Dr. Ronald J. G. Goossens Profile

Dr. Ronald J. G. Goossens

Strategy Consultant, Adjunct Professor

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Author

Publications (11)

Proceedings Article | 28 March 2017 Presentation + Paper

Computational overlay metrology with adaptive data analytics

Emil Schmitt-Weaver, Venky Subramony, Zakir Ullah, Masazumi Matsunobu, Ravin Somasundaram, Joel Thomas, Linmiao Zhang, Klaus Thul, Kaustuve Bhattacharyya, Ronald Goossens, Cees Lambregts, Wim Tel, Chris de Ruiter

Proceedings Volume 10145, 101450V (2017) https://doi.org/10.1117/12.2258039

KEYWORDS: Semiconducting wafers, Metrology, Lithography, Overlay metrology, Analytics, Process control, Optical lithography, Semiconductors, Optical alignment, Contamination, Sensors, Neural networks, Data modeling

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Proceedings Article | 24 March 2017 Presentation + Paper

Scanner-to-scanner CD analysis and control in an HVM environment

Du Hyun Beak, Ju Hee Shin, Tony Park, Dong Kyeng Han, Jin Phil Choi, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Peter Nikolsky, Chris Strolenberg, Noh-Kyoung Park, Khalid Elbattay, Vito Tomasello, Austin Peng, Anand Guntuka, Zhao-Ze Li, Ronald Goossens, Machi Ryu, Jangho Shin, Chung-Yong Kim, Andrew Moe, Yun-A Sung

Proceedings Volume 10147, 101470A (2017) https://doi.org/10.1117/12.2258339

KEYWORDS: Critical dimension metrology, Scanners, Lithographic illumination, Image processing, Process control, Computational lithography, Semiconducting wafers, Data modeling, Metrology, Photomasks, Calibration, Finite element methods, Laser scanners, 3D scanning

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Proceedings Article | 25 March 2016 Paper

A physical resist shrinkage model for full-chip lithography simulations

Peng Liu, Leiwu Zheng, Maggie Ma, Qian Zhao, Yongfa Fan, Qiang Zhang, Mu Feng, Xin Guo, Tom Wallow, Keith Gronlund, Ronald Goossens, Gary Zhang, Yenwen Lu

Proceedings Volume 9779, 97790Y (2016) https://doi.org/10.1117/12.2239243

KEYWORDS: Lithography, Computational lithography, Photoresist processing, Data modeling, Calibration, Cadmium, 3D modeling, Computer simulations, Optical proximity correction, Semiconducting wafers

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Proceedings Article | 12 April 2013 Paper

A study on the automation of scanner matching

Yuan He, Alexander Serebryakov, Scott Light, Vivek Jain, Erik Byers, Ronald Goossens, Zhi-Yuan Niu, Peter Engblom, Scott Larson, Bernd Geh, Craig Hickman, Hoyoung Kang

Proceedings Volume 8683, 86830W (2013) https://doi.org/10.1117/12.2014402

KEYWORDS: Scanners, Semiconducting wafers, Critical dimension metrology, Wafer-level optics, Optical lithography, Metrology, Cadmium, Optics manufacturing, Databases, Diffractive optical elements

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Proceedings Article | 2 April 2011 Paper

Model-based scanner tuning for process optimization

Rafael Aldana, Venu Vellanki, Wenjin Shao, Ronald Goossens, Zongchang Yu, Xu Xie, Yu Cao, Koen Schreel, Peter Lee, Won Kim, Tjitte Nooitgedagt

Proceedings Volume 7985, 79850L (2011) https://doi.org/10.1117/12.882764

KEYWORDS: Scanners, Semiconducting wafers, Calibration, Critical dimension metrology, Metrology, Optimization (mathematics), Printing, Data modeling, Photomasks, Model-based design

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Proceedings Article | 23 March 2011 Paper

