Dr. Shiyong Yi Profile

Dr. Shiyong Yi

Principal Engineer at Dongwoo Fine-Chem Co Ltd

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Publications (8)

Proceedings Article | 26 March 2013 Paper

Patterning process for semiconductor using directed self assembly

Jaewoo Nam, Eun Sung Kim, Daekeun Kang, Hangeun Yu, Kyoungseon Kim, Shiyong Yi, Chul-Ho Shin, Ho-Kyu Kang

Proceedings Volume 8680, 868011 (2013) https://doi.org/10.1117/12.2011631

KEYWORDS: Annealing, Resistance, Photoresist materials, Critical dimension metrology, Optical lithography, Scanning electron microscopy, Semiconductors, Molecular self-assembly, Semiconducting wafers, Directed self assembly

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Proceedings Article | 1 April 2009 Paper

Advanced immersion contact hole patterning for sub 40nm memory applications: a fundamental resist study

Yun-Kyeong Jang, Jin-Young Yoon, Shi-Yong Lee, Kwang-Sub Yoon, Seok-Hwan Oh, Seong-Woon Choi, Woo-Sung Han, Seokho Kang, Thomas Penniman, Duk-Soo Kim, Dong Won Chung, Sung-Seo Cho, Cheng Bai Xu, George Barclay

Proceedings Volume 7273, 727339 (2009) https://doi.org/10.1117/12.814483

KEYWORDS: Diffusion, Polymers, Electroluminescence, Optical lithography, Photoresist materials, Lithography, Electronics, Image compression, Temperature metrology, Resolution enhancement technologies

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Proceedings Article | 4 December 2008 Paper

Practical requirement for reflectivity control in sub 30nm device using high NA immersion lithography

Yun-kyeong Jang, So-ra Han, Hyoung-hee kim, Jin-Young Yoon, Shi-yong Lee, Kwang-sub Yoon, Seok-hwan Oh, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 7140, 714032 (2008) https://doi.org/10.1117/12.804671

KEYWORDS: Reflectivity, Lithography, Critical dimension metrology, Line width roughness, Immersion lithography, Optical lithography, Photomasks, Scanning electron microscopy, Electroluminescence, Control systems

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Proceedings Article | 4 May 2005 Paper

Application of bi-layer resist on 70 nm node memory devices

Yool Kang, Jin Hong, Shi-Yong Lee, Hyung-Rae Lee, Man-Hyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599484

KEYWORDS: Etching, Line width roughness, Lithography, Silicon, Dry etching, Photomasks, Photoresist processing, Semiconducting wafers, Chemistry, Optical lithography

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Proceedings Article | 14 May 2004 Paper

Comprehensive analysis of sources of total CD variation in ArF resist perspective

Hyun-Woo Kim, Hyung-Rae Lee, Kyung-Mee Kim, Shi Yong Lee, Bong-Cheol Kim, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534806

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Line edge roughness, Photoresist processing, Diffusion, Lithography, Temperature metrology, Scanners, Scatterometry

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Proceedings Article | 14 May 2004 Paper

Influence of activation energy on LER in chemically amplified KrF photoresists

Jae Hyun Kim, Chang Ho Lee, Seok Bong Park, Won Mi Kim, Sang Sik Moon, Kyung-Mee Kim, Shi Yong Lee, Sangwoong Yoon, Young Ho Kim, Sang-Mun Chon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533880

KEYWORDS: Diffusion, Photoresist materials, Line edge roughness, Polymers, Atomic force microscopy, Temperature metrology, Scanning electron microscopy, Photoresist developing, Lithography, Glasses

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Proceedings Article | 14 May 2004 Paper

Influence of resin properties to resist performance at ArF lithography

Sangwoong Yoon, Myungsun Kim, Hong Lee, Do Kim, Young Hoon Kim, Boo Deuk Kim, Jae Hyun Kim, Kyung-Mee Kim, Shi Yong Lee, Young Ho Kim, Sang-Mun Chon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533950

KEYWORDS: Line edge roughness, Lithography, Palladium, Polymers, Ultraviolet radiation, Polymerization, Manganese, Photoresist materials, Sensors, Critical dimension metrology

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Proceedings Article | 14 May 2004 Paper

Impact of BARC on SEM shrinkage of ArF resist

Shi Yong Lee, Myungsun Kim, Sangwoong Yoon, Kyung-Mee Kim, Jae Hyun Kim, Hyun-Woo Kim, Sang-Gyun Woo, Young Ho Kim, Sang-Mun Chon, Takahiro Kishioka, Yasuhisa Sone, Yasuyuki Nakajima

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533884

KEYWORDS: Scanning electron microscopy, Reflectivity, Critical dimension metrology, Inspection, Polymers, Silicon, Optical lithography, Time metrology, Lithography, Line edge roughness

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Showing 5 of 8 publications

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