CONFERENCE PROCEEDINGS
Advanced Search
Kentaro Ogawa
Principal Engineer
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 23 March 2006 Paper
Advanced Image Placement Performance for the Current EPL Masks
Hideyuki Eguchi, Hiroshi Sugimura, Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Kentaro Ogawa, Takashi Susa, Shinji Kunitani, Toshiaki Kurosu, Takashi Yoshii, Kojiro Itoh, Akira Tamura
Proceedings Volume 6151, 61511G (2006) https://doi.org/10.1117/12.655423
KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Photoresist processing, Mask making, Optical alignment, Image processing, Silicon, Process control, Reactive ion etching
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top