Mr. Shunko Magoshi Profile

Shunko Magoshi

at KIOXIA Corp

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 23 August 2021 Paper

Paper

Self-aligned double patterning process for sub-15nm nanoimprint template fabrication

Yoshinori Kagawa, Machiko Suenaga, Hikaru Sasaki, Koji Murano, Shunko Magoshi, Ryu Komatsu, Kosuke Takai, Mitsuru Kondo, Hideaki Sakurai, Shingo Kanamitsu

Proceedings Volume 11908, 119080D (2021) https://doi.org/10.1117/12.2603907

KEYWORDS: Forward error correction, Critical dimension metrology, Nanoimprint lithography, Double patterning technology, Lithography, Scanning electron microscopy, Nanolithography, Image processing, Semiconducting wafers, Etching

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Proceedings Article | 26 March 2019 Presentation + Paper

Presentation + Paper

Mask 3D effect reduction and defect printability of etched multilayer EUV mask

Takashi Kamo, Takeshi Yamane, Yasutaka Morikawa, Susumu Iida, Takayuki Uchiyama, Shunko Magoshi, Satoshi Tanaka

Proceedings Volume 10957, 109571C (2019) https://doi.org/10.1117/12.2515273

KEYWORDS: Photomasks, Extreme ultraviolet, Tantalum, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Lithographic illumination, Line width roughness, Line edge roughness

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Proceedings Article | 18 March 2016 Paper

Paper

Current development status of HSFET (High NA Small Field Exposure Tool) in EIDEC

Satoshi Tanaka, Shunko Magoshi, Hidemi Kawai, Soichi Inoue, Wylie Rosenthal, Luc Girard, Lou Marchetti, Bob Kestner, John Kincade

Proceedings Volume 9776, 97761N (2016) https://doi.org/10.1117/12.2219368

KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Process control, Photomasks, Lithography, Optical design, Projection systems, Polarization, Mirrors, Reticles, Semiconducting wafers

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Proceedings Article | 8 April 2011 Paper

Paper

Manufacturability of 2x-nm devices with EUV tool

Kazuo Tawarayama, Yumi Nakajima, Suigen Kyoh, Hajime Aoyama, Kentaro Matsunaga, Shunko Magoshi, Satoshi Tanaka, Yumi Hayashi, Ichiro Mori

Proceedings Volume 7969, 79691L (2011) https://doi.org/10.1117/12.879333

KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Reactive ion etching, Extreme ultraviolet, Lithography, Lithographic illumination, Semiconducting wafers, Yield improvement, Semiconductors, Photoresist processing

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Proceedings Article | 5 April 2011 Paper

Paper

Resolution capability of SFET with slit and dipole illumination

Yuusuke Tanaka, Kentaro Matsunaga, Shunko Magoshi, Seiichiro Shirai, Kazuo Tawarayama, Hiroyuki Tanaka

Proceedings Volume 7969, 79690Q (2011) https://doi.org/10.1117/12.870332

KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Photomasks, Extreme ultraviolet, Wafer-level optics, Modulation, Control systems, Projection systems, Lithography

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Proceedings Article | 23 March 2010 Paper

Paper

Fabrication of 35nm via-hole patterns for interconnect test chips with EUV lithography

Yuusuke Tanaka, Hajime Aoyama, Kazuo Tawarayama, Shunko Magoshi, Daisuke Kawamura, Kentaro Matsunaga, Takashi Kamo, Yukiyasu Arisawa, Taiga Uno, Hiroyuki Tanaka, Naofumi Nakamura, Eiichi Soda, Noriaki Oda, Shuichi Saito, Ichiro Mori

Proceedings Volume 7636, 76362D (2010) https://doi.org/10.1117/12.846315

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Metals, Extreme ultraviolet, Semiconducting wafers, Critical dimension metrology, Semiconductors, Anisotropy, Error analysis

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Proceedings Article | 23 March 2010 Paper

Paper

Process liability evaluation for beyond 22nm node using EUVL

Kazuo Tawarayama, Hajime Aoyama, Kentaro Matsunaga, Yukiyasu Arisawa, Taiga Uno, Shunko Magoshi, Suigen Kyoh, Yumi Nakajima, Ryoichi Inanami, Satoshi Tanaka, Ayumi Kobiki, Yukiko Kikuchi, Daisuke Kawamura, Kosuke Takai, Koji Murano, Yumi Hayashi, Ichiro Mori

Proceedings Volume 7636, 76361O (2010) https://doi.org/10.1117/12.846265

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Manufacturing, Lithography, Etching, Extreme ultraviolet, Photoresist processing, Reactive ion etching, Silica, Metals

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SPIE Journal Paper | 1 October 2009

Recent progress in developing an extreme ultraviolet full-field exposure tool at Selete

Kazuo Tawarayama, Hajime Aoyama, Shunko Magoshi, Yuusuke Tanaka, Seiichiro Shirai, Hiroyuki Tanaka

JM3, Vol. 8, Issue 04, 041510, (October 2009) https://doi.org/10.1117/12.10.1117/1.3275786

KEYWORDS: Semiconducting wafers, Optical alignment, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Photoresist processing, Photomasks, Overlay metrology, Image processing, Semiconductors

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Proceedings Article | 18 March 2009 Paper

Paper

Performance evaluation of source collector module for extreme ultraviolet small-field exposure tool

Shunko Magoshi, Seiichiro Shirai, Hideto Mori, Kazuo Tawarayama, Yuusuke Tanaka, Hiroyuki Tanaka

