceedings Article | 21 March 2006 Paper
Proceedings Volume 6154, 615411 (2006) https://doi.org/10.1117/12.659353
KEYWORDS: Photomasks, Polarization, Etching, Plasma etching, Manufacturing, Plasma, Semiconducting wafers, Chromium, Lithography, Chlorine

Proceedings Article | 20 March 2006 Paper
Proceedings Volume 6154, 615402 (2006) https://doi.org/10.1117/12.663291
KEYWORDS: Photomasks, Resolution enhancement technologies, Scattering, Lithography, Optical proximity correction, Semiconducting wafers, Diffractive optical elements, Lithographic illumination, Phase shifts, Optical components

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61541G (2006) https://doi.org/10.1117/12.659487
KEYWORDS: SRAF, Polarization, Photomasks, Data modeling, Optical proximity correction, Refractive index, Manufacturing, System on a chip, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61541D (2006) https://doi.org/10.1117/12.659390
KEYWORDS: Photomasks, Polarization, Etching, Plasma etching, Manufacturing, Plasma, Semiconducting wafers, Chromium, Lithography, Chlorine

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 615413 (2006) https://doi.org/10.1117/12.659238
KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Lithography, Chromium, Polarization, Image processing, SRAF, Resolution enhancement technologies

Proceedings Article | 9 November 2005 Paper
Proceedings Volume 5992, 59920J (2005) https://doi.org/10.1117/12.632214
KEYWORDS: Etching, Photomasks, Reticles, Manufacturing, Wet etching, Silica, Lithography, Resolution enhancement technologies, Scattering, Chromium

Proceedings Article | 9 November 2005 Paper
Proceedings Volume 5992, 59920D (2005) https://doi.org/10.1117/12.633180
KEYWORDS: Photomasks, Manufacturing, Resolution enhancement technologies, Data modeling, Model-based design, Databases, Inspection, Optical proximity correction, Semiconducting wafers, Design for manufacturing

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 599235 (2005) https://doi.org/10.1117/12.633200
KEYWORDS: Photomasks, Inspection, Manufacturing, Optical proximity correction, Lithography, Semiconducting wafers, Imaging systems, Metrology, Resolution enhancement technologies, Binary data

Proceedings Article | 5 November 2005 Paper
Bernd Geh, Donis Flagello, Chris Progler, Patrick Martin, Leonardus Leunissen, Steve Hansen, Wim de Boeij
Proceedings Volume 5992, 599210 (2005) https://doi.org/10.1117/12.637483
KEYWORDS: Birefringence, Photomasks, Polarization, Critical dimension metrology, Pellicles, Reticles, Silica, Semiconducting wafers, Lithography, Optical lithography


Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617146
KEYWORDS: Molybdenum, Source mask optimization, Computed tomography, Photomasks, Resolution enhancement technologies, Design for manufacturing, Optical proximity correction, Error analysis, Statistical analysis, Lithography

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617366
KEYWORDS: Resolution enhancement technologies, Photomasks, Optical proximity correction, Lithography, Manufacturing, Computer simulations, Semiconducting wafers, Inspection, Data modeling, Optical lithography

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601011
KEYWORDS: Photomasks, Manufacturing, Etching, Plasma etching, Lithography, Chromium, Phase shifts, Reticles, Semiconducting wafers, Sputter deposition

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601770
KEYWORDS: Photomasks, Optimization (mathematics), Logic, Lithography, Phase shifts, Critical dimension metrology, Prototyping, Lithographic illumination, Algorithm development, Manufacturing

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601584
KEYWORDS: Photomasks, Image processing, Manufacturing, Image transmission, Lithography, Photoresist materials, Nanoimprint lithography, Image resolution, Semiconductors, 193nm lithography

Proceedings Article | 12 May 2005 Paper
Y. Kim, H. Kang, Yuan Zhang, Chuong Tran, Nigel Farrar, Jennifer Qin, Barry Rockwell, H. Cho, Rand Cottle, David Chan, Pat Martin, S. Choi, Chris Progler
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598913
KEYWORDS: Photomasks, Air contamination, Pellicles, Laser irradiation, Ions, Pulsed laser operation, Chromium, Chromatography, Inspection, Laser scanners

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.593219
KEYWORDS: Manufacturing, Photomasks, Electroluminescence, Etching, Critical dimension metrology, Lithography, Standards development, Phase shifts, Scanning electron microscopy, Optics manufacturing

Proceedings Article | 12 May 2005 Paper
Jan Kuijten, Arjan Verhappen, Will Conley, Stephan van de Goor, Lloyd Litt, Wei Wu, Kevin Lucas, Bernie Roman, Bryan Kasprowicz, Chris Progler, Robert Socha, Doug van den Broeke, Kurt Wampler, Tom Laidig, Stephen Hsu
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.605481
KEYWORDS: Chromium, Photomasks, Nanoimprint lithography, Phase shifts, Resolution enhancement technologies, Optical proximity correction, Mask making, Semiconductors, Photoresist materials, Manufacturing

