Dr. Philippe Bézard Profile

Dr. Philippe Bézard

at imec

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Publications (14)

Proceedings Article | 10 April 2024 Presentation

Sustainability challenges and opportunities for dry etching from advanced packaging to advanced patterning

Philippe Bézard, Remi Vallat, Atefeh Fathzadeh, Konstantina Fillipidou

Proceedings Volume PC12958, (2024) https://doi.org/10.1117/12.3014622

KEYWORDS: Optical lithography, Sustainability, Gases, Dry etching, Advanced patterning, Advanced packaging, Semiconducting wafers, Passivation, Etching, Pollution control

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Proceedings Article | 9 April 2024 Presentation + Paper

Where to apply sustainability optimizations in process flows?

Konstantina Filippidou, Philippe Bezard, I-Yun Liu, Cedric Rolin, Frederic Lazzarino, Lars-Åke Ragnarsson

Proceedings Volume 12958, 129580L (2024) https://doi.org/10.1117/12.3012753

KEYWORDS: Etching, Chemistry, Gases, Silica, Sustainability, Optical lithography, Fluorine, Dry etching, Climate change, Semiconducting wafers

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Proceedings Article | 9 April 2024 Presentation + Paper

Patterning optimization for single mask bit-line-periphery and storage-node-landing-pad DRAM layers using 0.33NA EUV lithography at the resolution limit

Van Tuong Pham, Jeonghoon Lee, Kaushik Sah, Ying-Lin Chen, Seonggil Heo, Soobin Hwang, Kenichi Miyaguchi, Bappaditya Dey, Maria Chistiakova, Peter De Schepper, Philippe Bezard, Sara Paolillo, Danilo De Simone, Hyo Seon Suh, Victor Blanco

Proceedings Volume 12957, 129570V (2024) https://doi.org/10.1117/12.3010934

KEYWORDS: Printing, Extreme ultraviolet, Optical lithography, Etching, Extreme ultraviolet lithography, Design, Cadmium, Source mask optimization, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 9 April 2024 Presentation + Paper

Material and process optimization for EUV pattern rectification by DSA

Lander Verstraete, Hyo Seon Suh, Julie Van Bel, Byeong-U Bak, Seong Eun Kim, Remi Vallat, Philippe Bezard, Matteo Beggiato, Christophe Beral

Proceedings Volume 12956, 129560G (2024) https://doi.org/10.1117/12.3010817

KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Annealing, Bridges, Extreme ultraviolet lithography, Polymethylmethacrylate, Materials processing

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Proceedings Article | 1 May 2023 Presentation + Paper

Sustainable semiconductor manufacturing: lessons for lithography and etch

Emily Gallagher, Philippe Bezard, Lizzie Boakes, Andrea Firrincieli, Cedric Rolin, Lars-Åke Ragnarsson

Proceedings Volume 12499, 124990F (2023) https://doi.org/10.1117/12.2662857

KEYWORDS: Etching, Carbon, Hydrogen, Lithography, Scanners, Semiconductors, Sustainability

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Proceedings Article | 1 May 2023 Presentation + Paper

Scaled-down deposited underlayers for EUV lithography

Mihir Gupta, Joao Antunes Afonso, Philippe Bezard, Remi Vallat, Roberto Fallica, Hyo Seon Suh, Sandip Halder, Danilo De Simone, Zecheng Liu, Fanyong Ran, Hideaki Fukuda, Yiting Sun, David De Roest, Daniele Piumi

Proceedings Volume 12498, 124980R (2023) https://doi.org/10.1117/12.2660376

KEYWORDS: Film thickness, Extreme ultraviolet lithography, Etching, Adhesion, Line width roughness, Line edge roughness, Surface roughness, Lithography, Interfaces

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Proceedings Article | 1 May 2023 Presentation + Paper

EUV lithography line-space pattern rectification using block copolymer directed self-assembly: a roughness and defectivity study

Julie Van Bel, Lander Verstraete, Hyo Seon Suh, Stefan De Gendt, Philippe Bezard, Jelle Vandereyken, Waikin Li, Matteo Beggiato, Amir-Hossein Tamaddon, Christophe Beral, Andreia Santos, Boaz Alperson, YoungJun Her

Proceedings Volume 12497, 124970K (2023) https://doi.org/10.1117/12.2657990

KEYWORDS: Directed self assembly, Block copolymers, Extreme ultraviolet, Annealing, Film thickness, Extreme ultraviolet lithography, Line edge roughness, Critical dimension metrology, Semiconducting wafers, Line width roughness

