Mr. Kensuke Tsuchiya Profile

Kensuke Tsuchiya

at Sony Corp

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Author

Publications (5)

Proceedings Article | 15 May 2007 Paper

New OPC method for contact layer to expand process margin

Mikio Oka, Hidetoshi Oishi, Kensuke Tsuchiya, Hidetoshi Ohnuma

Proceedings Volume 6607, 660732 (2007) https://doi.org/10.1117/12.729021

KEYWORDS: Optical proximity correction, Critical dimension metrology, Image processing, Lithography, Semiconductors, Optical calibration, Photomasks, Resolution enhancement technologies, Photoresist processing

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Proceedings Article | 14 May 2007 Paper

New method to estimate systematic yield caused by lithography manufacturability

Hidetoshi Oishi, Mikio Oka, Kensuke Tsuchiya, Kazuhisa Ogawa, Hidetoshi Ohnuma

Proceedings Volume 6607, 660719 (2007) https://doi.org/10.1117/12.728957

KEYWORDS: Optical proximity correction, Metals, Design for manufacturing, Lithography, Manufacturing, Failure analysis, Yield improvement, Image processing, Error analysis, Photomasks

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Proceedings Article | 20 May 2006 Paper

Robust OPC technique using aerial image parameter

Mikio Oka, Shinichiro Suzuki, Kazuyoshi Kawahara, Kensuke Tsuchiya, Kazuhisa Ogawa, Hidetoshi Ohnuma

Proceedings Volume 6283, 628333 (2006) https://doi.org/10.1117/12.681821

KEYWORDS: Optical proximity correction, SRAF, Image processing, Lithography, Resolution enhancement technologies, Model-based design, Scanning electron microscopy, Photomasks, Printing, Semiconductors

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Proceedings Article | 28 June 2005 Paper

An extension method of metal layer layout in mask data preparation for robust processes

Kensuke Tsuchiya, Kazuhisa Ogawa, Satomi Nakamura, Kazuyoshi Kawahara, Hidetoshi Oishi, Hidetoshi Ohnuma

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617135

KEYWORDS: Optical proximity correction, Photomasks, Metals, Printing, Semiconductors, SRAF, Lithography, Scanners, Design for manufacturing, Design for manufacturability

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Proceedings Article | 20 August 2004 Paper

Structure and data processing for PEL mask compatible with image placement accuracy in the 65-nm node and beyond

Kohichi Nakayama, Kensuke Tsuchiya, Shinji Omori, Hidetoshi Ohnuma

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557776

KEYWORDS: Data processing, Photomasks, Chemical elements, Error analysis, Finite element methods, Electron beam lithography, Distortion, Lithography, Computer simulations, Image processing

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