Proceedings Article | 5 May 2005 Paper
Young Mog Ham, Brian Dillon, Chris Progler, Kory Goldammer, Zhiziang Jin, Gary Green, R. Scott Mackay, Hitendra Divecha, Victor Boksha, Pat Martin, Mitch Heins, Yuan Zhang, Kurt Davis, Rafik Marutyan, Karen Martirosyan, Sergei Bakarian
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600730
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Critical dimension metrology, Manufacturing, Resolution enhancement technologies, Electron beam lithography, Mask making, Design for manufacturing

Proceedings Article | 5 May 2005 Paper
Amir Borna, Chris Progler, David Blaauw
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.604606
KEYWORDS: Critical dimension metrology, Transistors, Lithography, Optical proximity correction, Device simulation, Silicon, Image processing, Cadmium, Photomasks, Computer aided design

Proceedings Article | 5 May 2005 Paper
Yuan Zhang, Rick Gray, Seurien Chou, Barry Rockwell, Guangming Xiao, Henry Kamberian, Rand Cottle, Alex Wolleben, Chris Progler
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.598884
KEYWORDS: Data modeling, Optical proximity correction, Photomasks, Computed tomography, Manufacturing, Statistical analysis, Statistical modeling, Resolution enhancement technologies, Error analysis, Inspection

Proceedings Article | 5 May 2005 Paper
James Hogan, Christopher Progler, Ahmad Chatila, Bert Bruggeman, Mitchell Heins, Robert Pack, Victor Boksha
Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.603077
KEYWORDS: Design for manufacturing, Manufacturing, Photomasks, Computer aided design, Electronic design automation, Lithography, Optical lithography, Semiconducting wafers, Silicon, Semiconductors

Proceedings Article | 27 January 2005 Paper
Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.570482
KEYWORDS: Photomasks, Manufacturing, Lithography, Chromium, Binary data, Quartz, Semiconductors, Phase shifts, SRAF, Etching

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557755
KEYWORDS: Photomasks, Reticles, Manufacturing, Inspection, Lithography, Image processing, Semiconducting wafers, Quartz, Metrology, Optical lithography

Proceedings Article | 20 August 2004 Paper
Willard Conley, Douglas Van Den Broeke, Robert Socha, Wei Wu, Lloyd Litt, Kevin Lucas, Bernard Roman, Richard Peters, Colita Parker, J. Fung Chen, Kurt Wampler, Thomas Laidig, Erika Schaefer, Jan-Pieter Kuijten, Arjan Verhappen, Stephan van de Goor, Martin Chaplin, Bryan Kasprowicz, Christopher Progler, Emilien Robert, Philippe Thony, Michael Hathorn
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557802
KEYWORDS: Photomasks, Optical proximity correction, Image processing, Reticles, Resolution enhancement technologies, Phase shifts, Mask making, Scanning electron microscopy, Quartz, Binary data

Proceedings Article | 28 May 2004 Paper
Will Conley, Douglas Van Den Broeke, Robert Socha, Wei Wu, Lloyd Litt, Kevin Lucas, Bernard Roman, Richard Peters, Colita Parker, Fung Chen, Kurt Wampler, Thomas Laidig, Erika Schaefer, Jan-Pieter Kuijten, Arjan Verhappen, Stephan van de Goor, Martin Chaplin, Bryan Kasprowicz, Christopher Progler, Emilien Robert, Philippe Thony
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537613
KEYWORDS: Photomasks, Optical proximity correction, Reticles, Image processing, Resolution enhancement technologies, Phase shifts, Mask making, Scanning electron microscopy, Manufacturing, Quartz

Proceedings Article | 28 May 2004 Paper
Lloyd Litt, Wei Wu, Will Conley, Kevin Lucas, Bernard Roman, Patrick Montgomery, Bryan Kasprowicz, Christopher Progler, Robert Socha, Arjan Verhappen, Kurt Wampler, Erika Schaefer, Pat Cook, Jan-Pieter Kuijten, Wil Pijnenburg
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537437
KEYWORDS: Fiber optic illuminators, Atrial fibrillation, Critical dimension metrology, Resolution enhancement technologies, Photomasks, Semiconducting wafers, Manufacturing, Reticles, Nanoimprint lithography, Binary data

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537619
KEYWORDS: Photomasks, Resolution enhancement technologies, Reticles, Manufacturing, Scanning electron microscopy, Semiconductors, Phase shifts, Binary data, Lithography, Semiconducting wafers

