Yumi Nakajima
at Toshiba Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79691L (2011) https://doi.org/10.1117/12.879333
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Reactive ion etching, Extreme ultraviolet, Lithography, Lithographic illumination, Semiconducting wafers, Yield improvement, Semiconductors, Photoresist processing

SPIE Journal Paper | 1 January 2011
JM3, Vol. 10, Issue 1, 013005, (January 2011) https://doi.org/10.1117/12.10.1117/1.3533231
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Extreme ultraviolet, Manufacturing, Semiconducting wafers, Diffraction, Critical dimension metrology, Optical lithography, Lithographic illumination

Proceedings Article | 27 May 2010 Paper
Proceedings Volume 7748, 774824 (2010) https://doi.org/10.1117/12.868924
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Lithography, Manufacturing, Diffraction, Semiconducting wafers, Critical dimension metrology, Optical lithography, Lithographic illumination, Extreme ultraviolet

SPIE Journal Paper | 1 April 2010
JM3, Vol. 9, Issue 02, 023009, (April 2010) https://doi.org/10.1117/12.10.1117/1.3421948
KEYWORDS: Diffraction, Tolerancing, Critical dimension metrology, Design for manufacturability, Manufacturing, Error analysis, Extreme ultraviolet lithography, Polarization, Extreme ultraviolet, Lithography

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 76361O (2010) https://doi.org/10.1117/12.846265
KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Manufacturing, Lithography, Etching, Extreme ultraviolet, Photoresist processing, Reactive ion etching, Silica, Metals

SPIE Journal Paper | 1 October 2009
JM3, Vol. 8, Issue 04, 041508, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238542
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Point spread functions, Semiconducting wafers, Lithography, Photoresist processing, Semiconductors, Projection systems, Tungsten

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790P (2009) https://doi.org/10.1117/12.824266
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Diffraction, Extreme ultraviolet, Lithographic illumination, Polarization, Manufacturing, Tolerancing, Lithography, Critical dimension metrology

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727120 (2009) https://doi.org/10.1117/12.813484
KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet lithography, Point spread functions, Semiconducting wafers, Logic, Lithography, Electronic design automation, Projection systems, Mask making

Proceedings Article | 20 March 2008 Paper
Proceedings Volume 6921, 69211A (2008) https://doi.org/10.1117/12.771602
KEYWORDS: Tolerancing, Diffraction, Extreme ultraviolet lithography, Error analysis, Lithography, Phase shifts, Polarization, Manufacturing, Photomasks, Extreme ultraviolet

Showing 5 of 9 publications
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