Mr. Vineet Vijayakrishnan Nair Profile

Vineet Vijayakrishnan Nair

at Micron Technology Inc

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Author

Publications (8)

Proceedings Article | 12 November 2024 Paper

Enhanced EUV photolithography control for overcoming defectivity challenges

Amit Ohri, Steve Snyder, Vineet Vijayakrishnan Nair, Brian Watson, Kwangho Ahn, Efe Sinan Ege, Yashvi Singh, Ethan Lee, Howard Chen, Scott Light, Josiah Jebaraj Johnley Muthuraj, Lishan Chen, Kevin Weich, John Hobbs

Proceedings Volume 13215, 132150P (2024) https://doi.org/10.1117/12.3034557

KEYWORDS: Optical lithography, Semiconducting wafers, Extreme ultraviolet, Nozzles, Advanced patterning, Inspection, Silicon, Etching, Photoresist processing, Manufacturing

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SPIE Journal Paper | 27 May 2021

Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve van Look, Remko Aubert, Vineet Nair, Marina Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gökay Yeğen, Par Broman

JM3, Vol. 20, Issue 02, 021005, (May 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.2.021005

KEYWORDS: Pellicles, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon nanotubes, Semiconducting wafers, Scattering, Reticles, Particles, Line width roughness

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Proceedings Article | 23 February 2021 Presentation + Paper

CNT pellicles: imaging results of the first full-field EUV exposures

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve Van Look, Remko Aubert, Vineet Nair, Marina Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gokay Yeğen, Pär Broman

Proceedings Volume 11609, 116090Z (2021) https://doi.org/10.1117/12.2584724

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Proceedings Article | 22 February 2021 Presentation + Paper

Metal layer single EUV expose at pitch 28 nm: how bright field and NTD resist advantages align

Joern-Holger Franke, Andreas Frommhold, Natalia Davydova, Remko Aubert, Vineet Vijayakrishnan Nair, Tatiana Kovalevich, David Rio, Joost Bekaert, Erik Wang, Gijsbert Rispens, Mark Maslow, Eric Hendrickx

Proceedings Volume 11609, 116090R (2021) https://doi.org/10.1117/12.2584733

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Proceedings Article | 4 January 2021 Presentation + Paper

Tomorrow’s pitches on today’s 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes

Joern-Holger Franke, Natalia Davydova, Joost Bekaert, Vincent Wiaux, Vineet Vijayakrishnan Nair, Andre van Dijk, Erik Wang, Mark Maslow, Eric Hendrickx

Proceedings Volume 11517, 1151716 (2021) https://doi.org/10.1117/12.2573073

KEYWORDS: Scanners, Extreme ultraviolet lithography, Etching, Metrology, Photomasks, Image quality, Semiconducting wafers, Semiconductors, Optical lithography, Ecosystems

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Proceedings Article | 4 November 2020 Presentation + Paper

Study of EUV reticle storage effects through exposure on EBL2 and NXE

Rik Jonckheere, Chien-Ching Wu, Veronique de Rooij-Lohmann, Dorus Elstgeest, Henk Lensen, Philipp Hönicke, Michael Kolbe, Victor Soltwisch, Claudia Zech, Frank Scholze, Remko Aubert, Vineet Nair, Eric Hendrickx

Proceedings Volume 11517, 115170Z (2020) https://doi.org/10.1117/12.2573125

KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Ruthenium, Scanners, Contamination, Integrated circuits, Semiconductors, X-rays

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Proceedings Article | 13 October 2020 Presentation + Paper

Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry

Vineet Vijayakrishnan Nair, Lieve Van Look , Remko Aubert, Eric Hendrickx

Proceedings Volume 11517, 115170O (2020) https://doi.org/10.1117/12.2572993

KEYWORDS: Scanners, Extreme ultraviolet lithography, Semiconducting wafers, Ellipsometry, EUV optics, Metrology, Calibration, Photomasks, Critical dimension metrology, Time metrology

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Proceedings Article | 23 March 2020 Presentation + Paper

Novel monitoring of EUV litho cluster for manufacturing insertion

Vincent Truffert, Kit Ausschnitt, Vineet V. Nair, Koen D'Havé

Proceedings Volume 11323, 113230S (2020) https://doi.org/10.1117/12.2551881

KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Metrology, Manufacturing, Stochastic processes, Optical lithography, Extreme ultraviolet lithography, Overlay metrology, Line width roughness, Line edge roughness, Optical simulations, Scatterometry

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Showing 5 of 8 publications

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