Recent advances in EUV patterning in preparation towards high-NA EUV

Seiji Nagahara; Arnaud Dauendorffer; Arame Thiam; Xiang Liu; Yuhei Kuwahara; Cong Que Dinh; Soichiro Okada; Shinichiro Kawakami; Hisashi Genjima; Noriaki Nagamine; Makoto Muramatsu; Satoru Shimura; Atsushi Tsuboi; Kathleen Nafus; Yannick Feurprier; Marc Demand; Rajesh Ramaneti; Philippe Foubert; Danilo De Simone; Geert Vendenberghe

doi:10.1117/12.2657432

30 April 2023 Recent advances in EUV patterning in preparation towards high-NA EUV

Seiji Nagahara, Arnaud Dauendorffer, Arame Thiam, Xiang Liu, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Shinichiro Kawakami, Hisashi Genjima, Noriaki Nagamine, Makoto Muramatsu, Satoru Shimura, Atsushi Tsuboi, Kathleen Nafus, Yannick Feurprier, Marc Demand, Rajesh Ramaneti, Philippe Foubert, Danilo De Simone, Geert Vendenberghe

Author Affiliations +

Proceedings Volume 12498, Advances in Patterning Materials and Processes XL; 124981G (2023) https://doi.org/10.1117/12.2657432
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

High-NA EUV lithography is currently under development to keep up with device node scaling with smaller feature sizes. In this paper, the most recent advances in EUV patterning using metal oxide resists (MOR) and chemically amplified resists (CAR) are discussed. A newly developed resist development method (ESPERT™) was examined on MOR with 24 nm pitch line and space (L/S) patterns and 32 nm pitch pillars for preparation of high-NA EUV patterning. The patterning results showed improved sensitivity and pattern collapse margin. CAR contact hole patterning at 28 nm pitch was also examined by stochastic lithography simulation. The simulation results indicate that resist film thickness needs to be optimized for target pitches.

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Seiji Nagahara, Arnaud Dauendorffer, Arame Thiam, Xiang Liu, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Shinichiro Kawakami, Hisashi Genjima, Noriaki Nagamine, Makoto Muramatsu, Satoru Shimura, Atsushi Tsuboi, Kathleen Nafus, Yannick Feurprier, Marc Demand, Rajesh Ramaneti, Philippe Foubert, Danilo De Simone, and Geert Vendenberghe "Recent advances in EUV patterning in preparation towards high-NA EUV", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 124981G (30 April 2023); https://doi.org/10.1117/12.2657432

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