Proceedings Article | 3 May 2004 Paper
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.537259
KEYWORDS: Lithography, Critical dimension metrology, Monte Carlo methods, Error analysis, Optical proximity correction, Photomasks, Statistical analysis, Tolerancing, Manufacturing, Device simulation

Proceedings Article | 17 December 2003 Paper
Martin Bohn, Ulrich Hofmann, Wolfgang Hoppe, Christopher Progler, Michael Ryzhoukhin
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.520812
KEYWORDS: Optical proximity correction, Electron beam lithography, Monte Carlo methods, Photomasks, Mathematical modeling, Mask making, Lithography, Computer simulations, Optical lithography, Algorithm development

Proceedings Article | 2 July 2003 Paper
Dipankar Pramanik, Henry Kamberian, Christopher Progler, Michael Sanie, David Pinto
Proceedings Volume 5043, (2003) https://doi.org/10.1117/12.485280
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Reticles, Optical proximity correction, Manufacturing, Dysprosium, Inspection, Critical dimension metrology, Defect inspection

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485498
KEYWORDS: Reticles, Optical lithography, Optical proximity correction, Lithography, 193nm lithography, Scanners, Logic, Optical design, Lithographic illumination, SRAF

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485439
KEYWORDS: Photomasks, Resolution enhancement technologies, Error analysis, Lithography, Monte Carlo methods, Tolerancing, Calibration, Data modeling, Edge roughness, Critical dimension metrology

Proceedings Article | 26 June 2003 Paper
Will Conley, Douglas Van Den Broeke, Robert Socha, Wei Wu, Lloyd Litt, Kevin Lucas, Carla Nelson-Thomas, Bernard Roman, J. Fung Chen, Kurt Wampler, Thomas Laidig, Stephen Hsu, Erika Schaefer, Shawn Cassel, Linda Yu, Bryan Kasprowicz, Christopher Progler, John Petersen, David Gerold, Mark John Maslow
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485515
KEYWORDS: Photomasks, Reticles, Optical proximity correction, Image processing, Resolution enhancement technologies, Manufacturing, Phase shifts, Mask making, Quartz, Lithography

SPIE Journal Paper | 1 April 2003
JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1562929
KEYWORDS: Chromatic aberrations, Image enhancement, Lithography, Excimer lasers, Image processing, Electroluminescence, Optical simulations, Lithographic illumination, Monochromatic aberrations, Deep ultraviolet

Proceedings Article | 15 January 2003 Paper
Peter Rhyins, Christopher Progler, Glenn Claydon, Ernest Balch
Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478283
KEYWORDS: Photomasks, Semiconducting wafers, Computer aided design, Critical dimension metrology, Binary data, Photoresist processing, Calibration, Microelectromechanical systems, Photonic devices, Deep ultraviolet

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468107
KEYWORDS: Photomasks, Lithography, Quartz, Etching, Manufacturing, Reticles, Inspection, Antireflective coatings, Optical proximity correction, Binary data

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474583
KEYWORDS: Monte Carlo methods, Critical dimension metrology, Photomasks, Wavefronts, Monochromatic aberrations, Mathematical modeling, Phase shifts, Spatial frequencies, Diffraction, Data modeling

Proceedings Article | 30 July 2002 Paper
Michael Fritze, Brian Tyrrell, Susan Cann, Chris Carney, Betty Blachowicz, David Brzozowy, Thomas Kocab, Scott Bowdoin, Peter Rhyins, Christopher Progler, Patrick Martin
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474592
KEYWORDS: Image processing, Photomasks, Phase shifts, Lithography, Etching, Quartz, Coherence (optics), Mask making, Photoresist processing, Metrology

Proceedings Article | 14 September 2001 Paper
Christopher Ausschnitt, Christopher Progler, William Chu
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435729
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Lithography, Control systems, Metrology, Modulation, Photomasks, Chlorine, Feedback control, Scanning electron microscopy

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435712
KEYWORDS: Light scattering, Scattering, Spatial frequencies, Projection systems, Imaging systems, Scanners, Image quality, Fractal analysis, Opacity, Point spread functions

Proceedings Article | 14 September 2001 Paper
Allen Gabor, Timothy Brunner, Jia Chen, Norman Chen, Sadanand Deshpande, Richard Ferguson, David Horak, Steven Holmes, Lars Liebmann, Scott Mansfield, Antoinette Molless, Christopher Progler, Paul Rabidoux, Deborah Ryan, Peter Talvi, Len Tsou, Ben Vampatella, Alfred Wong, Qingyun Yang, Chienfan Yu
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435708
KEYWORDS: Reticles, Semiconducting wafers, Binary data, Lithography, Scanning electron microscopy, Critical dimension metrology, Scanners, Photomasks, Logic, Etching

