Dr. Shinji Omori Profile

Dr. Shinji Omori

at Sony Corp

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 6 May 2005 Paper

BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography

S. Nohdo, S. Omori, K. Iwase, M. Yoshizawa, T. Motohashi, K. Oguni, K. Nakayama, H. Egawa, T. Takeda, T. Morikawa, S. Nohama, H. Nakano, T. Kitagawa, S. Moriya, H. Kawahira

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733

KEYWORDS: Photomasks, Lithography, Resistance, Semiconducting wafers, Inspection, Photoresist processing, Charged-particle lithography, Back end of line, Copper, Etching

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Proceedings Article | 20 August 2004 Paper

A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging

Kazuya Iwase, Shinji Omori, Shoji Nohama, Kenta Yotsui, Gaku Suzuki, Yushin Sasaki, Kojiro Itoh, Akira Tamura, Satoru Maruyama, Shigeru Moriya, Tetsuya Kitagawa

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557822

KEYWORDS: Photomasks, Inspection, Lithography, Defect detection, Electron beam lithography, Etching, Semiconducting wafers, Photoresist processing, Monte Carlo methods, Opacity

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Proceedings Article | 20 August 2004 Paper

Feedforward correction of mask image placement for proximity electron lithography

Shinji Omori, Shinichiro Nohdo, Tomonori Motohashi, Tetsuya Kitagawa, Takashi Susa, Kenta Yotsui, Kojiro Itoh, Akira Tamura

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557821

KEYWORDS: Photomasks, Semiconducting wafers, Overlay metrology, Metrology, Lithography, Distortion, Scanners, Data corrections, Electron beams, Data processing

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Proceedings Article | 20 August 2004 Paper

Structure and data processing for PEL mask compatible with image placement accuracy in the 65-nm node and beyond

Kohichi Nakayama, Kensuke Tsuchiya, Shinji Omori, Hidetoshi Ohnuma

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557776

KEYWORDS: Data processing, Photomasks, Chemical elements, Error analysis, Finite element methods, Electron beam lithography, Distortion, Lithography, Computer simulations, Image processing

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SPIE Journal Paper | 1 July 2004

Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β-tool

Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759326

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

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Proceedings Article | 28 May 2004 Paper

Lithography of choice for the 45 nm node: new medium, new wavelength, or new beam

Fumikatsu Uesawa, Mikio Katsumata, Kazuhisa Ogawa, Koichi Takeuchi, Shinji Omori, Masaki Yoshizawa, Hiroichi Kawahira

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535104

KEYWORDS: Lithography, Photomasks, Semiconducting wafers, Charged-particle lithography, Lithographic illumination, Phase shifts, Optical lithography, Electroluminescence, Photoresist processing, Critical dimension metrology

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Proceedings Article | 20 May 2004 Paper

First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results

Tetsuya Kitagawa, Masaki Yoshizawa, Kazuya Iwase, Shinji Omori, Shoji Nohama, Hiroyuki Nakano, Shigeru Moriya, Hiroichi Kawahira

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534423

KEYWORDS: Charged-particle lithography, Photomasks, Lithography, Scanners, Contamination, Semiconducting wafers, Overlay metrology, Photoresist processing, Resistance, Image processing

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Proceedings Article | 17 December 2003 Paper

Litho-and-mask concurrent approach to the critical issues for proximity electron lithography

Shinji Omori, Kazuya Iwase, Keiko Amai, Yoko Watanabe, Shoji Nohama, Shinichiro Nohdo, Shigeru Moriya, Tetsuya Kitagawa, Kenta Yotsui, Gaku Suzuki, Akira Tamura

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518816

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Photoresist processing, Image processing, Scanners, Etching, Electroluminescence, Overlay metrology, Charged-particle lithography

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Proceedings Article | 28 August 2003 Paper

Alignment accuracy of LEEPL: image placement error correction

Shinichiro Nohdo, Tomonori Motohashi, Nobuo Shimazu, Hiroyuki Nakano, Shinji Omori, Tetsuya Kitagawa, Shigeru Moriya

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504067

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Lithography, Optical alignment, Distortion, Overlay metrology, Resolution enhancement technologies, Silicon carbide, Cadmium sulfide

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Proceedings Article | 28 August 2003 Paper

Complementary splitting with stress emulation for stencil masks

Kohichi Nakayama, Kazuharu Inoue, Isao Ashida, Shinji Omori, Hidetoshi Ohnuma

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504071

KEYWORDS: Photomasks, Finite element methods, Charged-particle lithography, Lithography, Semiconducting wafers, Liquids, Algorithm development, Silicon, Safety, Semiconductors

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Proceedings Article | 28 August 2003 Paper

On-site use of 1x stencil mask: control over image placement and dimension

Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shoji Nohama, Isao Ashida, Shigeru Moriya, Tetuya Kitagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504258

KEYWORDS: Photomasks, Semiconducting wafers, Contamination, Critical dimension metrology, Lithography, Metrology, Distortion, Overlay metrology, Charged-particle lithography, Silicon

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Proceedings Article | 28 August 2003 Paper

State-of-the-art performance of stencil mask for LEEPL

Shoji Nohama, Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shigeru Moriya, Tetuya Kitagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504273

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Etching, Image enhancement, Scanning electron microscopy, Line edge roughness, Lithography, Photoresist processing, Defect inspection

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Proceedings Article | 1 August 2002 Paper

New mask format for low-energy electron-beam proximity projection lithography

Kaoru Koike, Shinji Omori, Kazuya Iwase, Isao Ashida, Shigeru Moriya

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477009

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Projection lithography, Electron beam lithography, Finite element methods, Lithography, Electron beams, Diamond, Computer simulations

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Proceedings Article | 1 August 2002 Paper

Data processing for LEEPL mask: splitting and placement correction

Isao Ashida, Shinji Omori, Hidetoshi Ohnuma

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476997

KEYWORDS: Photomasks, Charged-particle lithography, Chemical elements, Data processing, Lithography, Distortion, Finite element methods, Image processing, Optical lithography, Data conversion

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Showing 5 of 14 publications

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