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Proceedings Article | 1 May 2023 Presentation + Paper

Mitigating stochastics in EUV lithography by directed self-assembly

L. Verstraete, Hyo Seon Suh, Julie Van Bel, Purnota Hannan Timi, Remi Vallat, Philippe Bezard, Jelle Vandereyken, Matteo Beggiato, Amir-Hossein Tamaddon, Christophe Beral, Waikin Li, Mihir Gupta, Roberto Fallica

Proceedings Volume 12497, 124970I (2023) https://doi.org/10.1117/12.2657939

KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Extreme ultraviolet lithography, Bridges, Etching

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Proceedings Article | 30 April 2023 Presentation

Etch optimization for defect reduction of EUV photoresists

Alexandra Krawicz, Katie Lutker-Lee, Sophie Thibaut, Eric Liu, Danilo De Simone, Arnaud Dauendorffer, Yannick Feurprier, Kathleen Nafus, Philippe Bézard, Philippe Foubert, Noriaki Oikawa

Proceedings Volume PC12499, PC1249903 (2023) https://doi.org/10.1117/12.2658971

KEYWORDS: Photoresist materials, Etching, Extreme ultraviolet lithography, Printing, Bridges, Thin film coatings, Stochastic processes, Scanners, Oxides, Metals

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Proceedings Article | 7 June 2022 Presentation

Exploring the synergy between EUV lithography and directed self-assembly

Hyo Seon Suh, Lander Verstraete, Julie Van Bel, Philippe Bézard, Geert Mannaert, Jae Uk Lee, Shouhua Wang, Ivan Pollentier, Ashish Rathore

Proceedings Volume PC12054, PC1205402 (2022) https://doi.org/10.1117/12.2622565

KEYWORDS: Directed self assembly, Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Semiconductors, Semiconducting wafers, Lithography, Light-matter interactions

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Proceedings Article | 19 October 2021 Presentation + Paper

Towards high NA patterning readiness: materials, processes and etch transfer for P24 Line Space

A. Thiam, J. G. Santaclara, J-H. Franke, F. Schleicher, R. Blanc, P. Bezard, A. Moussa, P. Wong, E. Hendrickx, M. Maslow

Proceedings Volume 11854, 118540A (2021) https://doi.org/10.1117/12.2601839

KEYWORDS: Etching, Photoresist materials, Semiconducting wafers, Optical lithography, Scanning electron microscopy, Photoresist processing, Lithography, Atomic force microscopy, Photoresist developing, Oxides

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Proceedings Article | 22 February 2021 Presentation + Paper

Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Xavier Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, Philippe Bézard, Matthieu Sérégé, Camille Petit-Etienne, Guillaume Gay, Gilles Cunge, Benjamin Cabannes-Boué, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Marcus Müller, Georges Hadziioannou, Ilias Iliopoulos, Guillaume Fleury, Marc Zelsmann

Proceedings Volume 11612, 116120O (2021) https://doi.org/10.1117/12.2583717

KEYWORDS: Lithography, Directed self assembly, Silicon, Etching, Semiconducting wafers, Photonic metamaterials, Photomasks, Metamaterials, Manufacturing, Line edge roughness

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Proceedings Article | 20 March 2018 Paper

Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers

P. Bézard, X. Chevalier, A. Legrain, C. Navarro, C. Nicolet, G. Fleury, I. Cayrefourcq, R. Tiron, M. Zelsmann

Proceedings Volume 10589, 105890C (2018) https://doi.org/10.1117/12.2299337

KEYWORDS: Silicon, Etching, Polymers, Plasma etching, Plasma, Semiconducting wafers, Chemistry, Line edge roughness, Interfaces

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Proceedings Article | 25 March 2016 Paper

Design of new block copolymer systems to achieve thick films with defect-free structures for applications of DSA into lithographic large nodes

X. Chevalier, P. Coupillaud, G. Lombard, C. Nicolet, J. Beausoleil, G. Fleury, M. Zelsmann, P. Bezard, G. Cunge, J. Berron, K. Sakavuyi, A. Gharbi, R. Tiron, G. Hadziioannou, C. Navarro, I. Cayrefourcq

Proceedings Volume 9779, 977913 (2016) https://doi.org/10.1117/12.2219214

KEYWORDS: Lithography, Optical lithography, Molecular self-assembly, Microelectronics, Directed self assembly, Semiconducting wafers, Fourier transforms, Polymer thin films, Polymers, Photomasks, Scanning electron microscopy, Etching, Plasma, Crystals, Chemistry

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Showing 5 of 14 publications

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