Dr. Kishore K. Chakravorty Profile

Dr. Kishore K. Chakravorty

at Intel Corp

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Author

Publications (9)

Proceedings Article | 26 May 2023 Presentation + Paper

Improvement of LDP EUV source performance for actinic patterned mask inspection

Safak Sayan, Kishore Chakravorty, Yusuke Teramoto, Bárbara Santos, Akihisa Nagano, Noritaka Ashizawa, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Kazuya Aoki, Yoshihiko Sato

Proceedings Volume PC12494, PC124940E (2023) https://doi.org/10.1117/12.2671128

KEYWORDS: Extreme ultraviolet, Plasma, Tin, Inspection, Electrodes, Laser irradiation, Vacuum chambers, Reliability, Ions, Pulsed laser operation

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Proceedings Article | 23 March 2021 Presentation + Paper

Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI)

Safak Sayan, Kishore Chakravorty, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Yoshihiko Sato, Kazuya Aoki, Ted Liang, Yoshihiro Tezuka, Marieke Jager, Firoz Ghadiali, Frank Abboud, Steven Carson

Proceedings Volume 11609, 116090L (2021) https://doi.org/10.1117/12.2588788

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Proceedings Article | 23 March 2020 Paper

EUV mask infrastructure and actinic pattern mask inspection

Ted Liang, Yoshihiro Tezuka, Marieke Jager, Kishore Chakravorty, Safak Sayan, Eric Frendberg, Srinath Satyanarayana, Firoz Ghadiali, Guojing Zhang, Frank Abboud

Proceedings Volume 11323, 1132310 (2020) https://doi.org/10.1117/12.2554496

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Defect detection, Optical inspection, Semiconducting wafers, Deep ultraviolet, EUV optics

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Proceedings Article | 11 November 2015 Paper

EUV mask infrastructure readiness and gaps for TD and HVM

Ted Liang, John Magana, Kishore Chakravorty, Eric Panning, Guojing Zhang

Proceedings Volume 9635, 963509 (2015) https://doi.org/10.1117/12.2202724

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Particles, Scanners, Semiconducting wafers, Deep ultraviolet, Defect inspection

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Proceedings Article | 15 March 2006 Paper

Alt- phase-shift mask technology for 65nm logic applications

Kishore Chakravorty, Sven Henrichs, Wei Qiu, Joas Chavez, Yi-Ping Liu, Firoz Ghadiali, Karmen Yung, Nathan Wilcox, Mary Silva, Jian Ma, Ping Qu, Brian Irvine, Henry Yun, Wen-Hao Cheng, Jeff Farnsworth

Proceedings Volume 6154, 61540M (2006) https://doi.org/10.1117/12.654691

KEYWORDS: Quartz, Photomasks, Manufacturing, Etching, Optical lithography, Logic, Critical dimension metrology, Phase shifts, Optical proximity correction, Reticles

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Proceedings Article | 5 November 2005 Paper

Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase shift mask

Jian Ma, Ke Han, Kyung Lee, Yulia Korobko, Mary Silva, Joas Chavez, Brian Irvine, Sven Henrichs, Kishore Chakravorty, Robert Olshausen, Mahesh Chandramouli, Bobby Mammen, Ramaswamy Padmanaban

Proceedings Volume 5992, 59921P (2005) https://doi.org/10.1117/12.632160

KEYWORDS: Overlay metrology, Neodymium, Quartz, Chromium, Photomasks, Tolerancing, Phase shifts, Etching, Scanning electron microscopy, Optical testing

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Proceedings Article | 28 August 2003 Paper

Alternating phase shift mask architecture scalability, implementations, and applications for 90-nm and 65-nm technology nodes and beyond

Wen-Hao Cheng, Kishore Chakravorty, Jeff Farnsworth

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504391

KEYWORDS: Photomasks, Glasses, Optical lithography, Phase shifts, Etching, Opacity, Chromium, Lithography, Phase shift keying, Optical proximity correction

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Proceedings Article | 1 April 1991 Paper

Waveguiding characteristics in polyimide films with different chemistry of formation

Kishore Chakravorty, Chung-Ping Chien

Proceedings Volume 1389, (1991) https://doi.org/10.1117/12.25556

KEYWORDS: Chemistry, Waveguides, Packaging, Scattering, Refractive index, Near field optics, Polymers, Planar waveguides, Birefringence, Semiconducting wafers

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Proceedings Article | 1 December 1990 Paper

Dependence of precursor chemistry and curing conditions on optical loss characteristics of polyimide waveguides

Chung-Ping Chien, Kishore Chakravorty

Proceedings Volume 1323, (1990) https://doi.org/10.1117/12.22408

KEYWORDS: Waveguides, Ultraviolet radiation, Chemistry, Scattering, Thin films, Planar waveguides, Optical properties, Refractive index, Semiconducting wafers, Dielectrics

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Showing 5 of 9 publications

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