Takahiro Nakayama
at CANON INC
SPIE Involvement:
Author
Publications (11)

SPIE Journal Paper | 4 January 2022
JM3, Vol. 21, Issue 01, 011005, (January 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.011005
KEYWORDS: Nanoimprint lithography, Photoresist processing, Computer simulations, Distortion, Manufacturing, Head, Solids, Optical lithography, High volume manufacturing, Resistance

Proceedings Article | 23 March 2020 Paper
Proceedings Volume 11328, 113280N (2020) https://doi.org/10.1117/12.2551999
KEYWORDS: Nanoimprint lithography, Computer simulations, Photoresist processing, Manufacturing, Distortion, High volume manufacturing, Solids, Overlay metrology, Fluid dynamics

Proceedings Article | 27 June 2019 Paper
Toshiya Asano, Keita Sakai, Kiyohito Yamamoto, Hiromi Hiura, Takahiro Nakayama, Tomohiko Hayashi, Yukio Takabayashi, Takehiko Iwanaga, Douglas Resnick
Proceedings Volume 11178, 111780I (2019) https://doi.org/10.1117/12.2532522
KEYWORDS: Photomasks, Nanoimprint lithography, Semiconducting wafers, Lithography, Optical lithography, Manufacturing, Semiconductors, Line width roughness, Particles, Semiconductor manufacturing

Proceedings Article | 26 March 2019 Paper
Keita Sakai, Kiyohito Yamamoto, Hiromi Hiura, Takahiro Nakayama, Toshiya Asano, Tomohiko Hayashi, Yukio Takabayashi, Takehiko Iwanaga, Douglas Resnick
Proceedings Volume 10958, 109580G (2019) https://doi.org/10.1117/12.2514925
KEYWORDS: Photomasks, Nanoimprint lithography, Semiconducting wafers, Lithography, Optical lithography, Manufacturing, Semiconductors, Line width roughness, Particles, Semiconductor manufacturing

Proceedings Article | 13 July 2017 Paper
Masami Yonekawa, Takahiro Nakayama, Kazuki Nakagawa, Toshihiro Maeda, Yoichi Matsuoka, Keiji Emoto, Hisanobu Azuma, Yukio Takabayashi, Ali Aghili, Makoto Mizuno, Jin Choi, Chris Jones
Proceedings Volume 10454, 104540R (2017) https://doi.org/10.1117/12.2279365
KEYWORDS: Semiconducting wafers, Curtains, Polishing, Lithography, Liquids, Ceramics, Nanoimprint lithography, Particles, Control systems, Semiconductor manufacturing, Photomasks

Proceedings Article | 21 March 2017 Paper
Takahiro Nakayama, Masami Yonekawa, Yoichi Matsuoka, Hisanobu Azuma, Yukio Takabayashi, Ali Aghili, Makoto Mizuno, Jin Choi, Chris Jones
Proceedings Volume 10144, 1014407 (2017) https://doi.org/10.1117/12.2257647
KEYWORDS: Photomasks, Particles, Nanoimprint lithography, Lithography, Semiconductors, Control systems, Semiconductor manufacturing, Ultraviolet radiation, Optical lithography, Semiconducting wafers, Curtains, Ceramics, Surface finishing, Polishing

Proceedings Article | 4 October 2016 Paper
Yoichi Matsuoka, Junichi Seki, Takahiro Nakayama, Kazuki Nakagawa, Hisanobu Azuma, Kiyohito Yamamoto, Chiaki Sato, Fumio Sakai, Yukio Takabayashi, Ali Aghili, Makoto Mizuno, Jin Choi, Chris Jones
Proceedings Volume 9985, 99851G (2016) https://doi.org/10.1117/12.2243114
KEYWORDS: Photomasks, Lithography, Nanoimprint lithography, Semiconducting wafers, Semiconductors, Particles, Semiconductor manufacturing, Curtains, Image resolution, Manufacturing

Proceedings Article | 28 March 2014 Paper
A.-P. Mebiene-Engohang, M. Pourteau, J. Marusic, L. Pain, T. Nakayama, A. Miyake, M. Smits, S. David, S. Labau, J. Boussey
Proceedings Volume 9049, 90492Q (2014) https://doi.org/10.1117/12.2046350
KEYWORDS: Contamination, Semiconducting wafers, Silicon, Thin film coatings, Scanning electron microscopy, Polymers, Carbon, Projection systems, Chemical species, Lithography

Proceedings Article | 18 March 2009 Paper
Takahiro Nakayama, Akira Miyake, Hiromitsu Takase, Shigeru Terashima, Takashi Sudo, Yutaka Watanabe, Yasuaki Fukuda
Proceedings Volume 7271, 72713P (2009) https://doi.org/10.1117/12.813587
KEYWORDS: Carbon, Extreme ultraviolet, Protactinium, Mirrors, Molecules, Adsorption, Extreme ultraviolet lithography, Synchrotron radiation, Information operations, Data modeling

Proceedings Article | 21 March 2008 Paper
Proceedings Volume 6921, 69213B (2008) https://doi.org/10.1117/12.769958
KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Multilayers, Bioalcohols, Chemical species, Coating, Oxidation

Proceedings Article | 21 March 2008 Paper
Proceedings Volume 6921, 69213C (2008) https://doi.org/10.1117/12.771814
KEYWORDS: Mirrors, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Bioalcohols, Carbon, Oxides, Protactinium, Oxygen, Oxidation

Showing 5 of 11 publications
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