Mr. Steven L. Carson Profile

Steven L. Carson

Sr Principal Engineer

SPIE Involvement:

Conference Program Committee | Author

Proceedings Article | 23 March 2021 Presentation + Paper

Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI)

Safak Sayan, Kishore Chakravorty, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Yoshihiko Sato, Kazuya Aoki, Ted Liang, Yoshihiro Tezuka, Marieke Jager, Firoz Ghadiali, Frank Abboud, Steven Carson

Proceedings Volume 11609, 116090L (2021) https://doi.org/10.1117/12.2588788

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Proceedings Article | 18 March 2016 Open Access

EUV progress toward HVM readiness

Britt Turkot, Steven Carson, Anna Lio, Ted Liang, Mark Phillips, Brian McCool, Eric Stenehjem, Tim Crimmins, Guojing Zhang, Sam Sivakumar

Proceedings Volume 9776, 977602 (2016) https://doi.org/10.1117/12.2225014

KEYWORDS: Extreme ultraviolet, Reticles, Pellicles, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Optical lithography, Inspection, Yield improvement

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Proceedings Article | 8 April 2011 Paper

EUVL dark-field exposure impact on CDs using thick and thin absorber masks

Sang Lee, Todd Younkin, Michael Leeson, Manish Chandhok, Guojing Zhang, John Magana, Hiroyoshi Tanabe, Steve Carson

Proceedings Volume 7969, 79691R (2011) https://doi.org/10.1117/12.879428

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Cadmium sulfide, Extreme ultraviolet, Line width roughness, Lithography, Reflection, Electroluminescence, Phase shifting, Semiconducting wafers

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Proceedings Article | 18 March 2009 Paper

Compensation of overlay errors due to mask bending and non-flatness for EUV masks

Manish Chandhok, Sanjay Goyal, Steven Carson, Seh-Jin Park, Guojing Zhang, Alan Myers, Michael Leeson, Marilyn Kamna, Fabian Martinez, Alan Stivers, Gian Lorusso, Jan Hermans, Eric Hendrickx, Sanjay Govindjee, Gerd Brandstetter, Tod Laursen

Proceedings Volume 7271, 72710G (2009) https://doi.org/10.1117/12.814428

KEYWORDS: Extreme ultraviolet, Photomasks, Finite element methods, Reticles, Error analysis, Thin films, Photovoltaics, Data modeling, Distortion, Image registration

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Proceedings Article | 18 March 2009 Paper

Demonstration of full-field patterning of 32 nm test chips using EUVL

Gilroy Vandentop, Manish Chandhok, Ernisse Putna, Todd Younkin, James Clarke, Steven Carson, Alan Myers, Michael Leeson, Guojing Zhang, Ted Liang, Tetsunori Murachi

Proceedings Volume 7271, 727116 (2009) https://doi.org/10.1117/12.814436

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Optical lithography, Extreme ultraviolet, Particles, Photoresist materials, Line width roughness, Reticles, Semiconducting wafers

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Proceedings Article | 1 July 2003 Paper

Stepper registration feedback control in 300-mm manufacturing

Joel Fenner, Joel Roberts, Steven Carson

Proceedings Volume 5044, (2003) https://doi.org/10.1117/12.485313

KEYWORDS: Manufacturing, Semiconductors, Error analysis, Control systems, Process control, Feedback control, Overlay metrology, Semiconductor manufacturing, Optical alignment, Semiconducting wafers

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Proceedings Article | 1 July 2003 Paper

Exposure-focus critical dimension feedback control in 300-mm manufacturing technologies

Anju Narendra, Steven Carson, Cynthia Morrison

Proceedings Volume 5044, (2003) https://doi.org/10.1117/12.485312

KEYWORDS: Manufacturing, Process control, Data modeling, Process modeling, Feedback control, Control systems, Algorithm development, Semiconductor manufacturing, Correlation function, Detection and tracking algorithms

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Showing 5 of 7 publications

Conference Committee Involvement (4)

Optical and EUV Nanolithography XXXVIII

24 February 2025 | San Jose, California, United States

Optical and EUV Nanolithography XXXVII

26 February 2024 | San Jose, California, United States

Optical and EUV Nanolithography XXXVI

27 February 2023 | San Jose, California, United States

Optical and EUV Nanolithography XXXV

25 April 2022 | San Jose, California, United States

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