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Variable filters are obtained upon the variation of the thickness of some or all the layers deposited on the substrate. The layers are deposited using a Bühler HELIOS machine in order to benefit from the high stability of the deposition process. To insure a non-uniformity of the deposited layers, adapted masks are placed in front of the targets for the low and high refractive index materials. The uniformity of these layers is measured via a custom set-up allowing a local measurement of the transmission to perform a mapping of the transmission over the whole component aperture.
In this paper, we present the fabrication of layers and filters with variable thickness. Various types of thickness gradients are presented.
All these components were manufactured using Plasma Assisted Reactive Magnetron Sputtering (PARMS) technics offered by the HELIOS machine and monitored in real time with an OMS5000 in-situ optical monitoring, both developed by BUHLER Optics.
Compressive mechanical stress of 364 MPa and 55 MPa respectively for SiO2 and Nb2O5 are measured, final sag of 326 nm and 13 nm, and uniformity from -0.05% to 0.10% and from -0.10% to 0.20% are obtained respectively for the two manufactured filters.
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