Dr. Karmen Yung
at Intel Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 8 November 2012 Paper
Chang Choi, Karmen Yung, Cheng-Hsin Ma, Ganesh Vanamu
Proceedings Volume 8522, 85220Q (2012) https://doi.org/10.1117/12.977137
KEYWORDS: Etching, Plasma, Plasma etching, Resolution enhancement technologies, Chromium, Photomasks, Reliability, Phase shifts, Process control, Ions

Proceedings Article | 7 March 2008 Paper
Wen-Hao Cheng, Jeff Farnsworth, Wai Kwok, Andrew Jamieson, Nathan Wilcox, Matt Vernon, Karmen Yung, Yi-Ping Liu, Jun Kim, Eric Frendberg, Scott Chegwidden, Richard Schenker, Yan Borodovsky
Proceedings Volume 6924, 69241G (2008) https://doi.org/10.1117/12.772955
KEYWORDS: Photomasks, Optical lithography, Glasses, Image resolution, Chromium, Etching, 3D modeling, Electron beam lithography, Defect inspection, Semiconducting wafers

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69240I (2008) https://doi.org/10.1117/12.771677
KEYWORDS: Photomasks, Optical lithography, Glasses, Semiconducting wafers, SRAF, Cadmium, Phase shifts, Modulation, Image transmission, Etching

Proceedings Article | 30 October 2007 Paper
Karmen Yung, Chang-Ju Choi, Ki-Ho Baik
Proceedings Volume 6730, 67300A (2007) https://doi.org/10.1117/12.746772
KEYWORDS: Etching, Photomasks, Oxygen, Chromium, Critical dimension metrology, Plasma, Plasma treatment, Nitrogen, Plasma etching, Manufacturing

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65181V (2007) https://doi.org/10.1117/12.712323
KEYWORDS: Data modeling, Performance modeling, Process modeling, Reticles, Etching, Sensors, Metrology, Critical dimension metrology, Manufacturing, Data processing

Showing 5 of 6 publications
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