Mr. Shigeru Moriya Profile

Shigeru Moriya

at Sony Corp

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 6 May 2005 Paper

Paper

BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography

S. Nohdo, S. Omori, K. Iwase, M. Yoshizawa, T. Motohashi, K. Oguni, K. Nakayama, H. Egawa, T. Takeda, T. Morikawa, S. Nohama, H. Nakano, T. Kitagawa, S. Moriya, H. Kawahira

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733

KEYWORDS: Photomasks, Lithography, Resistance, Semiconducting wafers, Inspection, Photoresist processing, Charged-particle lithography, Back end of line, Copper, Etching

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Proceedings Article | 20 August 2004 Paper

Paper

A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging

Kazuya Iwase, Shinji Omori, Shoji Nohama, Kenta Yotsui, Gaku Suzuki, Yushin Sasaki, Kojiro Itoh, Akira Tamura, Satoru Maruyama, Shigeru Moriya, Tetsuya Kitagawa

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557822

KEYWORDS: Photomasks, Inspection, Lithography, Defect detection, Electron beam lithography, Etching, Semiconducting wafers, Photoresist processing, Monte Carlo methods, Opacity

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SPIE Journal Paper | 1 July 2004

Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β-tool

Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759326

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

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Proceedings Article | 20 May 2004 Paper

Paper

Analysis of critical dimension uniformity for LEEPL

Masaki Yoshizawa, Kazuya Iwase, Hiizu Ohtorii, Kumiko Oguni, Hiroki Hane, Keiko Amai, Shigeru Moriya, Hiroyuki Nakano, Tetsuya Kitagawa

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536029

KEYWORDS: Critical dimension metrology, Photomasks, Charged-particle lithography, Edge roughness, Electrons, Scanning electron microscopy, Scattering, Semiconducting wafers, Lithography, Image enhancement

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Proceedings Article | 20 May 2004 Paper

Paper

First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results

Tetsuya Kitagawa, Masaki Yoshizawa, Kazuya Iwase, Shinji Omori, Shoji Nohama, Hiroyuki Nakano, Shigeru Moriya, Hiroichi Kawahira

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534423

KEYWORDS: Charged-particle lithography, Photomasks, Lithography, Scanners, Contamination, Semiconducting wafers, Overlay metrology, Photoresist processing, Resistance, Image processing

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Proceedings Article | 17 December 2003 Paper

Paper

Litho-and-mask concurrent approach to the critical issues for proximity electron lithography

Shinji Omori, Kazuya Iwase, Keiko Amai, Yoko Watanabe, Shoji Nohama, Shinichiro Nohdo, Shigeru Moriya, Tetsuya Kitagawa, Kenta Yotsui, Gaku Suzuki, Akira Tamura

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518816

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Photoresist processing, Image processing, Scanners, Etching, Electroluminescence, Overlay metrology, Charged-particle lithography

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Proceedings Article | 28 August 2003 Paper

Paper

On-site use of 1x stencil mask: control over image placement and dimension

Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shoji Nohama, Isao Ashida, Shigeru Moriya, Tetuya Kitagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504258

KEYWORDS: Photomasks, Semiconducting wafers, Contamination, Critical dimension metrology, Lithography, Metrology, Distortion, Overlay metrology, Charged-particle lithography, Silicon

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Proceedings Article | 28 August 2003 Paper

Paper

State-of-the-art performance of stencil mask for LEEPL

Shoji Nohama, Shinji Omori, Kazuya Iwase, Yoko Watanabe, Keiko Amai, Takayuki Sasaki, Shigeru Moriya, Tetuya Kitagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504273

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Etching, Image enhancement, Scanning electron microscopy, Line edge roughness, Lithography, Photoresist processing, Defect inspection

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Proceedings Article | 28 August 2003 Paper

Paper

Recent lithographic results from LEEPL

Shigeru Moriya

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504066

KEYWORDS: Charged-particle lithography, Photomasks, Lithography, Electron beams, Image processing, Semiconducting wafers, Distortion, Electron beam lithography, Printing, Backscatter

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Proceedings Article | 28 August 2003 Paper

Paper

Alignment accuracy of LEEPL: image placement error correction

Shinichiro Nohdo, Tomonori Motohashi, Nobuo Shimazu, Hiroyuki Nakano, Shinji Omori, Tetsuya Kitagawa, Shigeru Moriya

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504067

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Lithography, Optical alignment, Distortion, Overlay metrology, Resolution enhancement technologies, Silicon carbide, Cadmium sulfide

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Proceedings Article | 16 June 2003 Paper

Paper

Imaging capability of low-energy electron-beam proximity-projection lithography toward the 65/45-nm node

Hiroyuki Nakano, Shinichiro Nohdo, Kumiko Oguni, Tomonori Motohashi, Masaki Yoshizawa, Tetsuya Kitagawa, Shigeru Moriya

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484429

KEYWORDS: Charged-particle lithography, Lithography, Photoresist processing, Electron beam lithography, Image resolution, Silicon, Oxides, Electron beams, Chemically amplified resists, Photomasks

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Proceedings Article | 1 August 2002 Paper

Paper

New mask format for low-energy electron-beam proximity projection lithography

Kaoru Koike, Shinji Omori, Kazuya Iwase, Isao Ashida, Shigeru Moriya

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477009

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Projection lithography, Electron beam lithography, Finite element methods, Lithography, Electron beams, Diamond, Computer simulations

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Proceedings Article | 1 August 2002 Paper

Paper

Imaging capability of low-energy electron-beam proximity projection lithography toward the 70-nm node

Hiroyuki Nakano, Kumiko Oguni, Shinichiro Nohdo, Kaoru Koike, Shigeru Moriya

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476996

KEYWORDS: Photomasks, Charged-particle lithography, Optical alignment, Lithography, Semiconducting wafers, Electron beam lithography, Projection lithography, Photoresist processing, Etching, Dry etching

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Proceedings Article | 5 September 2001 Paper

Paper

Evaluation of aperture mask degradation in electron-beam lithography using line edge roughness of resist patterns

Masaki Yoshizawa, Shigeru Moriya

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438366

KEYWORDS: Line edge roughness, Scanning electron microscopy, Contamination, Photomasks, Lithography, Edge detection, Image quality, Silicon, Image resolution, Edge roughness

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Proceedings Article | 21 July 2000 Paper

Paper

Edge roughness evaluation method for quantifying at-size beam blur in electron-beam lithography

Masaki Yoshizawa, Shigeru Moriya

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390066

KEYWORDS: Line edge roughness, Scanning electron microscopy, Charged-particle lithography, Edge roughness, Lithography, Photomasks, Photography, Laser scattering, Scattering, Diffusion

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Showing 5 of 15 publications

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