Proceedings Article | 26 April 2001 Paper
Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425236
KEYWORDS: Manufacturing, Semiconducting wafers, Lithography, Data modeling, Optical proximity correction, Reticles, Photomasks, Reverse modeling, Process modeling, Error analysis

Proceedings Article | 5 July 2000 Paper
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389020
KEYWORDS: Reticles, Critical dimension metrology, Semiconducting wafers, Capacitors, Photomasks, Image processing, Monochromatic aberrations, Lithography, Semiconductors, Integrated circuits

Proceedings Article | 5 July 2000 Paper
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389042
KEYWORDS: Wavefronts, Lithography, Error analysis, Spatial frequencies, Tolerancing, Critical dimension metrology, Zernike polynomials, Interferometry, Reticles, Wavefront aberrations

Proceedings Article | 26 July 1999 Paper
Joseph Kirk, Christopher Progler
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354375
KEYWORDS: Monochromatic aberrations, Reticles, Semiconducting wafers, Photoresist materials, Image processing, Diffraction gratings, Diffraction, Wavefronts, Absorption, Modulation

Proceedings Article | 26 July 1999 Paper
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354331
KEYWORDS: Overlay metrology, Error analysis, Instrument modeling, Critical dimension metrology, Semiconducting wafers, Reticles, Lithography, Wavefronts, Optical alignment, Distortion

Proceedings Article | 29 June 1998 Paper
Joseph Kirk, Christopher Progler
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310757
KEYWORDS: Photoresist materials, Lithographic illumination, Photomasks, Lithography, Critical dimension metrology, Semiconducting wafers, Optical lithography, Optical proximity correction, Image resolution, Opacity

Proceedings Article | 29 June 1998 Paper
Christopher Progler, Donald Wheeler
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310755
KEYWORDS: Wavefronts, Lithography, Wavefront aberrations, Distortion, Reverse engineering, Monte Carlo methods, Error analysis, Monochromatic aberrations, Diffraction, Reticles

Proceedings Article | 7 July 1997 Paper
Christopher Progler, Hong Du, Greg Wells
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275986
KEYWORDS: Critical dimension metrology, Control systems, Lithography, Projection systems, Reticles, Photoresist materials, Stray light

Proceedings Article | 7 July 1997 Paper
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275979
KEYWORDS: Reflectivity, Photoresist materials, Optical lithography, Critical dimension metrology, Numerical simulations, Projection systems, Printing, Electromagnetic simulation, Scanning electron microscopy, Deep ultraviolet

Proceedings Article | 7 June 1996 Paper
William Krisa, Christopher Progler, Ken Brennan, J. Schell
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240905
KEYWORDS: Etching, Deep ultraviolet, Photoresist processing, Tin, Interfaces, Metals, Reflectivity, Manufacturing, Semiconducting wafers, Critical dimension metrology

Proceedings Article | 22 September 1995 Paper
Edward Charrier, Christopher Progler, Chris Mack
Proceedings Volume 2635, (1995) https://doi.org/10.1117/12.221434
KEYWORDS: Critical dimension metrology, Computer simulations, Lithography, Photomasks, Cadmium, Semiconducting wafers, Photoresist processing, Metrology, Error analysis, Temperature metrology

Showing 5 of 77 publications
Proceedings Volume Editor (3)

SPIE Conference Volume | 27 January 2005

SPIE Conference Volume | 14 September 2001

SPIE Conference Volume | 5 July 2000

Conference Committee Involvement (21)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
SPIE Advanced Lithography
21 February 2010 | San Jose, United States
SPIE Lithography Asia - Taiwan
18 November 2009 | Taipei, Taiwan
SPIE Advanced Lithography
22 February 2009 | San Jose, United States
SPIE Lithography Asia - Taiwan
4 November 2008 | Taipei, Taiwan
SPIE Advanced Lithography
24 February 2008 | San Jose, United States
Advanced Microlithography Technology
12 November 2007 | Beijing, China
SPIE Advanced Lithography
25 February 2007 | San Jose, United States
Design and Process Integration for Microelectronic Manufacturing IV
23 February 2006 | San Jose, California, United States
Design and Process Integration for Microelectronic Manufacturing IV
3 March 2005 | San Jose, California, United States
Advanced Microlithography Technologies
8 November 2004 | Beijing, China
Design and Process Integration for Microelectronic Manufacturing III
26 February 2004 | Santa Clara, California, United States
Advanced Microelectronic Manufacturing
27 February 2003 | Santa Clara, United States
Optical Microlithography XVI
25 February 2003 | Santa Clara, California, United States
Design, Process Integration, and Characterization for Microelectronics
7 March 2002 | Santa Clara, United States
Optical Microlithography XIV
27 February 2001 | Santa Clara, CA, United States
Optical Microlithography XIII
1 March 2000 | Santa Clara, CA, United States
Showing 5 of 21 Conference Committees
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