Proceedings Volume 7271, 727135 (2009) https://doi.org/10.1117/12.814004

KEYWORDS: Electrodes, Plasma, Extreme ultraviolet, Semiconducting wafers, Mirrors, Extreme ultraviolet lithography, EUV optics, Optical alignment, Charge-coupled devices, Visible radiation

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Proceedings Article | 18 March 2009 Paper

Paper

Fabrication of half-pitch 32-45-nm SRAM patterns with EUVL

Yuusuke Tanaka, Hajime Aoyama, Shunko Magoshi, Kazuo Tawarayama, Seiichiro Shirai, Hiroyuki Tanaka

Proceedings Volume 7271, 72713S (2009) https://doi.org/10.1117/12.813492

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Lithography, Optical proximity correction, Metals, Semiconducting wafers, Optical lithography, Photography, Scanners

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Proceedings Article | 18 March 2009 Paper

Paper

Recent progress of EUV full-field exposure tool in Selete

Kazuo Tawarayama, Hajime Aoyama, Shunko Magoshi, Yuusuke Tanaka, Seiichiro Shirai, Hiroyuki Tanaka

Proceedings Volume 7271, 727118 (2009) https://doi.org/10.1117/12.813627

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Optical alignment, Lithography, Overlay metrology, Semiconductors, Manufacturing, Extreme ultraviolet, Metals, Image processing

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Proceedings Article | 21 March 2008 Paper

Paper

Effects of aberration and flare on lithographic performance of SFET

Yuusuke Tanaka, Hajime Aoyama, Kazuo Tawarayama, Shunko Magoshi, Seiichiro Shirai, Hiroyuki Tanaka

Proceedings Volume 6921, 69211D (2008) https://doi.org/10.1117/12.771626

KEYWORDS: Point spread functions, Lithography, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Projection systems, Line width roughness, Mirrors, Surface roughness, Optical testing

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Proceedings Article | 21 March 2008 Paper

Paper

Evaluation result of Selete's exposure tool: impact of the source performance

Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, Yuusuke Tanaka, Seiichiro Shirai, Hiroyuki Tanaka

Proceedings Volume 6921, 69212V (2008) https://doi.org/10.1117/12.771891

KEYWORDS: Electrodes, Extreme ultraviolet, Semiconducting wafers, Lithography, Plasma, Extreme ultraviolet lithography, Mirrors, Manufacturing, Xenon, Semiconductors

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Proceedings Article | 24 March 2006 Paper

Paper

Data conversion system for character projection-type low-energy electron beam direct writing system

Ryoichi Inanami, Katsumi Kishimoto, Kazuhiro Nakai, Yoshikazu Ichioka, Kiyoshi Kitamura, Ryo Yamada, Shunko Magoshi

Proceedings Volume 6151, 615126 (2006) https://doi.org/10.1117/12.655438

KEYWORDS: Vestigial sideband modulation, Data conversion, Metals, Electron beams, Databases, Front end of line, Back end of line, Electron beam direct write lithography, Lithography, Logic devices

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Proceedings Article | 6 May 2005 Paper

Paper

Study of EB-tree

Kazuo Tawarayama, Shunko Magoshi, Shinji Sato, Masayuki Hatano

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598923

KEYWORDS: Semiconducting wafers, Metals, Backscatter, Electron beam lithography, Copper, Lithography, Electron beam direct write lithography, Monte Carlo methods, Critical dimension metrology, Tungsten

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Proceedings Article | 16 June 2003 Paper

Paper

Proximity effect correction on multilevel interconnect metal for high-energy electron-beam lithography

Shunko Magoshi, Shinji Sato, Kazuo Tawarayama, Yasuhiro Makino, Hiromi Niiyama

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483741

KEYWORDS: Metals, Backscatter, Electron beam lithography, Lithography, Silicon, Tungsten, Modulation, Monte Carlo methods, Microelectronics, Aluminum

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Proceedings Article | 16 June 2003 Paper

Paper

Maskless lithography: estimation of the number of shots for each layer in a logic device with character-projection-type low-energy electron-beam direct writing system

Ryoichi Inanami, Shunko Magoshi, Shouhei Kousai, Atsushi Ando, Tetsuro Nakasugi, Ichiro Mori, Kazuyoshi Sugihara, Akira Miura

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483702

KEYWORDS: Back end of line, Vestigial sideband modulation, Logic devices, Metals, Data processing, Photomasks, Electron beams, Electron beam direct write lithography, Computer aided design, Beam shaping

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Proceedings Article | 5 June 1998 Paper

Paper

Linewidth controllability depending on electron-beam blur and resist thickness

Masamitsu Itoh, Atsushi Ando, Shunko Magoshi, Kiyoshi Hattori

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309598

KEYWORDS: Critical dimension metrology, Photomasks, Lithography, Scattering, Laser systems engineering, Control systems, Laser scattering, Monte Carlo methods, Beam controllers, Diffusion

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Proceedings Article | 24 July 1996 Paper

Paper

Pattern-data preparation method to enchance high-throughput mask fabrication in variable-shaped e-beam writing system

Shigehiro Hara, Eiji Murakami, Shunko Magoshi, Kiyomi Koyama, Hirohito Anze, Yoji Ogawa, A. Kabeya, S. Ooki, Tamaki Saito, T. Fujii, S. Sakamoto, Hiromi Suzuki, Mitsuhiro Yano, Sadakazu Watanabe

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245217

KEYWORDS: Data conversion, Computer aided design, Metals, Data processing, Mask making, Boron, Microelectronics, Solids, Chlorine, Algorithm development

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Showing 5 of 19 publications

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