CONFERENCE PROCEEDINGS
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Dr. Kyung-Me Kim
at Samsung Electronics Co Ltd
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Author
Publications (5)
Proceedings Article | 4 May 2005 Paper
ArF photoresist parameter optimization for mask error enhancement factor reduction
Tae Sung Kim, Kyung Sil Park, Hyun Wook Oh, Young Ho Kim, Ji Eun Lee, Hye Young Kang, Seok Han, Hye-Keun Oh, Kyung Me Kim, Chang Ho Lee
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600308
KEYWORDS: Photomasks, Semiconducting wafers, Photoresist materials, Line edge roughness, Absorbance, Critical dimension metrology, Polymers, Photoresist processing, Diffusion, Optical properties
Proceedings Article | 14 May 2004 Paper
Influence of resin properties to resist performance at ArF lithography
Young Ho Kim, Sangwoong Yoon, Sang-Mun Chon, Boo Deuk Kim, Hong Lee, Shi Yong Lee, Jae Hyun Kim, Do Kim, Young Hoon Kim, Myungsun Kim, Kyung-Mee Kim
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533950
KEYWORDS: Line edge roughness, Lithography, Palladium, Polymers, Ultraviolet radiation, Polymerization, Manganese, Photoresist materials, Sensors, Critical dimension metrology
Proceedings Article | 14 May 2004 Paper
Influence of activation energy on LER in chemically amplified KrF photoresists
Won Mi Kim, Young Ho Kim, Sang-Mun Chon, Kyung-Mee Kim, Seok Bong Park, Sang Sik Moon, Chang Ho Lee, Jae Hyun Kim, Shi Yong Lee, Sangwoong Yoon
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533880
KEYWORDS: Diffusion, Photoresist materials, Line edge roughness, Polymers, Atomic force microscopy, Temperature metrology, Scanning electron microscopy, Photoresist developing, Lithography, Glasses
Proceedings Article | 14 May 2004 Paper
Comprehensive analysis of sources of total CD variation in ArF resist perspective
Kyung-Mee Kim, Bong-Cheol Kim, Han-Ku Cho, Sang-Gyun Woo, Hyun-Woo Kim, Shi Yong Lee, Hyung-Rae Lee, Woo-Sung Han, Seok-Hwan Oh
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534806
KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Line edge roughness, Photoresist processing, Diffusion, Lithography, Temperature metrology, Scanners, Scatterometry
Proceedings Article | 14 May 2004 Paper
Impact of BARC on SEM shrinkage of ArF resist
Kyung-Mee Kim, Sang-Gyun Woo, Hyun-Woo Kim, Shi Yong Lee, Sangwoong Yoon, Jae Hyun Kim, Takahiro Kishioka, Sang-Mun Chon, Yasuhisa Sone, Myungsun Kim, Yasuyuki Nakajima, Young Ho Kim
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533884
KEYWORDS: Scanning electron microscopy, Reflectivity, Critical dimension metrology, Inspection, Polymers, Silicon, Optical lithography, Time metrology, Lithography, Line edge roughness
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