Advanced scanner matching using freeform source and lens manipulators

Jong-Ho Lim, Kyung Kang, Sung-Man Kim, Wenjin Shao, Fei Du, Zhengfan Zhang, Zongchang Yu, John Barbuto, Venu Vellanki, Yu Cao, Ronald Goossens, Seung-Hoon Park, Chris Park, Stefan Hunsche, Junwei Lu

Proceedings Volume 7973, 79732A (2011) https://doi.org/10.1117/12.881680

KEYWORDS: Scanners, Semiconducting wafers, Birefringence, Critical dimension metrology, Diffractive optical elements, Metrology, Cadmium, Fiber optic illuminators, Data modeling, Computational lithography

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Proceedings Article | 4 March 2010 Paper

Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

Yuan He, Erik Byers, Scott Light, Danielle Hines, Anton Devilliers, Mike Hyatt, Jianming Zhou, Vinay Nair, Zongchang Yu, Yu Cao, Xu Xie, Wenjin Shao, Rafael Aldana, Ronald Goossens, Chang-Qun Ma, Junwei Lu, Hua-yu Liu, Chris Aquino, Peter Engblom, Tjitte Nooitgedagt, Eric Janda

Proceedings Volume 7640, 764014 (2010) https://doi.org/10.1117/12.848255

KEYWORDS: Scanners, Wafer-level optics, Semiconducting wafers, Metrology, Data modeling, Calibration, Critical dimension metrology, Optics manufacturing, Performance modeling, Optical simulations

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Proceedings Article | 12 December 2009 Paper

Model-based scanner tuning for process optimization

Tsung-Chih Chien, C. Y. Shih, R. C. Peng, H. H. Liu, Y. C. Chen, H. J. Lee, John Lin, K. W. Chang, C. M. Wu, W. H. Hung, Tommy Lee, H. C. Wu, X. Xie, W. J. Shao, C. H. Chang, R. Aldana, Y. Cao, R. Goossens, Simon Hsieh

Proceedings Volume 7520, 75201Q (2009) https://doi.org/10.1117/12.842551

KEYWORDS: Scanners, Semiconducting wafers, Calibration, Lithography, Yield improvement, Model-based design, Data modeling, Wafer-level optics, Optimization (mathematics), Process modeling

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Proceedings Article | 16 March 2009 Paper

Model-based scanner tuning in a manufacturing environment

C. Y. Shih, R. C. Peng, T. C. Chien, Y. W. Guo, J. Y. Lee, C. L. Chang, P. C. Huang, H. H. Liu, H. J. Lee, John Lin, K. W. Chang, C. P. Yeh, W. J. Shao, H. Cao, A. Bruguier, X. Xie, C. H. Chang, R. Aldana, Y. Cao, R. Goossens, Simon Hsieh

Proceedings Volume 7274, 72740T (2009) https://doi.org/10.1117/12.813974

KEYWORDS: Scanners, Semiconducting wafers, Data modeling, Calibration, Lithography, Manufacturing, Model-based design, Optical proximity correction, Wafer-level optics, Reticles

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Proceedings Article | 2 May 2008 Paper

Topological and model based approach to pitch decomposition for double patterning

Peter Nikolsky, Natalia Davydova, Ronald Goossens

Proceedings Volume 6792, 679205 (2008) https://doi.org/10.1117/12.798518

KEYWORDS: Double patterning technology, Design for manufacturing, Photomasks, Evolutionary algorithms, Algorithm development, Process modeling, Optical proximity correction, Image processing, Optical lithography, Logic

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Proceedings Article | 16 November 2007 Paper

Pattern split rules! A feasibility study of rule based pitch decomposition for double patterning

Anton van Oosten, Peter Nikolsky, Judy Huckabay, Ronald Goossens, Robert Naber

Proceedings Volume 6730, 67301L (2007) https://doi.org/10.1117/12.746689

KEYWORDS: Double patterning technology, Design for manufacturing, Algorithm development, Deep ultraviolet, Rule based systems, Optical lithography, Model-based design, Performance modeling, Logic, Photomasks

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Showing 5 of 11 publications

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