Mr. Waut Drent Profile

Waut Drent

at imec

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 1 May 2023 Poster + Paper

Defectivity reduction in EUV resists through novel high-performance Point-Of-Use (POU) filters

Yiren Zhang, Toru Umeda, Hirokazu Sakakibara, Sheik Ansar Usman Ibrahim, Atsushi Sakamoto, Amarnauth Singh, Robert Shick, Karl Skjonnemand, Philippe Foubert, Waut Drent

Proceedings Volume 12498, 124981Y (2023) https://doi.org/10.1117/12.2660389

KEYWORDS: Tunable filters, Extreme ultraviolet lithography, Particles, Photoresist materials, Contamination

Read Abstract +

Proceedings Article | 22 February 2021 Presentation + Paper

High performance filtration for bulk materials: a novel HDPE membrane filter designed for EUV lithography

Lucia D'Urzo, Toru Umeda, Takehito Mizuno, Atsushi Hattori, Amarnauth Singh, Rajan Beera, Philippe Foubert, Waut Drent

Proceedings Volume 11612, 116120H (2021) https://doi.org/10.1117/12.2584064

KEYWORDS: Extreme ultraviolet lithography, Particles, Molecules, Lithography, Extreme ultraviolet, Semiconducting wafers, Metals, Liquids, Linear filtering, Coating

Read Abstract +

Proceedings Article | 23 March 2020 Presentation + Paper

Defectivity modulation in EUV resists through advanced filtration technologies

Lucia D'Urzo, Toru Umeda, Takehito Mizuno, Atsushi Hattori, Rao Varanasi, Amarnauth Singh, Rajan Beera, Philippe Foubert, Jelle Vandereyken, Waut Drent

Proceedings Volume 11326, 113260K (2020) https://doi.org/10.1117/12.2560144

KEYWORDS: Semiconducting wafers, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Bridges, Defect inspection

Read Abstract +

Proceedings Article | 13 March 2018 Presentation + Paper

LWR enhancement for 300mm track processing

Harold Stokes, Jelle Vandereyken, Waut Drent, Masahiko Harumoto, Masaya Asai, Yuji Tanaka, Chisayo Nakayama, Charles Pieczulewski

Proceedings Volume 10586, 105860J (2018) https://doi.org/10.1117/12.2297471

KEYWORDS: Annealing, Line width roughness, Semiconducting wafers, Line edge roughness, Ultraviolet radiation, Etching, Optical lithography, Lithography, Photoresist materials, Reticles

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years