Hiroshi Sugimura
Senior Researcher at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 23 March 2006 Paper
Proceedings Volume 6151, 61511F (2006) https://doi.org/10.1117/12.655425
KEYWORDS: Photomasks, Reactive ion etching, Etching, Semiconducting wafers, Scattering, Mask making, Electron beam lithography, Silicon, Image resolution, Optical lithography

Proceedings Article | 23 March 2006 Paper
Hideyuki Eguchi, Hiroshi Sugimura, Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Kentaro Ogawa, Takashi Susa, Shinji Kunitani, Toshiaki Kurosu, Takashi Yoshii, Kojiro Itoh, Akira Tamura
Proceedings Volume 6151, 61511G (2006) https://doi.org/10.1117/12.655423
KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Photoresist processing, Mask making, Optical alignment, Image processing, Silicon, Process control, Reactive ion etching

Proceedings Article | 28 June 2005 Paper
Hideyuki Eguchi, Tomoya Sumida, Takashi Susa, Yoshiyuki Negishi, Toshiaki Kurosu, Takashi Yoshii, Tsukasa Yamazaki, Kenta Yotsui, Hiroshi Sugimura, Akira Tamura
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617287
KEYWORDS: Photomasks, Charged-particle lithography, Electron beam lithography, Projection lithography, Microelectromechanical systems, Solids

Proceedings Article | 28 June 2005 Paper
Hiroshi Sugimura, Tsukasa Yamazaki, Takashi Susa, Yoshiyuki Negishi, Takashi Yoshii, Hideyuki Eguchi, Akira Tamura
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617279
KEYWORDS: Photomasks, Reactive ion etching, Critical dimension metrology, Lithography, Mask making, Silicon, Etching, Electron beam lithography, Projection lithography, Distortion

Proceedings Article | 28 June 2005 Paper
Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Tukasa Yamazaki, Hiroshi Sugimura, Takashi Susa, Kojiro Ito, Akira Tamura
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617467
KEYWORDS: Reticles, Distortion, Semiconducting wafers, Photomasks, Silicon, Metrology, Electron beam lithography, Optical alignment, Data corrections, Overlay metrology

Showing 5 of 9 publications
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