CNT pellicles: imaging results of the first full-field EUV exposures

Joost Bekaert; Emily Gallagher; Rik Jonckheere; Lieve Van Look; Remko Aubert; Vineet V. Nair; Marina Y. Timmermans; Ivan Pollentier; Eric Hendrickx; Alexander Klein; Gokay Yeğen; Pär Broman

doi:10.1117/12.2584724

23 February 2021 CNT pellicles: imaging results of the first full-field EUV exposures

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve Van Look, Remko Aubert, Vineet V. Nair, Marina Y. Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gokay Yeğen, Pär Broman

Author Affiliations +

Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 116090Z (2021) https://doi.org/10.1117/12.2584724
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

EUV lithography has recently been implemented in high volume wafer production. Consequently, maximizing yield is gaining importance. One key component to achieve optimal yield is using a pellicle to hold particles out of the focal plane and thereby minimize the printing of defects. The Carbon Nano Tube (CNT) pellicle is a membrane consisting of a network of carbon nanotubes, and demonstrated EUV transmission up to 98%. The challenge is to balance the CNT material parameters for optimal performance in the EUV scanner: low probability for particles to pass, low impact on imaging through scattered light, high durability in the scanner environment, while maintaining high transmission. We report results of the first full-field CNT pellicle exposures on an NXE EUV scanner. We demonstrate handling of the pellicles on the scanner, without breakage, and provides a first assessment of their imaging behavior. Multiple single- and double-walled uncoated CNT pellicles with EUV transmission up to 97.7% were exposed on the NXE scanner at imec, and minimal impact on the imaging is confirmed. In these exposures, uncoated CNT pellicles were used which will not meet the specifications regarding lifetime. Therefore, current ongoing developments focus on CNT coating and durability in scanner environment. The presented demonstration proves the value of a CNT-based EUV pellicle solution.

Conference Presentation

Citation Download Citation

Joost Bekaert, Emily Gallagher, Rik Jonckheere, Lieve Van Look, Remko Aubert, Vineet V. Nair, Marina Y. Timmermans, Ivan Pollentier, Eric Hendrickx, Alexander Klein, Gokay Yeğen, and Pär Broman "CNT pellicles: imaging results of the first full-field EUV exposures", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 116090Z (23 February 2021); https://doi.org/10.1117/12.2584724

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available