Noriaki Nagamine
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 1 May 2023 Poster + Paper
Proceedings Volume 12498, 124981G (2023) https://doi.org/10.1117/12.2657432
KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Interfaces, Etching, Coating thickness, Lithography, Stochastic processes, Critical dimension metrology

Proceedings Article | 11 November 2022 Presentation
Seiji Nagahara, Arnaud Dauendorffer, Xiang Liu, Tomoya Onitsuka, Hisashi Genjima, Noriaki Nagamine, Yuhei Kuwahara, Yuya Kamei, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Sophie Thibaut, Alexandra Krawicz, Steven Grzeskowiak, Katie Lutker-Lee, Eric Liu, Christopher Catano, Joshua LaRose, Jeffrey Shearer, Lior Huli, Philippe Foubert, Danilo De Simone
Proceedings Volume PC12292, PC122920N (2022) https://doi.org/10.1117/12.2642941
KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Etching, Plasma etching, Lithography, Yield improvement, Stochastic processes, Plasma, Photoresist materials

Proceedings Article | 28 September 2021 Presentation
Arnaud Dauendorffer, Tomoya Onitsuka, Hiroki Tadatomo, Keisuke Yoshida, Takahiro Shiozawa, Hisashi Genjima, Noriaki Nagamine, Yuya Kamei, Soichiro Okada, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Ainhoa Romo Negreira, Seiji Nagahara, Congque Dinh, Luka Kljucar, Danilo De Simone, Philippe Foubert
Proceedings Volume 11854, 118540B (2021) https://doi.org/10.1117/12.2600860
KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Metals, Etching, Stochastic processes, Semiconductors, Semiconductor manufacturing, Resistance, Photomasks, Particles

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Takahiro Shiozawa, Keisuke Yoshida, Noriaki Nagamine, Arnaud Dauendorffer, Satoru Shimura, Kathleen Nafus, Yannick Feurprier, Kenta Ono, Shota Yoshimura, Atsutoshi Inokuchi, Kiyoshi Maeda, Tetsuya Nishizuka, Shinya Morikita, Yoshihide Kihara, Ken Kobayashi
Proceedings Volume 11612, 116120T (2021) https://doi.org/10.1117/12.2583772
KEYWORDS: Extreme ultraviolet, Etching, Extreme ultraviolet lithography, Stochastic processes, Photoresist processing, Particles, Lithographic illumination, High volume manufacturing

Proceedings Article | 23 March 2020 Paper
Proceedings Volume 11323, 113232A (2020) https://doi.org/10.1117/12.2551627
KEYWORDS: Photoresist materials, Critical dimension metrology, Etching, Extreme ultraviolet lithography, Bridges, Extreme ultraviolet, Stochastic processes, Semiconducting wafers, Photoresist processing

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