Dr. Nadav Gutman Profile

Dr. Nadav Gutman

Research Manager at KLA Israel

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 10 April 2024 Poster + Paper

Artificial intelligence measurement in imaging-based overlay metrology for performance boost

Sveta Grechin, Shlomit Katz, Kei Maeda, Tsumugi Hirasawa, Hisashi Otsubo, Seigo Aoki, Atsushi Takahashi, Atsushi Miyafuji, Ofer Manos, Yu Yang, Tal Levinson, Ran Trifon, Dor Yehuda, Hamode Hagaze, Yuval Lamhot, Yair Vardi, Yoav Grauer, Avner Safrani, Cindy Kato, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Hayashi Masanobu, Eunjoong An, Nana Lan, Simon Ahn, Nadav Gutman

Proceedings Volume 12955, 129552P (2024) https://doi.org/10.1117/12.3010281

KEYWORDS: Overlay metrology, Artificial intelligence, Semiconducting wafers, Education and training, Metrology, Evolutionary algorithms, Detection and tracking algorithms, Target acquisition, Performance modeling, Optical parametric oscillators

Read Abstract +

Proceedings Article | 10 April 2024 Poster + Paper

Single-cell measurements by parallax effect for process control and target size reduction

Changkyu Lee, Sumin Jang, Baikkyu Hong, Ikhyun Jeong, Sunouk Nam, Hyunsok Kim, Jaewuk Ju, Minho Jung, Mingyu Kim, Hongpeng Su, Yanan Wang, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Roie Volkovich, Nadav Gutman, Ohad Bachar, Renan Milo

Proceedings Volume 12955, 129552H (2024) https://doi.org/10.1117/12.3010101

KEYWORDS: Overlay metrology, Semiconducting wafers, Wafer level optics, Metrology, Optical gratings, Process control, Optical parametric oscillators, Time metrology, Optical alignment

Read Abstract +

Proceedings Article | 27 April 2023 Poster + Paper

Parallax method for diffraction-based single-cell overlay and film thickness measurement

Mordecai Kot, Yuval Lamhot, Alon Yagil, Tal Yaziv, Nadav Gutman, Renan Milo

Proceedings Volume 12496, 124963A (2023) https://doi.org/10.1117/12.2659163

KEYWORDS: Overlay metrology, Diffraction, Semiconducting wafers, Calibration, Diffraction gratings, Optical alignment, Film thickness

Read Abstract +

Proceedings Article | 26 May 2022 Poster + Paper

OPO reduction in scatterometry metrology by rotated quadrupole illumination

Rawi Dirawi, Tal Yaziv, Renan Milo, Nadav Gutman, Ohad Bachar

Proceedings Volume 12053, 120531H (2022) https://doi.org/10.1117/12.2608255

KEYWORDS: Metrology, Overlay metrology, Scatterometry, Diffraction, Semiconductors, Wavelength tuning, Wafer testing, Specular reflections, Spectral resolution, Diffractive optical elements, Semiconductor manufacturing, Wafer inspection

Read Abstract +

Proceedings Article | 26 May 2022 Poster + Paper

Prediction and optimization of small scatterometry based overlay targets

Rawi Dirawi, Shlomit Katz, Renan Milo, Nadav Gutman

Proceedings Volume 12053, 120531E (2022) https://doi.org/10.1117/12.2608241

KEYWORDS: Overlay metrology, Metrology, Scatterometry, Semiconductors, Semiconductor manufacturing, Manufacturing, Inspection, Standards development

Read Abstract +

Proceedings Article | 26 May 2022 Poster + Paper

Spectral analysis overlay measurement approach for improvement of overlay accuracy in advanced integrated circuits

Vladimir Levinski, Yuri Paskover, Sharon Aharon, Daria Negri, Nadav Gutman, K. Nireekshan Reddy, Jeongpyo Lee, Hedvi Spielberg, Dongyoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Hongseok Jang, Honggoo Lee, Sangho Lee

Proceedings Volume 12053, 120531Z (2022) https://doi.org/10.1117/12.2613981

KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Integrated circuits, Wafer-level optics, Scanners, Principal component analysis, Manufacturing, Inspection, Accuracy assessment

Read Abstract +

Proceedings Article | 22 February 2021 Presentation + Paper

High voltage scanning electron microscope overlay metrology accuracy for after development inspection

S. Czerkas, N. Gutman, R. Gronheid, E. Gurevich, R. Wang, Y. Feler, M. Zaberchik, Y. Grauer, H. Stoschus, Y. Uziel, U. Pohlmann, F. Laske

Proceedings Volume 11611, 116110B (2021) https://doi.org/10.1117/12.2583710

KEYWORDS: Overlay metrology, Scanning electron microscopy, Inspection, Electron microscopes, Optical metrology, Optical lithography, New and emerging technologies, Metrology, Integrated optics, Imaging metrology

Read Abstract +

Proceedings Article | 20 March 2020 Presentation + Paper

Optical imaging metrology calibration using high voltage scanning electron microscope at after-development inspection for advanced processes

N. Gutman, I. Tarshish, R. Gronheid, C. Dror, D. Michelsson, H. Backhauss, L. Levin, V. Levinski, Y. Paskover, L. Yerushalmi, T. Heidrich, S. Czerkas, U. Pohlmann, F. Laske

Proceedings Volume 11325, 113251X (2020) https://doi.org/10.1117/12.2551797

KEYWORDS: Scanning electron microscopy, Overlay metrology, Metrology, Calibration, Optical calibration

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Scanner focus metrology for advanced node scanner monitoring and control

Jimyung Kim, Youngsik Park, Taehwa Jeong, Suhyun Kim, Kwang-Sub Yoon, Byoung-il Choi, Vladimir Levinski, Daniel Kandel, Yoel Feler, Nadav Gutman, Eltsafon Island-Ashwal, Moshe Cooper, DongSub Choi, Eitan Herzel, Tien David, JungWook Kim

Proceedings Volume 9424, 94242E (2015) https://doi.org/10.1117/12.2084671

KEYWORDS: Scanners, Photomasks, Metrology, Finite element methods, Semiconducting wafers, Diffraction, Lithography, Phase shifts, Calibration, Scatterometry

Read Abstract +

Showing 5 of 9 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years